• Journal of the Korean Institute of Telematics and Electronics A
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• v.28A no.5
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• pp.375-379
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• 1991

Formation of TiAs precipitate through the reaction between TiSi2 with C54 structure and heavily doped arsenic ion in poly-silicon, and influence of TiSAs and silicon distribution resulted from the reaction TiSi2+As ->2Si on the morphology degradation have been studied.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.51-51
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• 2007

기존에 있는 Ti 합금의 여러 가지 단점을 보완하기 위해 골과의 탄성계수 차이를 줄이고 독성이 없는 Ta, Nb와 같은 ${\beta}$형 안정화 원소를 Ti 와 합금하여 Ti-30Ta-(3${\sim}$15wt%)Nb 합금을 제조하여 RF-magnetron sputter를 이용하여 Ti/HA 복합코팅을 하여 코팅된 합금의 전기화학적 특성을 조사하였다.

• Journal of the Korean Vacuum Society
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• v.10 no.2
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• pp.234-240
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• 2001

The diffusion barrier properties of TiN by using Cu(Mg) alloy film have been investigated. Cu(Mg) alloy film was deposited on air-exposed TiN film. Upon annealing, interfacial MgO of 100 $\AA$ has been formed due to the reaction of Mg with oxygen existed on the surface of TiN. Combined MgO/TiN structure prevented the interdiffusion of Cu and Si up to $800^{\circ}C$. To improve the adhesion of Cu(Mg) alloy film to the TiN, TiN layer was treated by $O_2$ plasma, followed by vacuum annealing at $300^{\circ}C$. It was found that increased oxygen on the surface of TiN film by plasma treatment enhanced segregation of Mg toward the interface, resulting in the formation of dense MgO layer. Improved adhesion characteristics have been formed through this treatment. However, increased power of $O_2$ plasma led to the formation of TiO$_2$ and decreased the Mg content to be segregated to the interface, resulting in the decrease in adhesion property. In addition, the deposition of 50 ${\AA}$ Si on the TiN enhanced the adhesion of Cu(Mg) alloy to TiN without deteriorating the TiN diffusion barrier characteristics.

• Journal of Korean Society of Environmental Engineers
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• v.27 no.9
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• pp.932-938
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• 2005

[ $TiO_2$ ] nanoparticles were prepared from the precipitation in $TiCl_4$ and the sol-gel profess in $Ti(OC_3H_7)_4$ as starting materials with various synthetic conditions. The samples were characterized by XRD, SEM, and TEM testing techniques. The photocatalytic degradation of congo red has been investigated in $TiO_2/UV$ process to evaluate photocatalytic activities for the samples. $TiO_2$ nanoparticles calcined at $400^{\circ}C$ had the best photocatalytic activity with the rate constant of the degradation of congo red as $0.0319\;min^{-1}$. The rate constant of $TiO_2$ photocatalysts was increased with the calcination temperature under $400^{\circ}C$ and decreased with the calcination temperature upper $400^{\circ}C$. In the case of $TiO_2$ photocatalysts, the photocatalytic activity wasn't greatly affected by the frequencies of usage. In the similar synthesis condition, the degradation efficiency of the $TiO_2$ particle prepared by $TiCl_4$ was increased to 8.8%, when the rate was compared with the sample prepared by $Ti(OC_3H_7)_4$. The photocatalytic activities of $TiO_2$ photocatalysts synthesized by $Ti(OC_3H_7)_4$ with various conditions were also discussed.

• Journal of Korean Ophthalmic Optics Society
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• v.13 no.1
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• pp.59-63
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• 2008

Purpose: Ti thin films were deposited on slide glass and CR-39 lenses using small magnetron sputtering apparatus to of Ti thin films. Methods: The thickness of Ti thin films were measured by cross section SEM, the transmittance and reflectance of them were obtained using spectrophotometer, the refractive index and extinction of them were obtained from VASE data. Results: The transmittances of Ti thin films with 60 nm, 120 nm, 140 nm thickness were a little change within the visual region from 400 nm to 750 nm, but were increased a little amount at near 400 nm. The transmittance of 60 nm, 120 nm, 140 nm Ti thickness in d-line was 30%, 25%, 20%, respectively. Also, it was shown that the refractive indices and extinction coefficients of the Ti thin films obtained from VASE were similar to those of Ti thin film offered macleod program. Conclusions: Ti films on CR-39 with these transmittances were available for sunglass lens. It was indicated that the refractive indices and extinction coefficients of the Ti thin films were decreased with the thickness of Ti thin film, for the thickness of Ti thin films was due to very thin.

