• 제목/요약/키워드: $SO_2$ Oxidation

검색결과 641건 처리시간 0.025초

${H_2}{O_2}$/$Fe^0시스템을 이용한 유류오염 미세토양의 화학적 산화처리 (Chemical Oxidation Treatment of Hydrocarbon-Contaminated Eine Soil by ${H_2}{O_2}$/$Fe^0 System)

  • 지원현;김지형;강정우;김성용;장윤영
    • 한국지하수토양환경학회지:지하수토양환경
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    • 제6권3호
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    • pp.13-20
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    • 2001
  • 본 연구에서는 고농도 유류오염토양 처리를 위해 ${H_2}{O_2}$/$Fe^0 시스템을 이용한 Fenton-like oxidation을 제시하였다. 주요 반응조건인 초기 PH, $Fe^0${H_2}{O_2}$ 주입량과 초기 오염농도를 변화시켜가며 본 산화처리 시스템의 반응특성을 회분식 실험을 통하여 알아보았다. 유류 오염물은 디젤을 사용하였으며 오염농도는 가스 크로마토그래피를 사용하여 TPH (Total Petroleum Hydrocarbon)로 나타내었다. 제거효율을 보면 적정 ${H_2}{O_2}$/$Fe^0 주입조건인 10% ${H_2}{O_2}$+ 20% Fe$^{0}$ 에서 반응시간 24이내에 약 65% 이상의 제거율(초기 TPH 농도 : 10,000mg/kg)을 나타내었으며, 초기 pH조건은 높은 제거효과를 얻기 위해서 3~4범위이내가 적정함을 알 수 있었다. 기존의 과산화수소의 분해촉매로 사용하는 철 염($FeSO_4)과의 비교실험에서는 $Fe^0를 촉매로 사용하였을 때 유류오염토양의 화학적 산화 처리가 처리효율과 경제성에서 더 효과적임을 알 수 있었고, 특히 고농도 오염토양 처리에서 더 유리한 것으로 나타났다.

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Effect of SiC and WC additon on Oxidation Behavior of Spark-Plasma-Sintered ZrB2

  • Kim, Chang-Yeoul;Choi, Jae-Seok;Choi, Sung-Churl
    • 한국분말재료학회지
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    • 제26권6호
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    • pp.455-462
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    • 2019
  • ZrB2 ceramic and ZrB2 ceramic composites with the addition of SiC, WC, and SiC/WC are successfully synthesized by a spark plasma sintering method. During high-temperature oxidation, SiC additive form a SiO2 amorphous outer scale layer and SiC-deplete ZrO2 scale layer, which decrease the oxidation rate. WC addition forms WO3 during the oxidation process to result in a ZrO2/WO3 liquid sintering layer, which is known to improve the anti-oxidation effect. The addition of SiC and WC to ZrB2 reduces the oxygen effective diffusivity by one-fifth of that of ZrB2. The addition of both SiC and WC shows the formation of a SiO2 outer dense glass layer and ZrO2/WO3 layer so that the anti-oxidation effect is improved three times as much as that of ZrB2. Therefore, SiC- and WC-added ZrB2 has a lower two-order oxygen effective diffusivity than ZrB2; it improves the anti-oxidation performance 3 times as much as that of ZrB2.

Evaluation of electrical energy consumption in UV/H2O2 advanced oxidation process for simultaneous removal of NO and SO2

