Etch damage evaluation of $(Bi_{4-x}La_x)Ti_{3}O_{12}$ thin films using inductively coupled plasma sources
(유도결합 플라즈마를 이용한 $(Bi_{4-x}La_x)Ti_{3}O_{12}$ 박막의 식각 손상)
-
- Proceedings of the KIEE Conference
- /
- 2006.07c
- /
- pp.1374-1375
- /
- 2006