• Journal of Electrochemical Science and Technology
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• 제3권1호
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• pp.24-28
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• 2012

The electrocatalytic activities and surface roughness of indium-tin-oxide (ITO) electrodes have been investigated after thermal treatment at 100, 150, or $200^{\circ}C$ for 30 min, 2 h, or 8 h. To check electrocatalytic activities, the electrochemical behavior of four electroactive species (p-hydroquinone, $Ru(NH_3){_6}^{3+}$, ferrocenemethanol, and $Fe(CN){_6}^{4-}$) has been measured. The electron transfer rate for p-hydroquinone oxidation and ferrocenemethanol oxidation increases with increasing the incubation temperature and the incubation period of time, but the rate for $Ru(NH_3){_6}^{3+}$ is similar irrespective of the incubation temperature and period because $Ru(NH_3){_6}^{3+}$ undergoes a fast outer-sphere reaction. Overall, the electrocatalytic activities of ITO electrodes increase with increasing the incubation temperature and period. The surface roughness of ITO electrodes increases with increasing the incubation temperature, and the thermal treatment generates many towering pillars as high as several tens of nanometer.

• Bulletin of the Korean Chemical Society
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• 제27권1호
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• pp.99-105
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• 2006

Polyamine dendrimers functionalized with electrochemiluminescent (ECL) polypyridyl Ru(II) complexes, dend-$[CO-(CH_2)_3-mbpy{\cdot}Ru(L)_2]_3(PF_6)_6$ (dend: N$(CH_2CH_2NH)_3$-, L: bpy, o-phen, phen-Cl, DTDP), were synthesized through the complexation of dendritic polypyridyl ligands to Ru(II) complexes. Their electrochemical redox potentials, photoluminescence (PL), and relative ECL intensities were studied. The ECL emissions produced by the reaction between the electro-oxidized $Ru^{3+}$ species of polyamine dendrimers and tripropylamine as a coreactant were measured in a static system with potential cycles between 0.8 and 1.3 V or through flow injection analysis with a potential of +1.3 V, and were compared to that of $[Ru(o-phen)_3](PF_6)_2{\cdot}Dend-[CO-(CH_2)_3-mbpy{\cdot}Ru(bpy)_2]_3(PF_6)_6$ showed an ECL intensity that was two-fold greater than that of the reference complex $[Ru(o-phen)_3](PF_6)_2$.

• Bulletin of the Korean Chemical Society
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• 제34권2호
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• pp.421-425
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• 2013

The effect of pretreatment on indium-tin oxide (ITO) electrodes has been rarely studied, although that on metal and carbon electrodes has been enormously done. The electrochemical and surface properties of ITO electrodes are investigated after 6 different pretreatments. The electrochemical behaviors for oxygen reduction, $Ru(NH_3){_6}^{3+}$ reduction, $Fe(CN){_6}^{3-}$ reduction, and p-hydroquinone oxidation are compared, and the surface roughness, hydrophilicity, and surface chemical composition are also compared. Oxygen reduction, $Fe(CN){_6}^{3-}$ reduction, and p-hydroquinone oxidation are highly affected by the type of the pretreatment, whereas $Ru(NH_3){_6}^{3+}$ reduction is almost independent of it. Interestingly, oxygen reduction is significantly suppressed by the treatment in an HCl solution. The changes in surface roughness and composition are not high after each pretreatment, but the change in contact angle is substantial in some pretreatments.

• 대한화학회지
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• 제33권6호
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• pp.571-576
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• 1989

$[M(NH_3)_5Cl]^{2+}$착물에 대하여 상대론적으로 파라미터화된 확장 Huckel(REX) 계산을 수행하였다. 궤도함수 및 overlap population에 대한 계산 결과는 실험적인 자료와 일치하였다. 또한 전자구조에 대하여 상대성 효과를 감안한 REX와 비상대론적인 EHT의 계산 결과를 서로 비교하였다. 이들 착화합물의 M-Cl 결합에 대한 파이 결합성은 $d^6$계 착물에서 보다 $d^3$ 및 $d^5$계 착물의 경우가 더 중요함을 알 수 있었다.

• Journal of Korean Vacuum Science & Technology
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• 제6권1호
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• pp.30-35
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• 2002

We show that a combined technique of Cs$^{+}$ reactive ion scattering (Cs$^{+}$ RIS) and low-energy secondary ion mass spectrometry (LESIMS) provides a powerful means for probing molecular films and their surface reactions. Simple molecules, including HCI, NH$_3$, D$_2$O, and their mixtures, were deposited into a thin film of several monolayer thickness on Ru(001) at low temperature in vacuum, and the surface was characterized by Cs$^{+}$ RIS and LESIMS. On pure films, D$_2$O, HCI, and NH$_3$ existed in the corresponding molecular states. When HCI and NH$_3$ were co-deposited, ammonium ion(NH$_4$$^{+}$) was readily formed by proton transfer from HCI to NH$_3$. In the presence of water molecules, HCI ionized first to hydronium ion(H$_3$O$^{+}$), which subsequently transferred proton to NH$_3$ to form NH$_4$$^{+}$. The proton transfer, however, did not occur to a completion on ice, in contrast to the complete reaction in aqueous solutions.s solutions.