  • Shahrestani, Masoumeh Moheb;Rahimi, Amir
    • Environmental Engineering Research
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    • 제24권3호
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    • pp.389-396
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    • 2019
  • The electrical energy consumption (EEC) in removal of NO by a $UV/H_2O_2$ oxidation process was introduced and related to removal efficiency of this gas. The absorption-reaction of NO was conducted in a bubble column reactor in the presence of $SO_2$. The variation in NO removal efficiency was investigated for various process parameters including NO and $SO_2$ inlet concentrations, initial concentration of $H_2O_2$ solution and gas flow rate. EEC values were obtained in these different conditions. The removal efficiency was increased from about 22% to 54.7% when $H_2O_2$ concentration increased from 0.1 to 1.5 M, while EEC decreased by about 70%. However, further increase in $H_2O_2$ concentration, from 1.5 to 2, had no significant effect on NO absorption and EEC. An increase in NO inlet concentration, from 200 to 500 ppm, decreased its removal efficiency by about 10%. However, EEC increased from $2.9{\times}10^{-2}$ to $3.9{\times}10^{-2}kWh/m^3$. Results also revealed that the presence of $SO_2$ had negative effect on NO removal percentage and EEC values. Some experiments were conducted to investigate the effect of $H_2O_2$ solution pH. The changing of pH of oxidation-absorption medium in the ranges between 3 to 10, had positive and negative effects on removal efficiency depending on pH value.

마이크로웨이브 플라즈마를 통한 메탄의 산화반응 (Oxidation of Methane via Microwave Plasmas)

  • 안범수
    • 한국응용과학기술학회지
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    • 제17권2호
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    • pp.89-93
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    • 2000
  • The oxidation of methane was carried out in six different configurations of plasma reactors in order to study the radical reactions inside and outside of the plasma zone and to explore the method to control them. Various radicals and reactive molecules, such as CH, $CH_{2}$, $CH_{3}$, H, and O(from $O_{2}$) were generated in the plasma. A variety of products were produced through many competing reaction pathways. Among them. partial oxidation products were usually not favored, because the intermediates leading to the partial oxidation products could be oxidized further to carbon dioxides easily. It is important to control the free radical reactions in the plasma reactor by controlling the experimental conditions so that the reactions leading to the desired products are the major pathways.

배출가스의 질소산화물과 이산화황 동시 저감 기술 (Various Technologies for Simultaneous Removal of NOx and SO2 from Flue Gas)

  • 박현우;엄성현
    • 공업화학
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    • 제28권6호
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    • pp.607-618
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    • 2017
  • 석탄화력발전소를 포함한 다양한 산업설비에서 유해 대기오염물질이 배출되고 있으며, 이러한 오염물질은 인체 건강과 자연 생태계에 영향을 준다. 특히, 질소산화물($NO_x$)와 이산화황($SO_2$)은 인체 건강에 악영향을 주는 미세먼지($PM_{2.5}$) 형성에 원인물질로 알려져 있다. 이러한 $NO_x$$SO_2$ 배출을 저감하기 위해서 선택적 촉매 환원(SCR)과 습식 탈황 공정(WFGD)으로 결합된 혼합 시스템이 사용되고 있으나, 높은 설치비용 및 운전비용을 필요로 하며, 유지보수의 문제점, 기술적인 한계점을 가지고 있다. 최근에 이러한 혼합 시스템을 대체하기 위한 $NO_x$, $SO_2$ 동시 저감 기술이 연구되고 있으며, 제안된 기술들은 흡수, 고도 산화(AOPs), 저온 플라즈마(NTP), 전자 빔(EB) 등이 있다. 이러한 기술들은 강한 수용성 산화제 및 산화력을 가진 화학활성종에 의한 $NO_x$, $SO_2$$HNO_3$, $H2SO_4$ 형태로의 산화 반응, 기-액 계면에서 $HNO_3$$H2SO_4$ 흡수 반응, 화학 첨가제에 의한 중화 반응을 기본으로 하고 있다. 본 논문에서는 각각의 동시 저감공정에 대한 기술적인 특징과 대용량 처리 공정 응용을 위한 향후 전망을 정리하였다.

