• Journal of the Korean Ceramic Society
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• v.29 no.5
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• pp.357-366
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• 1992

Residual organics were considered as impurity in Sol-Gel method. The purpose of this study was to find the conditions to contain as much residual organics as possible in silica gel prepared from TEOS(tetraethylortho-silicate) by Sol-Gel method. Residual organics are to be expected to have reduction effect on synthesizing Si3N4 from silica gel. The results of this study are follows: 1) The maximum content of entrapped carbon was 19.8 wt.%(C/SiO2=0.25 wt.ratio) in silica gel synthesized under the conditions 1.5 fold mole water for incomplete hydrolysis, 2.5 fold mole phenol as a solvent and 0.1 fold mole HCl as a catalyst to TEOS. 2) Silica gel with organics entrapped by Sol-Gel method had a positive effect on the formation of Si3N4 compared with commercial silica gel. 3) Sintered body of synthesized $\alpha$-Si3N4 with Y2O3 and Al2O3 as additives at 175$0^{\circ}C$ in N2 atmosphere showed bending strength, 602$\pm$20 MPa and frature toughness 4.45$\pm$0.15 MPa.m1/2.

• Journal of the Korean Ceramic Society
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• v.46 no.6
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• pp.545-547
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• 2009

An immiscible Si/Sn (=7/3 by volume) powder mixture was subjected to simple grinding and subsequent leaching process to give Sn nanopowder reinforced or dispersed in Si powder. Crystallite and their agglomerates of Si were ca. 15 nm and 100 nm, respectively. Sn remained at 4.5 vol% in Si powder after aqueous HCl leaching, dispersively occluded in Si matrix as confirmed by ICP analysis and cross sectional TEM observation.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.169.1-169.1
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• 2013

산업 및 기술의 발전에 의해 많은 신소재들이 개발되고 있다. 그 중에서 SiC는 고온재료, LED, 반도체 등의 우주선 표면재료, 핵융합로 구조재료, 고온 씰, 히터 등 여러 산업분야에서 관심을 가지면서 다양한 가스를 이용한 합성법이 개발되어 있다. 최근에는 분말의 형태 및 크기를 용도에 맞게 개발해서 사용하고 있는 상황이다. 그런데 각 합성법에 따른 합성원리에 대해서는 여러 가지 주장이 있다. 그 중에서 몇 가지 합성법에 대해서 고찰하고 합성의 원리를 추론한다. 그리고 그 중의 한 가지인 CH3SiCl3 가스를 이용한 SiC 나노분말 합성과 SiC의 결정성장 과정에서 나타나는 whisker의 형성을 확인했다. 정교한 SiC 분말합성은 일반적으로 sol-gel, 플라즈마(DC, AC 및 ICP 등) 등을 이용한 방법이 개발되어 있다. 이와 같이 정교한 SiC 나노분말 등은 실리콘 유기 화합물 중합체(trichloromethylsilane, polycarbosilane 등)의 열분해를 통해 합성 할 수 있으며, 열분해 는 약 1,000{\sim}1,500^{\circ}C의 온도 영역에서 일어난다. 이 과정에서 고분자의 열분해 및 재결합 이 동반되고 부산물로서 HCl, CH4 등의 유해가스를 같이 생성한다. 합성된 SiC 나노분말은 전형적인 ${\beta}-SiC$로 XRD의 관찰결과 (111), (220), (311)의 방향성을 갖는 것을 확인했으며 평균입자의 크기는 약 30 nm 정도다.

• Journal of the Korean Ceramic Society
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• v.27 no.5
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• pp.668-676
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• 1990

Glass in the ZrO2-SiO2 system containing up to 30mol% ZrO2 were prepared by heating the gel made from the mixed solutions of Zr(OC3H7)4 and partial hydrolysed Si(OC2H5)4. As a result, the monolith gel was made from the HCl and water content as 2.7$\times$10-3 and 8 molar ratio to alkoxide and drying temoperature as 4$0^{\circ}C$. Heating rate of dry gel maintained under 0.5$^{\circ}C$/min and heating at a temperature as 90$0^{\circ}C$ was found to be for making the transparent glass.

• Journal of the Korean Ceramic Society
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• v.28 no.7
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• pp.517-524
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• 1991

The CVD process of BPSG (BoroPhosphoSilicate Glass) and its thin film properties were studied. B2H6, PH3, SiH4 and O2 gases were reacted in a AP (Atmospheric Pressure) CVD system in the temperature range of 300℃ and 460℃. The interaction of B2H6 and PH3 was studied from the deposition rate and dopant incorporation change point of view. The dependency of BPSG step coverage on the temperature was changed with different O2/(B2H6+PH3+SiH4) ratio. Finally, the boundary which distinguishes the stable BPSG's from the ones that react with Di (Deionized) water or cleaning chemicals such as H2SO4, HCl, H2O2, NH4OH etc could be defined.

