• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 추계학술대회 논문집
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• pp.71-74
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• 1996

Ta$_2$O$_{5}$ film ale recognized as promising capacitor dielectric for future DRAM\`s. The electrical properties of Ta$_2$O$_{5}$films greatly depend on the heating condition. In the practical fabrication process, several annealing process, such as the annealing of Al in H$_2$(about 40$0^{\circ}C$) and reflow of BPSG (borophosphosilicate glass) film in $N_2$(about 80$0^{\circ}C$), exist after deposition of Ta$_2$O$_{5}$ film. In this paper, we describe the temperature effect on the electrical properties of W/Ta$_2$O$_{5}$/Si structure. The thin film of Ta$_2$O$_{5}$ and tungsten have been deposited on p-si(100) wafer using the sputtering system. The heating temperature was varied from 500 to 90$0^{\circ}C$ in $N_2$for 30min and The degree of temperature is 100\`C. In a log(J/E$^2$) Vs 1/E plot of typical I-V data, we find a linear relationship for the temperature of 500, $600^{\circ}C$ and as deposition. This could indicate Fowler-Nordheim tunneling as the dominant mode of current transports. However, we can not find a linear relationship for the temperature above $700^{\circ}C$. This could not indicate Fowler-Nordheim tunneling as the dominant mode of current transport. The high frequency (1MHz) capacitance-voltage (C-V) of W/Ta$_2$O$_{5}$/Si Capacitor were investigated on the basis of shift in the threshold voltage and dielectric constant. The magnitude of the threshold voltage and dielectric constant depends on the heating temperature, and increases with heating temperature.temperature.

• 한국세라믹학회지
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• 제35권5호
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• pp.472-478
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• 1998

Ferroelectric SrBi2Ta2O9(SBT) films were deposited on Pt/Ti/SiO2/Si substrates at 50$0^{\circ}C$ using a sintered SBT target Bi and Ta targets by modified rf magnetron sputtering and then were annealed at 80$0^{\circ}C$ for 10min in oxygen ambinet(760 torr) The composition of the SBT films could be easily controlled using the mul-ti-targets. The film composition of {{{{ {Sr }_{0.8 } {Bi }_{2.9 } {Ta}_{2.0 } {O }_{9 } }} was obtained with SBTd sputtering power of 100 W Bi of 25W and Ta of 10 W. A 250nm thick SBT films exhibited a dense and uniform microstructure and showed the remanent polarization(Pr) of 14.4 $\mu$C/cm2 and the coercive field({{{{ {E }_{c } }})of 60 kV/cm at applied voltage of 5 V. The SBT films show practically no polarization fatigue up to {{{{ {10 }_{10 } }} cycles under 5V bipolar pulse. The retention characteristics of the SBT films looked very promising and the leakage current density of the SBT films was about 1.23$\times${{{{ {10 }^{-7 } }}A/c{{{{ {m }^{2 } }} at 120kV/cm.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권7호
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• pp.344-348
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• 2006

The effect of x on microwave dielectric properties of the $(1-x)Mg_4Ta_2O_9-x(TiO_2,\;CaTiO_3,\;SrTiO_3)$ ceramics for microwave components were investigated. All spcecimens prepared by the conventional mixed oxied method and sintered at $1450^{\circ}C$. Microwave dielectric properties of the $(1-x)Mg_4Ta_2O_9-xTiO_2$ ceramics were influenced by $MgTi_2O_5$ phase. Also the microwave dielectric properties of the $(1-x)Mg_4Ta_2O_9-x(TiO_2,\;CaTiO_3,\;SrTiO_3)$ ceramics were dominated with an addition of $CaTiO_3\;and\;SrTiO_3$. The dielectric constant $(\varepsilon_r)$, quality factor $(Q{\times}f_r)$ and temperature coefficient of the resonant frequency $(TCRF,\;\tau_f)$ of the $(1-x)Mg_4Ta_2O_9-x(TiO_2,\;CaTiO_3,\;SrTiO_3)$ ceramics were $12.96\sim70.98,\;5,132\sim186,410GHZ$ and $-35.82\sim+75.96ppm/^{\circ}C$, respectively, and depend on x and addition materials.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제51권8호
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• pp.340-346
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• 2002

