• Title/Summary/Keyword: $SrTiO_3$$BaTiO_3$

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Annealing under low oxygen partial pressure for crystal growth of BaTiO$_3 $thin films prepared by coating-pyrolysis process (코딩-열분해법에 의해 제조한 BaTiO$_3 $ 박막의 결정 성장을 위한 낮은 산소 분압에서의 열처리)

  • Kim, Seung-Won
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.2
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    • pp.111-115
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    • 2000
  • $BaTIO_3$ thin films were prepared on (100) $BaTIO_3$ substrates by coating- pyrolysis process using metal-organic compounds of Ba and Ti. The amorphous films prefired at $450^{\circ}C$were crystallized above $700^{\circ}C$ under oxygen partial pressure of $2\times 10^{-4}$. The lattice parameters of the perpendicular axis for the $BaTIO_3$ thin films heat-treated below $800^{\circ}C$ were closer to a value of cubic $BaTIO_3$, whereas those above $800^{\circ}C$ were closer to a value of tetragonal BaTiG. The results of XRD P scan and pole-figure analyses indicated that BaTiO, thin films have an epitaxial relationship with the $SrTiO_3$ substrates. The $BaTIO_3$thin films annealed at$800^{\circ}C$ showed the surface with island-like grains about 0.4$mu \textrm{m}$ and the cross section of 0.8 $mu \textrm{m}$ thickness with granular grains.

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Preparation and Characteristics of $(Ba_{1-x}Sr_x)TiO_3$ Thin Films by the Sol-gel Process (졸-겔법을 이용한 $(Ba_{1-x}Sr_x)TiO_3$ 박막의 제조 및 특성)

  • 황규석;김병훈
    • Journal of the Korean Ceramic Society
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    • v.32 no.4
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    • pp.516-524
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    • 1995
  • In this study, to prepare the dielectric (Ba, Sr)TiO3 thin films by the sol-gel process, Titaminum (IV) sio-propoxide (Ti[OCH(CH3)2]4), Ba and Sr acetate were used for sol and thin films were prepared by dip-coating process. Stability of sol decreased with the increase of Sr, and thickness of thin films were obtained 0.13~0.17${\mu}{\textrm}{m}$ by 1 coating cycle. Transmittance of amorphous thin films heated at 500 and 55$0^{\circ}C$ was very good, and crystallization tendency of thin films according to heat-treatment temperature and crystallization characteristics of thin films heated at 11$0^{\circ}C$ for 3 hrs were analysed. As a result, good perovskite structure was obtained higher than 100$0^{\circ}C$, and tetragonality of thin film was decreased but pyrochlore was formed with increasing Sr. In case of addition to substitute 0.4mol% Sr for Ba, dielectric constant was 288 and loss factor (tan $\delta$) was 0.04.

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Establishment of Preparation Conditions for High-Tc Superconducting Y-Ba-Cu-O Thin Film by Chemical Vapor Deposition (화학증착법에 의한 고온 초전도 Y-Ba-Cu-O 박막의 제조 조건 확립에 관한 연구)

  • Park, Joung-Shik;Cho, Ik-Joon;Kim, Chun-Yeong;Lee, Hee-Gyoun;Won, Dong-Yeon;Shin, Hyung-Shik
    • Applied Chemistry for Engineering
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    • v.3 no.3
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    • pp.412-421
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    • 1992
  • The superconducting thin films have shown a growing possibility for practical application in microelectronic fields in recent years. In this study, the high Tc superconducting Y-Ba-Cu-O thin films were prepared on various substrates by chemical vapor deposition method using organic metal chelates of $Y(thd)_3$, $Ba(thd)_2$, and $Cu(thd)_2$ as source materials. The deposition reactions were carried out on single crystalline MgO(100), YSZ(100), $SrTiO_3(100)$, and polycrystalline $SrTiO_3$ substrates. Deposition thickness of thin films was linearly increased with the increase of deposition time. It turned out that the Y-Ba-Cu-O thin films on MgO(100), YSZ(100), and $SrTiO_3(100)$ single crystal substrates showed superconductivities above liquid nitrogen temperature($T_{c,onset}=87{\sim}89K$, $T_{c,zero}=85{\sim}86K$), but the one on polycrystalline $SrTiO_3$ substrate did not.

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The Etching Characteristics of (Ba0.6Sr0.4)TiO3 films Using Ar/CF4 Inductively Coupled Plasma (Ar/CF4 유도결합 플라즈마를 이용한 (Ba0.6Sr0.4)TiO3 박막의 식각 특성)

  • 강필승;김경태;김동표;김창일;이수재
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.11
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    • pp.933-938
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    • 2002
  • (Ba,Sr)TiO$_{4}$ (BST) thin films on Pt/Ti/SiO$_{2}$/Si substrates were deposited by a sol-gel method and the etch characteristics of BST thin films have been investigated as a function of gas mixing ratio. The maximum etch rate of the BST films was 440 $AA$/min under such conditions as: CF$_{4}$(CF$_{4}$+Ar) of 0.2, RF-power of 700 W, DC-bias voltage of -200 V, pressure of 15 mTorr and substrate temperature of 30 $^{circ}C$. The selectivities of BST to Pt, SiO$_{2}$ and PR were 0.38, 0.25 and 0.09, respectively. In the XPS (X-ray photoelectron spectroscopy) analysis, Barium (Ba) and Strontium (Sr) component in BST thin films formed low volatile compounds such as BaFx, SrFx, which are forms by the chemical reaction with F atoms and is removed by Ar ion bombardment. Titanium (Ti) is removed by chemical reaction such as TiF with ease. The result of secondary ion mass spectrometry (SIMS) analysis confirmed the existence of the BaFx, SrFK, TiFx.

