A Study on the Deposition Condition for Stoichimetric $\textrm{Ta}_2\textrm{O}_5$ Thin Films by DC Magnetron Reactive Sputtering Technique
(DC Magnetron 반응성 스퍼터링 방법을 이용한 stoichiometric $\textrm{Ta}_2\textrm{O}_5$ 막의 증착조건에 관한 연구)
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- Korean Journal of Materials Research
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- v.9 no.6
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- pp.551-555
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- 1999