초록
Ag intermediated $TiO_2$ films were deposited by RF and DC magnetron sputtering and then vacuum annealed at 100, 200 and $300^{\circ}C$ for 30 minutes to investigate the effect of annealing temperature on the structural and optical properties of the films. For all depositions, the thickness of the $TiO_2$ and Ag films were kept constant at 24 and 15 nm by controlling the deposition time. As-deposited $TiO_2/Ag/TiO_2$ trilayer films have a weak crystalline and an optical reflectance in a near infrared wavelength region of 77.8%, while the films annealed at $300^{\circ}C$ show the polycrystalline structure and an increased mean optical reflectance of 80.4%. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the structural and optical properties of the $TiO_2/Ag/TiO_2$ films.