$TiO_2$의 광촉매 효율성에 관한 연구 (Study on the Photocatalytic Efficiencies of $TiO_2$)

  • 이종호;오한준;장재명;지충수
    • 분석과학
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    • 제14권1호
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    • pp.15-20
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    • 2001
  • 광촉매 특성을 지닌 $TiO_2$ 피막을 인가 전압 180 V에서 양극산화법을 이용하여 제조하고, 산화조건에 따른 구조적 차이에 대하여 조사하였다. 황산 및 황산+과산화수소 용액의 경우 $TiO_2$의 구조가 rutile과 anatase형이 혼합된 형태를 지녔으나, 황산+인산 및 황산+인산+과산화수소 혼합용액의 경우에는 대부분 anatase형의 $TiO_2$가 제조되었음을 알 수 있었다. 양극산화법에 의해 제조된 $TiO_2$는 모두 광촉매 특성율을 나타냈으며, 아닐린 블루 분해 반응의 경우 모든 산화 조건에서 반응차수가 1로 나타났으며 속도상수값이 거의 유사함을 알 수 있었다.

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직렬 아크에 따른 도체의 산화물 증식 및 전압 파형 분석 (The Analysis of Voltage Waveform and Oxidation Growth of Conductor with Series Arc)

  • 최충석;김향곤;김동욱;김동우
    • 전기학회논문지P
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    • 제55권3호
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    • pp.146-152
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    • 2006
  • In order to analyze the characteristics of series arcs that could happen in poor connections of electrical facilities, we made an apparatus which is similar to actual situation. series arcs are generated between copper and copper, copper and bronze, copper and brass, bronze and bronze, and then oxidation growth and voltage waveform were measured. A very small vibration with constant movement is needed to grow oxidation initially, whereas oxidation growth proceeded without a vibration after a certain amount of time. At first, blue white flame was generated initially between copper and copper, and then yellow flame was generated. In case of contact between copper and copper, the length of oxidation growth was about 7.1[mm] in 90[min]. In case of contact between copper and brass, the length of oxidation growth was about 4.3[mm] in 90[min], When bronze is contacted with copper, the lengths of oxidation growth were about 1.4[mm] in 20[min] and 2.7[mm] in 40[min] respectively, and no more oxidation growth was shown after that. In case of contact between brass and brass, the length of oxidation growth was about 1.2[mm] in 90[min], so it was the smallest compared to other cases. When copper is contacted with copper, the current through the load was about 1.6[A] and the power dissipation increased from 19[W] to 31[W]. In case of oxidation growth between copper and brass, the voltage changed from 8.4[V] to 11[V]. However, the voltage drop and the power dissipation between copper and brass were small compared to oxidation growth between copper and copper. When series arcs were generated between bronze and copper, a peak was shown at the beginning of voltage increase, and 40[min] later, oxidation material was not grown any longer. When oxidation growth occurred, voltage waveform showed irregular waveforms with tiny ripples.

강화상 나노입자의 용액 반응성이 구리 도금 박막에 미치는 영향 (Influence of Reactivity of Reinforcing Nanoparticles with Aqueous Solution on Electroplating Copper Films)

  • 박지은;오민주;김이슬;이동윤
    • 한국재료학회지
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    • 제23권12호
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    • pp.695-701
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    • 2013
  • To understand how reactivity between reinforcing nanoparticles and aqueous solution affects electrodeposited Cu thin films, two types of commercialized cerium oxide (ceria, $CeO_2$) nanoparticles were used with copper sulfate electrolyte to form in-situ nanocomposite films. During this process, we observed variation in colors and pH of the electrolyte depending on the manufacturer. Ceria aqueous solution and nickel sulfate ($NiSO_4$) aqueous solutions were also used for comparison. We checked several parameters which could be key factors contributing to the changes, such as the oxidation number of Cu, chemical impurities of ceria nanoparticles, and so on. Oxidation number was checked by salt formation by chemical reaction between $CuSO_4$ solution and sodium hydroxide (NaOH) solution. We observed that the color changed when $H_2SO_4$ was added to the $CuSO_4$ solution. The same effect was obtained when $H_2SO_4$ was mixed with ceria solution; the color of ceria solution changed from white to yellow. However, the color of $NiSO_4$ solution did not show any significant changes. We did observe slight changes in the pH of the solutions in this study. We did not obtain firm evidence to explain the changes observed in this study, but changes in the color of the electrolyte might be caused by interaction of Cu ion and the by-product of ceria. The mechanical properties of the films were examined by nanoindentation, and reaction between ceria and electrolyte presumably affect the mechanical properties of electrodeposited copper films. We also examined their crystal structures and optical properties by X-ray diffraction (XRD) and UV-Vis spectroscopy.