Electric Properties of $LiCO_3$ doped $(Ba_{0.5}Sr_{0.5})TiO_3$ Thick Films ($LiCO_3$가 첨가된 $(Ba_{0.5}Sr_{0.5})TiO_3$ 후막의 전기적 특성)

  • Nam, Sung-Pill;Park, In-Gil;Lee, Sung-Gap;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 2006.07c
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    • pp.1432-1433
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    • 2006
  • $Li_{2}CO_3$ doped $Ba_{0.5}Sr_{0.5}TiO_3$ ceramics were fabrication by sol-gel method. Sintering temperature must be suited to the LTCC technology. Structure and dielectric properties were investigated for effect of $Li_{2}CO_3$ dopants at BST. Structure of $Li_{2}CO_3$ doped $Ba_{0.5}Sr_{0.5}TiO_3$ ceramics were dense and homogeneous with almost no pore. Relative permittivity was decreased and dielectric loss was increased with increasing $Li_{2}CO_3$ doping rations. In the case of the 3wt% $Li_{2}CO_3$ doped $Ba_{0.5}Sr_{0.5}TiO_3$ ceramics sintered at $900^{\circ}C$, relative permittivity and dielectric loss were 907 and 0.003 at 100 kHz.

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Microwave Dielectric Properties of the $0.98MgTiO_3-0.02BaTiO_3$ Ceramics with Sintering Temperature (소결온도에 따른 $0.98MgTiO_3-0.02BaTiO_3$ 세라믹스의 마이크로파 유전특성)

  • Choi, Eui-Sun;Lee, Moon-Kee;Lee, Sung-Gap;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05c
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    • pp.123-126
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    • 2001
  • The $0.98MgTiO_3-0.02BaTiO_3$ ceramics were prepared by the conventional mixed oxide method. The structural properties were investigated with sintering temperature and composition ratio by XRD, SEM and EDS. According to the X-ray diffraction patterns of the $0.98MgTiO_3-0.02BaTiO_3$ ceramics, the hexagonal $BaMg_6Ti_6O_{19}$ and ilmenite $MgTiO_3$ structures were coexisted. The dielectric constant$({\varepsilin}_r)$ and quality factor$(Q{\times}f_r)$ were decreased with increasing the sintering temperature in the range of $1275^{\circ}C{\sim}1350^{\circ}C$. In the case of the $0.98MgTiO_3-0.02BaTiO_3$ ceramics sintered at $1275^{\circ}C$, dielectric constant, quality factor and temperature coefficient of resonant frequency were 20.27, 76,845, $-46.6ppm/^{\circ}C$, respectively.

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Design and Fabrication of Distributed Analog Phase Shifter Using Ferroelectric (Ba,Sr)TiO$_3$ Thin Films (강유전체 (Ba,Sr)TiO$_3$ 박막을 이용한 분포 정수형 아날로그 위상변위기 설계 및 제작)

  • 류한철;김영태;문승언;곽민환;이수재
    • Proceedings of the Korea Electromagnetic Engineering Society Conference
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    • 2002.11a
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    • pp.370-374
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    • 2002
  • This paper describes the design and fabrication of distributed analog phase shifter circuit. The phase shifter consist of coplanar waveguide(CPW) lines that are periodically loaded with voltage tunable (Ba,Sr)TiO$_3$ thin film interdigital(IDT) capacitors deposited by the pulsed laser deposition(PLD) on (001) MgO single crystals. The phase velocity on these IDT loaded CPW lines is a function of applied bias voltage, thus resulting in analog phase shifting circuits. The measured differential phase shift is 48$^{\circ}$ and the insertion loss decreases from -5㏈ to -3㏈ with increasing bias voltage from 0 to 40 V at 100㎐.

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A study on the structural properties of (Ba,Sr)TiO$_3$ Ceramics Thin Films by RF Sputtering Technique (RF Sputtering법에 의한 (Ba,Sr)TiO$_3$ 세라믹 박막의 구조적 특성에 관한 연구)

  • 신승창;정장호;배선기;이영희
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.217-220
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    • 1997
  • (Ba,Sr)TiO$_3$ thin film capacitors were prepared on SiO$_3$/Si(100)wafer by RF sputtering technique. The structural and crystallographic properties were studied with deposition conditions and annealing temperatures. Microstructural properties of (Ba,Sr)TiO$_3$ thin films were investigated by the SEM, XRD. The thickness and grain size were studied for the varying of RF power and temperature.

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