Capacitor material utilized in the downsizing passive devices and integration of passive devices requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. common capacitor materials, $Al_2O_3$, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$, TaN and et al., used until recently have reached their physical limits in their application to integration of passive devices. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism. This study presents the dielectric properties $Ta_2O_{5}$ MIM capacitor structure Processed by $O_2$ RTA oxidation. X-ray diffraction patterns showed the existence of amorphous phase in $600^{\circ}C$ annealing under the $O_2$ RTA and the formation of preferentially oriented-$Ta_2O_{5}$ in 650, $700^{\circ}C$ annealing and the AES depth profile showed $O_2$ RTA oxidation effect gives rise to the $O_2$ deficientd into the new layer. The leakage current density respectively, at 3~1l$\times$$10_{-2}$(kV/cm) were $10_{-3}$~$10_{-6}$(A/$\textrm{cm}^2$). In addition, behavior is stable irrespective of applied electric field. the frequency vs capacitance characteristic enhanced stability more then $Ta_2O_{5}$ thin films obtained by $O_2$ reactive sputtering. The capacitance vs voltage measurement that, Vfb(flat-band voltage) was increase dependance on the $O_2$ RTA oxidation temperature.

• Journal of Magnetics
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• 제6권3호
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• pp.77-79
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• 2001

The semi-empirical superposition model has been applied to calculate the zero field splitting parameters of $Mn^{2+}$ion in $LiTaO_3$ single crystal, assuming that $Mn^{2+}$ion occupies one of two possible sites: $Li^{l+} \;or\; Ta^{5+}$ site, respectively. The 2nd-order axial zero field splitting parameters are $958\times10^{-4}cm^{-1}\; at\; Li^{1+}$ site and $193\times 10^{-4}cm^{-1} \;at\; Ta^{5+}$ site for $Mn^{2+}$ions. The 4th-order zero field splitting parameters at $Li^{l+} \;and\; Ta^{5+}$ sites are also determined. These calculated zero field splitting parameters are very important to determine the substitutional sites of doped impurity ions in $LiTaO_3$ crystal.

• 한국수소및신에너지학회논문집
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• 제7권1호
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• pp.81-92
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• 1996

Ar/Ar-$H_{2}$ 플라즈마법으로 V, Ta, B산화물과 금속의 환원 및 정련을 행하였다. 다시말해 Ar 플라즈마에서의 고온환원반응 및 Ar-(20%)$H_{2}$ 플라즈마에서의 정련 반응에 대한 연구를 각각 수행하였다. Ar 플라즈마 환원에 의하여 $C/V_{2}O_{5}$=4.50의 비에서 순도 96wt%의 조금속 Vdmf 얻었고, 바나듐 산화물의 열분해에 의한 $O_{2}$의 손실로 인해 $C/V_{2}O_{5}$=4.50에서 최대환원도가 얻어졌다. Ar-(20%)$H_{2}$ 플라즈마 정련에서는 $C/V_{2}O_{5}$=4.40의 비에서 99.2wt%의 금속 V을 얻었고, 주된 정련반응은 잔류탄소와 잔류산소의 반응으로 판단된다. 금속 Ta은 Ar 플라즈마 환원에 의하여 $C/Ta_{2}O_{5}$=5.10의 비에서 99.8wt%가 얻어졌고, $Ta_{2}O_{5}$의 열분해에 의한 $O_{2}$ 손실은 발생하지 않았다. Ar-(20%)$H_{2}$ 플라즈마 정련시 탈산반응이 탈탄반응보다 현저했으며, $C/Ta_{2}O_{5}$비가 4.50-5.10의 범위에서 99.9wt%의 금속 Ta을 제조하였다. 이 비에서는 탈산반응에 의한 잔류산소의 감소로 Ta외 Vickers 경도가 약 220Hv였다. 한편, Ar 및 Ar-$H_{2}$ 플라즈마에 의한 $B_{2}O_{3}$의 환원에는 C이 환원제로서 적합하지 않았으나, Fe원 소재와 C, $B_{2}O_{3}$ 및 페로보론을 고주파 유도 용해하였을 때 용강중에서의 $B_{2}O_{3}$의 환원으로 Fe-B-Si 합금을 얻었다.