• Journal of the Korean Chemical Society
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• v.17 no.3
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• pp.174-181
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• 1973

Dichlorodiacetatotitanium(IV) dissolves in alcohols with chemical reaction. Such solvolytic reaction of $TiCl_2(OAc)_2$with various alcohols has been studied by means of solution NMR spectroscopy and chemical analysis of the isolated products. The reaction of $TiCl_2(OAc)_2$ with primary alcohols has shown to be a quantitative two-step ligand substitution process as shown in the following: $TiCl_2(OAc)_2+ROH{\to}TiCl_2(OAc)_2(OR)+AcOH$ $TiCl_2(OAc)_2(OR)+ROH{\to}TiCl_2(OAc)_2+AcOH$The molecular form initially soluble in organic solvents has been found to be the monosubstituted species $TiCl_2(OAc)(OR)$. Alcoholysis with t-butyl alcohol has shown remarkable differences. When the mole ratio of t-butyl alcohol to $TiCl_2(OAc)_2$ is less than 1/2, the following reaction is dominant. $TiCl_2(OAc)_2+t-ButOH{\to}TiCl_2(OAc)_2+t-ButCl$However, at higher mole ratio another substitution process resembling the first step reaction with primary alcohols is competitively accompanied. The reaction with t-butyl alcohol also differs from that with primary alcohols in that only one either of the two chloro-or acetato-ligands in $TiCl_2(OAc)_2$ is subjected to substitution.

• Journal of Korean Society of Environmental Engineers
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• v.29 no.6
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• pp.662-669
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• 2007

The effect of advanced oxidation processes such as $O_3$, $UV/TiO_2$, $O_3/UV$ and $O_3/UV/TiO_2$ on decolorization and COD removal of Rhodamine B(RhB) wastewater were considered. The results showed that the higher the $O_3$ concentration was, the higher the decolorization observed and the optimum $TiO_2$ dosage was 0.4 g/L in $UV/TiO_2$ and $O_3/UV/TiO_2$ process. $O_3/UV$ process showed the higher initial decolorization rate constant and the shorter termination time for decolorization than those of the $O_3$ process. The decolorization rate constants in various systems followed the order of $O_3/UV/TiO_2>O_3/UV>O_3{\gg}UV/TiO_2$. The decolorization rate of the RhB solution in every processes was more rapid than the mineralization rate identified by COD removal. The latter took longer time for further oxidation. The COD removal rate constants in four systems followed the order of $O_3/UV/TiO_2>O_3/UV>UV/TiO_2{\geqq}O_3$. Among four processes, combined photocatalysis and ozonation$(O_3/UV/TiO_2)$ was the most prospective process for removing color and COD such as dye wastewater.

• Korean Journal of Materials Research
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• v.10 no.10
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• pp.671-676
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• 2000

$BaTiO_3$-based ceramics with partially oxidized Ti powders were prepared by sintering at $1350^{\circ}C$ for 1 h in v vacuum, and then heated in air. In this study, the effect of partially oxidized Ti powders on electrical properties and microstructures of $BaTiO_3$-based ceramics was investigated. It was found out that the semiconductive $BaTiO_3$-based ceramics beζame to show excellent PTCR (more than $10^5$) characteristic by adding 5~7 vol% of partially oxidized Ti powder. Also, it was found out that the sintered compact had extremely porous and fine-grained microstructure. The relative density and grain size of sintered compact with 5 vol% of partially oxidized Ti powders were 54% and $1.3\;{\mu\textrm{m}}$, respectively. The mechanism for the development of PTCR characteristic in $BaTiO_3$-based ceramics with partially oxidized Ti powders due to the adsorption of oxygen at grain boundaries, and could be explained, based on Heywang model.

• Korean Journal of Materials Research
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• v.14 no.3
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• pp.211-217
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• 2004

The oxidation behaviors of Ti-10Ta-10Nb alloy and Ti-6Al-4V alloy were studied in dry air atmosphere. Specimens were melted in consumable vacuum arc furnace and homogenized at $1050^{\circ}C$ for 24 h. Hot rolling was performed at $1000^{\circ}C$. Specimens of the alloys were oxidized as the temperature range $400~650^{\circ}C$ for 30 min. The oxidation behavior of the alloys was analysed by optical microscope, SEM/EDX, XRD, XPS and TGA. Immersion test was performed in 1% Lactic acid. In the microscope observation, oxide layer of Ti-10Ta-10Nb alloy was denser and thinner than Ti-6Al-4V's. The weight gains during the oxidation rapidly increased at the temperature above $600^{\circ}C$ in Ti-6Al-4V's alloy and$ 700^{\circ}C$ in Ti-10Ta-10Nb alloy. According to XRD results, oxide layers were composed of mostly $TiO_2$(rutile) phase. It was analysed that the passive film of the Ti alloys consisted of $TiO_2$ through X-ray photoelectron spectroscopy(XPS) analysis.

• Korean Journal of Materials Research
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• v.3 no.6
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• pp.593-597
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• 1993

Adhesion of CVD W to the TiN glue layer in the blanket W process which is a promising candidate for filing contact holes in subhalfmicron ULSIs has been investigated. The adhesion was enhanced with increasing the W film thickness due to the decrease of the TiN film stress. The adhesion strength was increased by the sputter etching of the TiN surface prior to the W deposition owing to the removal of contaminants and the increase of the surface roughness. The adhesion of the W film to the TiN glue layer property was also improved by Ar ion implantation of the TiN surface owing to the activation of the TiN surface.