• 한국수소및신에너지학회논문집
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• 제33권6호
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• pp.786-794
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• 2022

Green ammonia is a promising renewable energy carrier. Green ammonia can be used in various energy conversion devices (e.g., engine, fuel cell, etc.). Ammonia has to be fed with hydrogen for start-up and failure protection of some energy conversion devices. Ammonia can be converted into hydrogen by decomposition and partial oxidation. Especially, partial oxidation has the advantages of fast start-up, thermally self-sustaining operation and compact size. In this paper, thermodynamics, start-up and operation characteristics of ammonia partial oxidation were investigated. O₂/NH₃ ratio, ammonia flow rate and catalyst volume were varied as operation parameters. In thermodynamic analysis, ammonia conversion was maximized in the O₂/NH₃ range from 0.10 to 0.15. Ammonia partial oxidation reactor was successfully started using 12 V glow plug. At 0.13 of O₂/HN₃ ratio and 10 LPM of ammonia flow rate, ammonia partial oxidation reactor showed 90% of ammonia conversion over commercial Ru catalyst. In addition, Increasing O₂/NH₃ ratio from 0.10 to 0.13 was more effective for high ammonia conversion than increasing catalyst volume at 0.10 of O₂/NH₃.

• Bulletin of the Korean Chemical Society
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• 제15권3호
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• pp.209-213
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• 1994

Two unknown values among three electrochemical values, i.e. electrode area, diffusion coefficient, and concentration, are simultaneously obtained by nonlinear regression analysis of a single chronoamperometric faradaic current curve at a microdisk electrode. The approach is an analytical application of the semi-empirical equation presented by Shoup and Szabo for the chronoamperometric response at a disk electrode. To demonstrate the usefulness and accuracy of this approach, the chronoamperometric current at a platinum disk electrode of 50 ${\mu}m$ radius in solutions of $Ru(NH_3)_6^{3+},\;ferrocene,\;Fe(CN)_6^{3-},\;and\;C_{60}$, were analyzed.

• 동아시아식생활학회지
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• 제1권1호
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• pp.99-111
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• 1991

In each nuruk using today, effect of pH on glucoamylase activity and viable cell count of yeast and bacteria was measured. Common components during fermentation, alcohol, acetaldehyde and acetone, amino acid composition, and total sugars and mineral content were determined in yakju(korean wine) brewed from different ingredients and by different methods. Results are summarized as follows ; 1. The lower the pH, the lower the glucoamylase activity in JK, BK, JK-S BK-S and JN. But the higher the glucoamylase activity ratio in Koji and KN. 2. Yeast and bacteria cell count could not determined in nuruk inoculated of seed. In JK, BK and JN, yeast cell count was 50${\times}$104∼80${\times}$104, bacteria cell count was 5${\times}$106∼24${\times}$106. 3. In yakju during fermentation, pH was higher in RU, total acidity content was higher in ST-N, ST-K, RU and ST-RUPO and alcohol content was lower in RUPO and ST-RUPO. 4. Ethanol and acetaldehyde content were highest in dukyunju. Trace amount of acetone was determined only in ST-K, RUPO and ST-RUPO . n-Propyl alcohol content was higher in ST-K, ST-RUPO and ST-N, iso-butyl alcohol content was higher in L-RUPO, Dukyunju and Songyupju and iso-amyl alcohol content was higher in Songyupju, RU, L-RUPO and Dukyunju. 5. In amino acids composition of each yakju, Pro, Ala and Val content was higher than other amino acids. Total amino acids content was the highest in Dukyunju and second highest in ST-N, NH3 was higher in ST-N, Dukyunju, RUPO than other samples. 6. Total sugars content was the highest in ST-N and second highest in RU. 7. P, K and Mg content were higher in Dukyunju and ST-N than in other samples. In Dukyunju, Ca and P ratio was 0.075 because of low Ca content and high P content.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.239-240
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• 2008