• Journal of fish pathology
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• v.26 no.1
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• pp.51-56
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• 2013

It is reported that abalone, Haliotis discus hannai, was detached from shelters by commercial oxytetracycline (OTC) dissolved in hydrochloric acid (HCl). In the present study, we investigated the exfoliation effect of fouling abalone by organic acids instead of OTC or HCl. Organic acids (malic acid, citric acid, lactic acid and formic acid) of pH 2.6 and pH 2.1-2.3 exfoliated over 67.6% and 91.7% of abalone, respectively; while OTC of pH 2.6 and pH 2.1-2.3 exfoliated 25.9% and over 74.1% of abalone, respectively. These results indicate that the exfoliation effect of organic acid is better than that of OTC dissolved in HCl at the same pH. However, a lower pH and longer treatment of organic acids resulted in delayed recovery of the detached abalone; abalone immersed in pH 2.3 for 10 second was recovered within 5 min, but took 12 min to recover after 30 second immersion. Moreover, recovery period for abalone exposed to pH 2.1 for 30 second was at least 15 min 45 second. In conclusion, though acids need to be cautiously handled, organic acids may be a better candidate to detach abalone instead of OTC or HCl.

• Journal of the Korean Institute of Telematics and Electronics
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• v.25 no.11
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• pp.1358-1366
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• 1988

The dual dielectric films have been grown on single-crystalline silicon substrates with the thickness ranging from 125A to 180A at various gas and temperature conditions by using rapid thermal process that included independent nitridation step. The film characteristics and their dependence on the contents of the hydrochloric gas and the processing time have been studied. By the addition of the hydrochloric gas, the initial oxide thickness was significantly changed, but after sequential nitridation processes the thickness of the films was nevertheless a little bit varied within 10A. All the samples of the dual dielectric films show the increased breakdown voltages in proportion to the additive contents of the hydrochloric gas and also show the higher breakdown strengths than the thermal oxide and nitrided oxide films grown by the conventional furnance process or the rapid thermal nitridation process that was composed of the dependent nitridation cycles.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.418.2-418.2
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• 2016

$Al_2O_3$ passivation layer has excellent passivation properties at p-type Si surface. This $Al_2O_3$ layer forms thin $SiO_2$ layer at the interface. There were some studies about inserting thermal oxidation process to replace naturally grown oxide during $Al_2O_3$ deposition. They showed improving passivation properties. However, thermal oxidation process has disadvantage of expensive equipment and difficult control of thin layer formation. Wet chemical oxidation has advantages of low cost and easy thin oxide formation. In this study, $Al_2O_3$/$SiO_2/Si(100)$ interface was formed by wet chemical oxidation and PA-ALD process. $SiO_2$ layer at Si wafer was formed by $HCl/H_2O_2$, $H_2SO_4/H_2O_2$ and $HNO_3$, respectively. 20nm $Al_2O_3$ layer on $SiO_2/Si$ was deposited by PA-ALD. This $Al_2O_3/SiO_2/Si(100)$ interface were characterized by capacitance-voltage characteristics and quasi-steady-state photoconductance decay method.

• KOREAN JOURNAL OF PACKAGING SCIENCE & TECHNOLOGY
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• v.3 no.2
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• pp.25-31
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• 1996

Various treaments such heating, acid tenting, acid healing, alkaline treating, acid+alkaline renting were attempted to investigate their effects on molar ratio, chemical composition, DTA and specific surface area(SSA) of natural zeolite poder. Molar ratio, Si to AI. of natural zeolite was 4.78, which represented high silica type. Composition of natural zeolite showed that $SiO_2$ was 66.34% $Al_2O_3$ was 13.89%, $Fe_2O_2$ was 1.55% X-ray diffraction showed that main component of natural zeolite was mordenite and clinoptliolite. Differential Thermal Analysis and Thermogravimetry curve of natural zeolite was showed to peak of endothermic peak at $80^{\circ}C$ and it means to the peak of dehydrate reaction, but recristalization was not formed below at $1,000^{\circ}C$. Weight loss during calcination was 16% at $1,000^{\circ}C$. Thermal treatments on SSA of natural zolite powder decreased from $75.2m^2/g\;to\;2.1m^2/g$. In contrast chemical treatments on SSA showed to increase to $300.2m^2/g$(1 N HCl treating), $54.9m^2/g$(1 N NaOH) and $90.9m^2/g$(HCl+NaOH)tudy, it could be proposed to employ acid tret method as packaging materisls for MA packaging.

• Current Research on Agriculture and Life Sciences
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• v.1
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• pp.55-65
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• 1983

The purpose of this study is to find out influences of several chemicals on the solubility of cocoon sericin in water, and there are several results of use to control the solubility of cocoon sericin in water. The results obtained are summarized as follows : The chemical which shows the strongest accelerating power of the solubility of cocoon sericin in water is Sodium Hydroxide (NaOH), the second is Potassium Hydroxide (KOH), the third is Sodium Silicate ($Na_2SiO_3$), and the weakest is Sodium Bicarbonate ($NaHCO_3$) in order among noticed silk-reeling accelerators. The chemical which shows the strongest inhibiting power of the solubility of cocoon sericin in water is Form Aldehyde (HCHO), the second is Ammonium Alum ($Al_2(SO_4)_2{\cdot}(NH_4)_2SO_4{\cdot}24H_2O$), the third is Acetic Acid ($CH_3COOH$), the weakest is Hydrochloric Acid(HCl) in order among noticed silk-reeling inhibitors. Particulary Hydrochloric Acid (HCl), which is expected to show strong inhibiting power of the solubility of cocoon sericin in water, shows accelerating power of the solubility of cocoon sericin at high temperature over 80 degrees of Celsius thermometer in water.