• Proceedings of the SCSK Conference
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• 1999.10a
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• pp.43-50
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• 1999

The planarized SiO$_2$ particles were prepared by two-step reduction method of making much smaller particles, micron-sized ones, to improve spreadability, adherence, and smoothness. Various pigments known as flaky extender usually have terrace layers on their surfaces, but SiO$_2$ particles in this study exhibit a smooth surface structure. These single SiO$_2$ particles were used as core particles to prepare the composite particles coated with ultra fine TiO$_2$ particles by a homogeneous precipitation method. The thickness and the morphology of the deposited TiO$_2$ layers could be modified by adjusting the reactant concentrations, the reaction time and the temperature. The characteristics of SiO$_2$/TiO$_2$ composite in the field of color cosmetics are to give an UV-cut effect and to enhance the chroma of human skin color, one of optical properties.

• Environmental Engineering Research
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• v.10 no.1
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• pp.31-37
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• 2005

The selective catalytic experiments using both sulfated/sulfur-free titania and V2O5/TiO2 catalysts have been conducted for NO reduction by NH3 in a packed-bed, down-flow reactor. The sulfated and vanadia loaded titania exhibited higher activity for NO removal than the sulfur-free catalysts, where > 90% NO removal was achieved over the sulfated V2O5/TiO2 catalyst between 280∼500 C. The surface structure of vanadia species on the catalyst surface played a critical role in the high performance of catalysts in which the existence of monomeric/polymeric vanadate is revealed by Raman spectra studies. Water vapor and SO2 were added to the reacting system for the catalyst deactivation tests. At higher temperatures (T ≥ 350 C), little deactivation was observed over the sulfated V2O5/TiO2 catalysts, showing good durability against SO2 and water vapor, which is compared with deactivation at lower temperatures.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.10a
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• pp.195-196
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• 2009

ITZO 박막과 $TIO_2$ 버퍼층은 각각 두 개의 캐소드를 사용한 마그네트론 2원동시 방전법과 산소 함량 2%를 사용한 반응성 sputtering 방법으로 각각 증착이 되었다. 모든 박막들은 상온에서 폴리머 기판인 PET에 증착되었다. $TiO_2$ 버퍼층을 도입함으로써 ITZO/$TiO_2$ 박막은 비정질 구조를 보여 주었고, 그것들의 비저항은 버퍼층의 두께가 증가할수록 감소함을 관찰하였다. 특히 기계적 특징은 $TiO_2$ 버퍼층을 5nm 증착하였을 경우에 bending test와 광학 현미경의 crack정도를 관찰함으로써 향상되었음을 확인할 수 있었다. 투과율에 있어서 단일 ITZO 박막과 버퍼층을 5nm 도입한 박막은 가시광선에서 약 75%의 투과율을 가짐을 알 수 있었다.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.76-80
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• 2000

CF & $CF_2$ radicals in a $C_4F_8$ inductively coupled plasma were observed with laser induced fluorescence. 251.9nm UV laser was used for the $CF_2$ excitation and 265.3nm UV emitted light for the detection which has the maximum intensity among many induced fluorescence lights. In the case of CF radical detection, 232.9nm UV laser was used for the excitation and 247.6nm for the detection. $CF_2$ radical density increased toward substrate, while CF radical had its maximum at about 10nm away from the substrate. The atomic fluorine density which was studied by the actinometry increased as the position moves away from the substrate. This phenomena was thought to have a close relation with the polymer growth on the wafer. When the bias voltage increased, $CF_2$ , CF radicals decreased while the atomic fluorine increased tio some extent and then decreased, which was thought to be due to the change in the ionization and dissociation.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.24 no.3
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• pp.59-64
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• 1998

In order to lower porosity of the porous silica, titanium alkoxide solution was filled in the pore of silica in the heating-vacuum condition. The specific surface area of modified samples was decreased effectively from 900 m$^2$/g to 100 m$^2$/g. (The aggregation phenomena in modified samples were improved fairly.) Samples were heated at 600 , and then the titanium alkoxide in the pore was decomposed completely to titanium oxide from TGA-DTA measurement. From SEM result, it was evident that titanium oxide did not coat the surface of the silica. The modified samples were analyzed using SEM, DTA-TGA, BET, and UV-visible spectrometer.