$NH_3/O_2$산화법으로 성장한 산화막의 특성평가 (Characterizations of Oxide Film Grown by $NH_3/O_2$ Oxidation Method)

    • 한국진공학회지
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    • 제7권2호
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    • pp.82-87
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    • 1998
  • $O_2$기체에 $NH_3/O_2$기체를 첨가하여 실리콘 표면에 산화막을 형성하는 $NH_3/O_2$산화법 에 의한 산화공정시 반응석영관 외부에 방출하는 기체는 $N_2,O_2$$H_2O$이며 극소량의 $CO_2$, NO 및 $NO_2$가 검출되었다. 두 종류의 산화제($O_2$$H_2O$)가 산화에 기여하며 성장률은 $NH_3$$O_2$ 의 부분압과 온도에 의해 결정되며, 그 기울기는 건식 및 습식 산화법의 중간에 평행 하게 위치함을 확인하였다. Auger Electron Spectroscopy(AES) 측정결과 $NH_3/O_2$ 산화막은 정확한 $SiO_2$의 화학량론을 가지며 $SiO_2/Si$계면에 발생하는 결합을 억제하며 고정전하의 발 생을 최소화함을 알 수 있었다. $NH_3/O_2$ 산화막(470$\AA$)의 항복전압을 57.5Volt이며, C-V특성 곡선을 축정한 결과 플랫밴드 전압은 0.29Volt이며 곡선의 형태는 이상곡선과 일치하였다.

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ZrO2·SO42-에 담지된 백금촉매의 저온산화반응성에 대한 연구 (A Study on Low-Temperature Oxidation Reactivity of Pt/ZrO2·SO42-Catalyst)

  • 김기석;이태정;김병삼;김두성
    • 공업화학
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    • 제9권1호
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    • pp.141-148
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    • 1998
  • 초강산 담체인 $ZrO_2$ $SO_4{^{2-}}$에 담지된 백금촉매(0.2, 0.5wt% Pt)의 저온 산화반응성을 cyclohexane의 완전산화반응에 대하여 조사 하였다. 충전층 관형반응기에서 반응물질의 전화율로 측정된 촉매활성은 촉매의 산성도와 비표면적에 비례하여 증가하였다 : $Pt/ZrO_2$ $SO_4{^{2-}}$ 촉매 제조과정에서 K(potassium)를 첨가하여 촉매의 산성도와 비표면적을 감소시켰을 때 촉매활성은 K첨가량에 비례하여 감소하였다. 또한 $Pt/ZrO_2$ $SO_4{^{2-}}$촉매는 훨씬 더 큰 비표면적을 가진 $Pt/SiO_2$, 또는 $Pt/Al_2O_3$촉매보다 뛰어난 활성을 보였다 : l5,000ppm cyclohexane농도와 $18,000hr^{-1}$공간속도를 가진 반응물질 흐름을 $250^{\circ}C$에서 0.2wt% $Pt/ZrO_2$ $SO_4{^{2-}}$촉매를 사용하여 전화시킨 결과 96%의 cyclohexane전화율을 보인 반면, 같은 반응조건 하에서 0.2wt% $Pt/SiO_2$와 0.2wt% $Pt/Al_2O_3$촉매는 각각 83%와 79%의 cyclohexane전화율을 보였다.

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