• 한국자기학회지
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• 제25권2호
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• pp.43-46
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• 2015

$SiO_2$ 산화막이 제거되지 않은 Si(100) 기판 위에 실온에서 5 nm Ta과 5 nm MgO 기저층을 증착하고, 그 위에 RF 스퍼터링 기법으로 실온에서 약 35 nm 두께의 $Fe_3O_4$ 박막을 적층하였다. 진공 후열처리에 따라 향상된 $Fe_3O_4$ 박막의 결정성과 그에 따른 자기적 특성의 변화 양상을 관찰하였다. $500^{\circ}C$에서 1시간 동안 후열처리한 시료에 대해, 실온에서 강자성 특성을 보았을 뿐만 아니라, $Fe_3O_4$ 박막의 고유한 특성으로 알려진 Verwey 상전이 현상 또한 관찰되었다. 후열처리에 의해 MgO 박막 위에 적층된 $Fe_3O_4$에 미치는 Ta 기저층의 영향에 대해 Ta이 삽입되지 않은 경우와 비교하여 논의 할 것이다.

• 대한화학회지
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• 제27권4호
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• pp.273-278
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• 1983

합성표준시료를 이용하여 주석슬랙 중 유가금속들인 $Ta_2O_5, Nb_2O_5, TiO_2, SnO_2 $및 $ZrO_2$를 X-선형광분광법으로 정량하였다. 분석시료와 표준시료분말들을 융제인 무수 $Li_2B_4O_7$과 $La_2O_3$를 무게비 15:42:3의 비율로 균일하게 혼합한다. 혼합분말을 $1,150^{\circ}C$에서 30분간 용융하여 유리구슬을 만든다. 이 구슬을 325메쉬 이하로 분쇄하여 수압기를 이용 pellet으로 만들어 시편으로 사용한다. 분석결과들은 다른 분석법에 의해 얻은 값들과 허용오차 범위내에서 잘 일치한다. 또 PTS-H시료에 대한 표준편차가 함량 3.40 %에서 0.12 %로 재현성도 좋음을 보여 주었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1541-1543
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• 2003

The microwave dielectric properties of $0.6Mg_4Ta_2O_9-0.4TiO_2$ ceramics were investigated. All sample of $0.6Mg_4Ta_2O_9-0.4TiO_2$ ceramics were prepared by the conventional mixed oxide method, and sintered in the temperature of $1350^{\circ}C{\sim}1450^{\circ}C$. The structural properties of $0.6Mg_4Ta_2O_9-0.4TiO_2$ ceramics were investigated by the X-ray diffraction meter. According to the X-ray diffraction patterns of $0.6Mg_4Ta_2O_9-0.4TiO_2$ ceramics, the major phase of the hexagonal $0.6Mg_4Ta_2O_9-0.4TiO_2$ were presented, In the case of $0.6Mg_4Ta_2O_9-0.4TiO_2$ ceramics sintered at $1400^{\circ}C$ for 5hr., the dielectric constant, quality factor and temperature coefficient of resonant frequency were 12.19, 109.411GHz, -17.21ppm/$^{\circ}C$, respectively.

• Progress in Superconductivity
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• 제13권3호
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• pp.163-168
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• 2012

The effects of Ta substitution on the superconducting and magnetic properties of the $(Ru_{1-x}Ta_x)Sr_2(Gd_{1.4}Ce_{0.6})Cu_2O_z(0{\leq}x{\leq}0.5)$ system have been investigated. The X-ray diffraction measurements indicate that the Ta ion replaces Ru sites up to x = 0.4. It is found that the Ta substitution for Ru significantly reduces the weak-ferromagnetic component of the field-cooled magnetic susceptibility without an appreciable change of room temperature thermopower at lower Ta doping level below x = 0.2. The resistive transition temperature tends to decrease monotonically from 27 K for the x = 0 sample to 16 K (9 K) for the x = 0.4 (x = 0.5) sample. These results suggest that superconductivity of the $(Ru_{1-x}Ta_x)Sr_2(Gd_{1.4}Ce_{0.6})Cu_2O_z$ compound is not significantly affected by the magnetic state of the Ru sublattice. The experimental results are discussed in connection with previous reports on the effects of Nb substitution.