• Korean Journal of Materials Research
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• v.4 no.6
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• pp.669-680
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• 1994

Oxidation behaviour of TiAl intermetallic compounds with the addition of Cr, V, Si, Mo, or Nb was investigated at 900~$1100^{\circ}C$ under the atmospheric environment. The reaction products were examined by XRD, SEM equipped with WDX. The weight gain by continuous oxidation increased with the addition of Cr or V, but there was less weight gain when Mo, Si or Nb was added individually. he oxidation rate of Cr- or V-added TiAl was always larger than that of TiAI. However, oxidation rate of Si-, Mo- or Nb-added TiAl was almost same or smaller than that of TiAI. Thus, it is concluded that the addition of Cr or V did not improve the oxidation resistance, whereas the addition of Si, Mo or Nb improved the oxidation resistance. Oxides formed on TiAl with Mo, Si, and Nb were found to be more protective, resulting from the decrease in diffusion rate of the alloying elements and oxygen. Nb strengthened the tendency to form $AI_{2}O_{3}$ in the early stage of oxidation, due to the continuous $AI_{2}O_{3}$ layer formation and dense $Tio_{2}+AI_{2}O_{3}$ layer. According to the Pt-marker test of TiAI- 5wt%Nb, oxygen diffused mainly inward while oxides were formed on the substrate surface. Upon thermal cyclic oxidation at $900^{\circ}C$, it is shown that the addition of Cr or Nb improved the adherence of oxide scale to the substrate.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.4 no.4
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• pp.378-387
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• 1994

To improve the properties of $PbTiO_3$ thin films successfully grown by thermal diffusion of 3 component layers of $Ti0_2/Pb/TiO_2(900{\AA}/900{\AA}/900{\AA})$ in preceding research, 3, 5, 7, 9, and 11 multilayer structures $(TiO_2/Pb/.../Tio_2)$ with thinner component layer of $200~300 {\AA}$ thick were deposited on Si substrate by RF sputtering, which were followed by RTA to form $PbTiO_3$ thin films. As a result, $PbTiO_3$ single phase was formed above $500^{\circ}C$. When the thickness of component layer reduced and the number of component layers increased, suppression of Pb-silicate and voids formation resulted in relatively sharp interfaces and the film composition became more homogeneous. Relative dielectric constants in MIM structure were independent of the annealing condition, but they increased with increasing thickness of the $PbTiO_3$ thin films. The maximum breakdown field in MIS structure reached 150kV/cm.

• Journal of Korean Vacuum Science & Technology
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• v.3 no.2
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• pp.139-144
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• 1999

Hydrogen concentration depth profiles in homoepitaxial Si(001) films grown from hyper-thermal Si beams generated by ultrahigh vacuum (UHV) ion-beam sputtering have been measured by nuclear reaction analyses as a function of film growth temperature and deposition rate. Bulk H concentrations CH in the crystalline Si layers were found tio be below detection limits, 1${\times}$1019cm-3, with no indication of significant H surface segregation at the crystalline/amorphous interface region. This is quite different than the case for growth by molecular-beam epitaxy (MBE) where strong surface segregation was observed for similar deposition conditions with average CH values of 1${\times}$1020cm-3 in the amorphous overlayer. The markedly decreased H concentrations in the present experiments are due primarily to hydrogen desorption by incident hyperthermal Si atoms. Reduced H surface coverages during growth combined with collisionally-induced filling of interisland trenches and enhanced interlayer mass transport provide an increase in critical epitaxial thicknesses by up to an order of magnitude over previous MBE results.

• Proceedings of the Korean Ceranic Society Conference
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• 2003.04a
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• pp.21.1-21
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• 2003

• Journal of Photoscience
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• v.2 no.1
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• pp.7-11
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• 1995

Powders of artificial crystallites of titanium(IV) oxide, TiO$_2$(B), were synthesized by the calcination of tetratitanic acid (hydrate, $H_2Ti_4O_9H_2O$; TTA). The relating titanates, potassium octatitanate ($K_2Ti_8O_{17}$) and octatitanic acid($H_2Ti_8O_{17}$), were also prepared. These powders, loaded with small amount of Pt, were suspended in an aqueous solution of 2-propanol and irradiated under argon atmosphere at 298 K + 0.5 deg. All the photocatalysts tested in this study produced almost equimolar amount of acetone and molecular hydrogen (H$_2$). Among them TiO$_2$(B) and TYA showed the higher photocatalytic activity but rather lower than commercial titanium(IV) oxide (TiO$_2$) powders. The photocatalytic activity of TiO$_2$(B) for 2-propanol dehydrogenation in deaerated aqueous suspension increased with the elevating calcination temperature. Comparison of rate of H$_2$ formation from methanol and 2-propanol solutions by the TiO$_2$(B) photocatalyst suggested a possibility of selection of substrate with its molecular size by TiO$_2$(B)