• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.171-171
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• 2007

Dysprosium-doped bismuth titanate (BDT) thin films were successfully deposited on Pt(111)/Ti/$SiO_2$/Si(100) substrates by liquid delivery MOCVD process and their structural and ferroelectric properties were characterized. Fabricated BDT thin films were found to be random orientations, which were confirmed by X-ray diffraction experiment and scanning electron microscope analysis. The crystallinity of the BDT films was improved and the average grain size increased as the crystallization temperature increased from 600 to $720^{\circ}C$ at an interval of $40^{\circ}C$. The BDT thin film annealed at $720^{\circ}C$ showed a large remanent polarization (2Pr) of $52.27\;{\mu}C/cm^2$ at an applied voltage of 5V. The BDT thin film exhibits a good fatigue resistance up to $1.0{\times}10^{11}$ switching cycles at a frequency of 1 MHz with applied pulse of ${\pm}5\;V$. These results indicate that the randomly oriented BDT thin film is a promising candidate among ferroelectric materials useti비 in lead-free nonvolatile ferroelectric random access memory applications.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.79-79
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• 2008

We report the growth of $Ba_{0.5}Sr_{0.5}TiO_3$(BST) thin films and their substrate-dependent electrical characteristics. BST thin films were deposited on alumina(non-single crystal), $Al_2O_3$(100) substrates by Nd:YAG Pulsed Laser Deposition(PLD) with a 355nm wavelength at substrate temperature of $700^{\circ}C$ and post-deposition annealing at $750^{\circ}C$ in flowing $O_2$ atmosphere for 1hours. BST materials had been chosen due to high dielectric permittivity and tunability for high frequency applications, To analyze the oxygen partial pressure effects, deposited films at 1, 10, 50, 100, 150, 200, 300 mTorr. The effects of oxygen pressure on structural properties of the deposited films have been investigated by X-ray diffraction(XRD) and atomic force microscope(AFM), respectively. Then we manufactured a inter-digital capacitor(IDC) patterns twenty fingers and $10{\mu}m$ gap, $700{\mu}m$ length and electrical properties were characterized. The results provide a basis for understanding the growth mechanisms and basic structural and electrical properties of BST thin films as required for tunable microwave devices applications such as varactors and tunable filters.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.40 no.9
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• pp.631-637
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• 2003

We have evaluated structural and electric, ferroelectric properties of PZT(30/70) thick film prepared by using 1,3-propanediol based sol-gel method on Pt/Ti/SiO$_2$/Si substrates. Rapid thermal annealing (RTA) is used to reduce the thermal stress and final furnace annealing is processed at $650^{\circ}C$. As the results of SEM analysis, we find that we get 350 nm in thickness for one coating and 1 $\mu$m for three times of coating. In the results of C-D analysis at 1 kHz, dielectric constant ($\varepsilon$$_{r}$) and dissipation factor were 886 and 0.03, respectively. C-V curve is shaped as a symmetrical butterfly. Leakage current density at 200 kV/cm is 1.23${\times}$10$^{-5}$ A/cm$^2$ and in the results of hysteresis loops measured at 150 kV/cm, the remnant polarization (P$_{r}$) and the coercive field (E$_{c}$) are 33.8 $\mu$C/cm$^2$ and 56.9 kV/cm, respectively. PZT(30/70) thick film exhibits relatively good ferroelectric, electric properties.s..

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.463-463
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• 2014

Dye-sensitized solar cells (DSSCs) have generated a strong interest in the development of solid-state devices owing to their low cost and simple preparation procedures. Effort has been devoted to the study of electrolytes that allow light-to-electrical power conversion for DSSC applications. Several attempts have been made to substitute the liquid electrolyte in the original solar cells by using (2,2',7,7'-tetrakis (N,N-di-p-methoxyphenylamine)-9-9'-spirobi-fluorene (spiro-OMeTAD) that act as hole conductor [1]. Although efficiencies above 3% have been reached by several groups, here the major challenging is limited photoelectrode thickness ($2{\mu}m$), which is very low due to electron diffusion length (Ln) for spiro-OMeTAD ($4.4{\mu}m$) [2]. In principle, the $TiO_2$ layer can be thicker than had been thought previously. This has important implications for the design of high-efficiency solid-state DSSCs. In the present study, we have fabricated 3-D Transparent Conducting Oxide (TCO) by growing tin-doped indium oxide (ITO) nanowire (NWs) arrays via a vapor transport method [3] and mesoporous $TiO_2$ nanoparticle (NP)-based photoelectrodes were prepared using doctor blade method. Finally optimized light-harvesting solid-state DSSCs is made using 3-D TCO where electron life time is controlled the recombination rate through fast charge collection and also ITO NWs length can be controlled in the range of over $2{\mu}m$ and has been characterized using field emission scanning electron microscopy (FE-SEM). Structural analyses by high-resolution transmission electron microscopy (HRTEM) and X-Ray diffraction (XRD) results reveal that the ITO NWs formed single crystal oriented [100] direction. Also to compare the charge collection properties of conventional NPs based solid-state DSSCs with ITO NWs based solid-state DSSCs, we have studied intensity modulated photovoltage spectroscopy (IMVS), intensity modulated photocurrent spectroscopy (IMPS) and transient open circuit voltages. As a result, above $4{\mu}m$ thick ITO NWs based photoelectrodes with Z907 dye shown the best performing device, exhibiting a short-circuit current density of 7.21 mA cm-2 under simulated solar emission of 100 mW cm-2 associated with an overall power conversion efficiency of 2.80 %. Finally, we achieved the efficiency of 7.5% by applying a CH3NH3PbI3 perovskite sensitizer.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.1091-1094
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• 2004

