• 제목/요약/키워드: $PbTiO_3$ crystalline phase

검색결과 17건 처리시간 0.021초

Crystallinity of $Pb(Nb_{0.04}Zr_{0.28}Ti_{0.68})O_{3}$ capacitors on ferroelectric properties

  • Yang, Bee-Lyong
    • 한국결정성장학회지
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    • 제12권3호
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    • pp.161-164
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    • 2002
  • Polycrystalline and epitaxial heterostructure films of $La_{0.5}Sr_{0.5}CoO_{3}/Pb(Nb_{0.04}Zr_{0.28}Ti_{0.68})O_{3}/La_{0.5}Sr_{0.5}CoO_{3}$ (LSCO/PNZT/LSCO) capacitors were evaluated in terms of low voltage and high speed operation in high density memory, using TiN/Pt conducting barrier combination. Structural studies for a high density ferroelectric memory process flow, which requires the integration of conducting barrier layers to connect the drain of the pass-gate transistor to the bottom electrode of the ferroelectric stack, indicate complete phase purity (i.e. fully perovskite) in both epitaxial and polycrystalline materials. The polycrystalline capacitors show lower remnant polarization and coercive voltages. However, the retention, and high-speed characteristics are similar, indicating minimal influence of crystalline quality on the ferroelectric properties.

PZT 박막 캐퍼시터의 특성에 기여하는 PZT-전극계면층의 영향 (Effects of PZT-Electrode Interface Layers on Capacitor Properties)

  • 김태호;구준모;민형섭;이인섭;김지영
    • 한국재료학회지
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    • 제10권10호
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    • pp.684-690
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    • 2000
  • Metal-Ferroelectric-Metal(MFM) 구조의 개퍼시터에서 $Pb(Zr,Ti)O_3(PZT)$-전극 계면층이 PZT 박막 특성에 기여하는 영향을 알아보기 위하여 Pt/PZT/계면층/Pt/$TiO_2/SiO_2$/Si 구조의 캐퍼시터를 제작하였다. 계면층으로 사용될 물질들 중에서 $PbTiO_3(PT)$ 층을 sol-gel 방법으로 형성하였으며, PbO, $ZrO_2,\;TiO_2$ 층들을 reactive sputtering 방법으로 형성하였다. PZT박막을 구성하는 원소들로 이루어진 단순 산화물들의 특성을 평가하기 위하여 PbO, $ZrO_2,\;TiO_2$를 계면층으로 사용하여 $600^{\circ}C$에서 열처리를 실시하였고, 이 경우에는 $TiO_2$가 가장 우수하게 PZT의 결정립 크기를 미세하게 하는 효과를 보였으나, 두께가 증가함에 따라 표면 거칠기가 증가하고 anatase 상으로 남기 때문에 강유전특성이 열화되었다. 반면에 PT 박막을 계면층으로 사용한 경우에는 결정립 크기의 감소와 더불어 전기적인 특성도 향상되었다. 또한 PZT의 핵생성 위치를 판단하기 위하여 PT 삽입층의 위치를 변화하며, 실험한 결과, 하부전극과 PZT 박막의 계면에 PT 삽입층을 형성하였을 경우에 가장 효과적인 seed로서의 역할을 하였다.

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IC Package 봉착용 결정화 유리의 제조와 특성에 관한 연구 (Preparation and Characterization of Solder Glass for Electronic IC Package)

  • 손명모;감직상;박희찬;이서우;문종수
    • 한국세라믹학회지
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    • 제26권6호
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    • pp.829-835
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    • 1989
  • Devitrifing solder glasses in a specific group of glass ceramic materials are extensively used in hermetically sealing alumina electronics packages. Preferred frit glass compositions of this study consist of 37~40wt% PbO, 35~40wt% ZnO, 18~20wt% B2O3, 1~3wt% SiO2, 0~6wt% TiO2. The coated frit glasses crystallize during firing and form a strong hermetic seal. DTA and X-ray diffraction were used to characterize crystallization of the glass frit. Frit seal containing 2wt% TiO2 has crystallization temperature of 550~57$0^{\circ}C$ with surface nucleation. Frit seal containing 6wt% TiO2 has crystallization temperature of 515~5$25^{\circ}C$ with bulk nucleation, and the main crystalline phase was perovskite lead titanate having minus expansion coefficient. The average activation energy for the crystallization calculated from Ozawa equation was 65$\pm$10kcal/mol.