As semiconductor devices are scaled down for better performance and more functionality, the Cu-based interconnects suffer from the increase of the resistivity of the Cu wires. The resistivity increase, which is attributed to the electron scattering from grain boundaries and interfaces, needs to be addressed in order to further scale down semiconductor devices [1]. The increase in the resistivity of the interconnect can be alleviated by increasing the grain size of electroplating (EP)-Cu or by modifying the Cu surface [1]. Another possible solution is to maximize the portion of the EP-Cu volume in the vias or damascene structures with the conformal diffusion barrier and seed layer by optimizing their deposition processes during Cu interconnect fabrication, which are currently ionized physical vapor deposition (IPVD)-based Ta/TaN bilayer and IPVD-Cu, respectively. The use of in-situ etching, during IPVD of the barrier or the seed layer, has been effective in enlarging the trench volume where the Cu is filled, resulting in improved reliability and performance of the Cu-based interconnect. However, the application of IPVD technology is expected to be limited eventually because of poor sidewall step coverage and the narrow top part of the damascene structures. Recently, Ru has been suggested as a diffusion barrier that is compatible with the direct plating of Cu [2-3]. A single-layer diffusion barrier for the direct plating of Cu is desirable to optimize the resistance of the Cu interconnects because it eliminates the Cu-seed layer. However, previous studies have shown that the Ru by itself is not a suitable diffusion barrier for Cu metallization [4-6]. Thus, the diffusion barrier performance of the Ru film should be improved in order for it to be successfully incorporated as a seed layer/barrier layer for the direct plating of Cu. The improvement of its barrier performance, by modifying the Ru microstructure from columnar to amorphous (by incorporating the N into Ru during PVD), has been previously reported [7]. Another approach for improving the barrier performance of the Ru film is to use Ru as a just seed layer and combine it with superior materials to function as a diffusion barrier against the Cu. A RulTaN bilayer prepared by PVD has recently been suggested as a seed layer/diffusion barrier for Cu. This bilayer was stable between the Cu and Si after annealing at $700^{\circ}C$ for I min [8]. Although these reports dealt with the possible applications of Ru for Cu metallization, cases where the Ru film was prepared by atomic layer deposition (ALD) have not been identified. These are important because of ALD's excellent conformality. In this study, a bilayer diffusion barrier of Ru/TaCN prepared by ALD was investigated. As the addition of the third element into the transition metal nitride disrupts the crystal lattice and leads to the formation of a stable ternary amorphous material, as indicated by Nicolet [9], ALD-TaCN is expected to improve the diffusion barrier performance of the ALD-Ru against Cu. Ru was deposited by a sequential supply of bis(ethylcyclopentadienyl)ruthenium [Ru$(EtCp)_2$] and $NH_3$plasma and TaCN by a sequential supply of $(NEt_2)_3Ta=Nbu^t$ (tert-butylimido-trisdiethylamido-tantalum, TBTDET) and $H_2$ plasma. Sheet resistance measurements, X-ray diffractometry (XRD), and Auger electron spectroscopy (AES) analysis showed that the bilayer diffusion barriers of ALD-Ru (12 nm)/ALD-TaCN (2 nm) and ALD-Ru (4nm)/ALD-TaCN (2 nm) prevented the Cu diffusion up to annealing temperatures of 600 and $550^{\circ}C$ for 30 min, respectively. This is found to be due to the excellent diffusion barrier performance of the ALD-TaCN film against the Cu, due to it having an amorphous structure. A 5-nm-thick ALD-TaCN film was even stable up to annealing at $650^{\circ}C$ between Cu and Si. Transmission electron microscopy (TEM) investigation combined with energy dispersive spectroscopy (EDS) analysis revealed that the ALD-Ru/ALD-TaCN diffusion barrier failed by the Cu diffusion through the bilayer into the Si substrate. This is due to the ALD-TaCN interlayer preventing the interfacial reaction between the Ru and Si.

• 청정기술
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• 제28권3호
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• pp.218-226
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• 2022

최근 선진국들은 수소경제 및 탄소중립 사회로의 전환을 위해 수소에너지의 수요가 급격히 증가하고 있으며, 이산화탄소(CO₂)를 배출이 없는 친환경적인 수소(H₂) 생산 기술에 대한 관심이 높아지고 있다. 본 연구에서는 암모니아(NH₃) 분해 수소 제조를 위해 루테늄 알루미나(Ru/Al₂O₃) 분말 촉매와 함께 알루미나 졸(alumina sol)의 무기바인더(inorganic binder)와 메틸 셀룰로오스(methyl cellulose)의 유기바인더(organic binder)를 사용하여 딥 코팅(dip coating) 방법으로 루테늄 알루미나 메탈 모노리스 코팅 촉매를 제조하였다. 딥 코팅을 위한 촉매 슬러리의 최적 비율로 촉매와 무기바인더의 중량 비율을 1:1로 고정하여 유기바인더 0.1일 때 1회 딥 코팅 시 촉매 코팅양은 61.6 g L^-1이다. 이때 메탈모노리스 표면에 코팅된 촉매 층의 균일한 두께 (약 42 ㎛)와 결정상을 주사전자현미경(Scanning Electron Microscope, SEM)과 X-ray 회절분석(X ray diffraction, XRD)을 통해 확인하였다. 또한, 암모니아 분해 수소 제조의 최적 공정조건을 찾고자 반응표면분석법(Response Surface Method, RSM)을 이용하여 반응온도와 공간속도의 독립변수에 따른 암모니아 전환율에 대한 수치 최적화 회귀식 모델을 계산하였다. 이러한 결과로부터 암모니아 분해 수소생산을 위한 상업적 규모의 공정운전 기본설계 자료로 활용이 가능하다.