High-luminous efficiency full-color emissions in photoluminescence (PL) were obtained in $GdVO_4$ phosphor thin films co-doped with various amounts of Eu, Er and/or Tm and postannealed at approximately 1000$^{\circ}C$. The $GdVO_4$:Eu,Er,Tm phosphor thin films were deposited on thick $BaTiO_3$ ceramic sheets by r.f. magnetron sputtering using powder targets and postannealed in an air atmosphere. The rare earth (RE) content (RE/(Gd+V+RE) atomic ratio) in the oxide phosphor thin films was varied in the range from 0.1 to 2 at.%. It was found that the excitation of $GdVO_4$:Eu.Er,Tm thin films is attributed to band-to-band transition. A white PL emission was obtained in a $GdVO_4$:Eu,Er,Tm thin film with Eu, Er and Tm contents of 0.2, 0.7 and 1 at.%, respectively: CIE chromaticity color coordinates. (X=0.352 and Y=0.351). In addition, a white emission was obtained in a thin-film electroluminescent (TFEL) device made with this thin film.

• Proceedings of the KIEE Conference
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• 2009.04a
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• pp.27-29
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• 2009

본 연구에서는 Titanate Nanotube (TNT)를 LBL-SA (layer-by-layer self-assembling) method을 이용하여 전기변색 (electrochromism device, ECD) 소자에 적용하고자 하였다. TNT 분말은 10M NaOH와 $TiO_2$를 혼합한 후 autoclave에서 130$^{\circ}C$, 48시간 동안 수열합성하여 제조하였다. 주사전자현미경 (SEM)으로 TNT 분말의 형상을 관찰한 결과, 직경 20$\sim$30nm, 길이 500$\sim$600nm의 튜브 형상을 나타내었으며, X-선 회절시험 (XRD) 결과 층상구조로 확인되었다. 코팅 물질의 표면 전하를 이용한 LBL-SA method에 적용시키기 위해 수용액 중에서 TNT 입자 표면 전하를 TBAOH (tetrabutylammonium hydroxide)를 적정하여 제타 전위 값이 -40mV로 최대가 되도록 하였으며, 이때 pH 값은 9로 나타났다. 2전극 시스템을 이용하여 cycle voltammetry를 측정한 결과, -0.5$\sim$-1.5V 영역에서 산화환원전위 피크가 뚜렷하게 나타났으며, 짙은 갈색으로 변색되는 것을 확인하였다. 본 연구 결과로서 TNT 박막은 전기를 인가하였을 때 n-type 반도체 성질을 갖는 것으로 나타났으며, 앞으로 display 연구 분야에 적용할 수 있을 것으로 주목된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.168-168
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• 2011

정보화 사회가 도래함으로 개인별 정보 이용량이 급격히 증가하였고 스마트폰과 같은 모바일 기기의 개발로 정보 이용량이 최고치를 갱신 중이다. 이러한 흐름 속에 사람들은 빠른 처리 속도와 고도의 저장 능력을 요구하게 되고 이에 따라 새로운 Random Access Memory에 대한 연구가 활발히 진행되고 있다. 현재 Dynamic Random Access Memory (DRAM)가 눈부신 발전과 성과를 이룩하고 있지만 전원 공급이 중단 될 경우 저장된 내용들이 지워진다는 단점을 가지고 있다. DRAM의 장점에 이러한 단점을 보완할 수 있는 차세대 반도체 소자로 주목 받고 있는 것이 Magnetic Random Access Memory (MRAM)이다. DRAM에서 Capacitor와 유사한 기능을 하는 MTJ stack은 tunneling magnetoresistance (TMR) 현상을 나타내는 자기저항 박막을 이용하여 MRAM 소자에 집적된다. 본 연구에서는 MRAM의 자성 재료로 구성된 MTJ stack을 효과적으로 식각하고 우수한 식각 profile을 얻는 동시에 재증착의 문제를 해결하는데 목적을 둔다. 본 IrMn 자성 박막의 식각 연구는 유도결합 플라즈마 반응성 이온 식각 (Inductively Coupled Plasma Reactive Ion Etching: ICPRIE)법을 이용하여 진행되었다. 특히 본 연구에서는 종래의 $Cl_2$, $BCl_3$ 그리고 HBr과 같은 부식성 가스가 아닌 부식성이 없는 $CH_4$가스를 선택하여 그 농도를 변화시키면서 식각하였고 더 나아가 $O_2$를 첨가하면서 그 효과를 극대화하려고 시도하였다. IrMn 자성 박막의 식각 속도, TiN 하드 마스크에 대한 식각 선택도 그리고 profile 등이 조사되었고 최종적으로 X-ray photoelectron spectroscopy (XPS)를 이용하여 식각 메카니즘을 이해하려고 하였다.