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RF 마그네트론 스퍼터링 방법으로 제작된 $Pb[(Zr,Sn)Ti]NbO_3$ 박막의 결정구조와 전기적 특성 (Crystalline structures and electrical properties of $Pb[(Zr,Sn)Ti]NbO_3$ Thin Films deposited using RF Magnetron Sputtering Method)

  • 최우창;최용정;최혁환;이명교;권태하
    • 센서학회지
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    • 제9권3호
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    • pp.242-247
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    • 2000
  • 10 mole%의 과잉 PbO가 첨가된 타겟을 이용하여 $(La_{0.5}Sr_{0.5})CoO_3(LSCO)/Pt/Ti/SiO_2/Si$ 위에 RF 마그네트론 스퍼터링 방법을 이용하여 $Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{0.9}Ti_{0.1}]_{0.98}Nb_{0.02}O_3(PNZST)$ 박막을 증착시켰다. $500^{\circ}C$의 기판온도, 80W의 RF power에서 증착된 박막은 급속열처리(RTA)후에 페로브스카이트 상으로 결정화되었다. $650^{\circ}C$, 공기중에서 10초 동안 열처리된 박막이 가장 우수한 결정성과 전기적 특성을 나타내었다. 이러한 박막으로 제작된 PNZST 커패시터는 약 $20\;{\mu}C/cm^2$ 정도의 잔류분극과 약 50 kV/cm 정도의 항전계를 나타내었다. 또한, $2.2{\times}10^9$의 스위칭 후에도 잔류분극의 감소는 10% 미만이었다.

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루테늄 전극위에 증착된 PZT 박막의 전기적 및 강유전 특성 (The Electric and Ferroelectric of Pb(Zr0.52Ti0.48)O3 Thin Films Deposited on Ruthenium Electrodes)

  • 황현석;유영식;임윤식;강현일
    • 전기학회논문지P
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    • 제63권1호
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    • pp.46-49
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    • 2014
  • $Pb(Zr_{0.52}Ti_{0.48})O_3(PZT)$ thin films deposited on $Ru/RuO_2$ bottom electrode that grown for in-situ progress used rf magnetron sputtering method. We investigated the dependence of the crystalline and electrical properties in the way of capacitors PZT thin films. Our results show that all PZT films indicated polycrystalline perovskite structure with preferred orientation (110) and no pyrochlore phase is observed. The electric properties of the Ru improved with increasing Ru thin films thickness. A well-fabricated Ru/PZT/Ru (100 nm) /$RuO_2$ capacitor showed a leakage current density in the order of $2.03{\times}10^{-7}$ $A/cm^2$ as a 50 kV/cm, a remnant polarization (Pr) of 9.22 ${\mu}C/cm^2$, and a coercive field (-EC) of -32.22 kV/cm. The results show that $Ru/Ru/RuO_2$ bottom electrodes are expected to reduce the degradation ferroelectric fatigue and excellent ferroelectric properties.

Oxygen Evolution Reaction at Electrodes of Single Phase Ruthenium Oxides with Perovskite and Pyrochlore Structures$^{**}$

  • 최은옥;권영욱;모선일
    • Bulletin of the Korean Chemical Society
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    • 제18권9호
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    • pp.972-976
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    • 1997
  • Single phase ruthenium oxides with perovskite (ATi1-xRuxO3 (A=Ca, Sr)) and pyrochlore structure (Bi2Ru2O7, Pb2Ru2O6.5) have been prepared reproducibly by solid state reaction methods and their electrocatalytic activities for oxygen evolution have been examined by Tafel plots. Tafel slopes vary from a low value of 42 mV/decade up to 222 mV/decade at room temperature. The high exchange current densities and high Tafel slopes compared with those obtained from the RuO2 DSA electrode at the crystalline single phase metal oxide electrodes suggest that they are better electrocatalysts at low overpotentials. A favorable change in the Tafel slope for the oxygen evolution reaction occurs as the ruthenium content increases. Substitution of Ti for Ru in the perovskite solid solutions enhanced their chemical stability by losing marginal electrochemical activity.

Multi-coating법으로 제조된 두꺼운 PZT막의 두께 변화에 따른 미세구조 및 전기적 특성 (Microstructures and Electrical Properties of Thick PZT Films with Thickness Variation Fabricated by Multi-coating Method)

  • 박준식;장연태;박효덕;최승철;강성군
    • 한국재료학회지
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    • 제12권3호
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    • pp.211-214
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    • 2002
  • Properties of 52/48 PZT films with various thicknesses for piezoelectric micro-electro mechanical systems (MEMS) devices fabricated by multi-coating method on $Pt(3500{\AA})/Ti(400{\AA})/SiO_2(3000{\AA})/Si$(525$\mu\textrm{m}$) substrates were investigated. PZT films were deposited by spin-coating process at 3500 rpm for 30 sec, followed by pyrolysis at 45$0^{\circ}C$ for 10 min producing the thickness of about 120nm. These processes were repeated 4, 8, 12, 16 and 20 times in order to have various thicknesses, respectively. Finally, they were crystallized at $650^{\circ}C$ for 30 min. All thick PZT films showed dense and homogeneous surface microstructures. Thick PZT films showed crystalline structures of random orientations with increasing thickness. Dielectric constants of thick PZT films were increased with increasing film thickness and reached 800 at 100kHz for 2.3$\mu\textrm{m}$ thick PZT film. $P_r\; and\; E_c$ of 2.3$\mu\textrm{m}$ thick PZT films were about 20$\mu$C/$\textrm{cm}^2$ and 63kV/cm. Depth profile analysis by Auger Electron Spectroscopy (AES) of 4800 $\AA$ thick PZT film showed the formation of the perovskite phase on Pt layer by Pb diffusion behavior. It was considered that Pb-Pt intermediate layer promoted PZT (111) columnar structures.