• Journal of the Korean Ceramic Society
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• v.34 no.8
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• pp.877-885
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• 1997

The dependence of strength, crack growth, fracture mode and degree of domain rearrangement of PZT ceramics on poling strength were studied. The PZT [(Pb0.94Sr0.06)(Zr0.46Ti0.54)O3+Nb(trace)] specimens were poled at 0, 0.5, 1.0, 1.5, 2.0, 2.5, 3.0 kv/mm, and the strength of the specimens was measured by 3 point flexure system. The bending strength of the specimen decreased in different modes according to the bending directions; xz, zx and yz plane direction with x axis of the poling direction in Cartesian coordinate system. The strength differences between the directions increased as the poling strength increased. The fracture mode transferred to intergranular fracture mode from transgranular one as the poling strength increased. The mechanical breakdown occurred when the poling strength higher than 3 kV/mm was applied to the specimen. It was observed that the crack length increased in the normal direction to the poling direction, however, decreased in the parallel direction to the poling direction when the poled PZT specimen was indented by the Vickers indenter. However, the crack produced by indentation continuously was continuously increased little by little after indentation on the specimen. The domain rearrangement occurred as the poling strength increased and the domains were rearranged more effectively when the electric field was continuously increased little by little.

• Membrane and Water Treatment
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• v.6 no.3
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• pp.251-262
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• 2015

In this work the preparation and characterization of a membrane containing a uniform mesoporous Titanium oxide top layer on a porous stainless steel substrate has been studied. The 316 L stainless steel substrate was prepared by powder metallurgy technique and modified by soaking-rolling and fast drying method. The mesoporous titania membrane was fabricated via the sol-gel method. Morphological studies were performed on both supported and unsupported membranes using scanning electron microscope (SEM) and field emission scanning microscope (FESEM). The membranes were also characterized using X-ray diffraction (XRD) and $N_2$-adsorption / desorption measurement (BET analyses). It was revealed that a defect-free anatase membrane with a thickness of $1.6{\mu}m$ and 4.3 nm average pore size can be produced. In order to evaluate the performance of the supported membrane, single-gas permeation experiments were carried out at room temperature with nitrogen gas. The permeability coefficient of the fabricated membrane was $4{\times}10^{-8}\;lit\;s^{-1}\;Pa^{-1}\;cm^{-1}$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.177-180
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• 2002

Thickness dependence of crystallographic orientation of diol based sol-gel derived PZT(52/48) films on dielectric and piezoelectric properties was investigated The thickness of each layer by one time spinning was about 0.2 $\mu\textrm{m}$, and crack-free films was successfully deposited on 4 inches Pt/Ti/SiO$_2$/Si substrates by 0.5 mol solutions in the range from 0.2 $\mu\textrm{m}$ to 3.8 $\mu\textrm{m}$. Excellent P-E hysteresis curves were achieved without pores or any defects between interlayers. As the thickness increased , the (111) preferred orientation disappeared from 1$\mu\textrm{m}$ to 3 $\mu\textrm{m}$ region, and the orientation of films became random above 3 $\mu\textrm{m}$. Dielectric constants and longitudinal piezoelectric coefficient d$\_$33/, measured by pneumatic method were saturated around the value of about 1400 and 300 pC/N respectively above the thickness of 0.8 7m. A micromachined piezoelectric cantilever have been fabricated using 0.8 $\mu\textrm{m}$ thickness PZT (52/48) films. PZT films were prepared on Si/SiN$\_$x/SiO$_2$/Ta/Pt substrate and fabricated unimorph cantilever consist of a 0.8 fm thick PZT layer on a SiNx elastic supporting layer, which becomes vibration when ac voltage is applied to the piezoelectric layer. The dielectric constant (at 100 kHz) and remanent polarization of PZT films were 1050 and 25 ${\mu}$C/$\textrm{cm}^2$, respectively. Electromechanical characteristics of the micromachined PZT cantilever in air with 200-600 $\mu\textrm{m}$ lengths are discussed in this presentation.