• Title/Summary/Keyword: $O_2/Ar$

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Two Generations in Texas Dialect

  • Park Jookyung
    • MALSORI
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    • no.29_30
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    • pp.1-18
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    • 1995
  • 미국 남부 방언은 그 지역의 광대함과 아울러 그 지역에 속하는 언어사용자들의 언어 문화 및 역사적인 다양성에 의해 결코 한 가지 방언으로 취급할 수 없는 것임에도 불구하고 많은 경우에 그렇게 다루어져 왔다. 특히 소위 '남부 방언의 특징적 요소'로서 몇몇 자질들에 대한 연구가 많이 이루어져 왔다. 본 논문의 목적은 텍사스 지역방언에 이러한 남부 방언의 특징적 자질이 어느 정도 유지되고 있는가를 알아보고, 아울러 두 세대간에 언어적 차이가 있는지, 있다면 그 변화의 방향은 어느 쪽으로 전개되어가고 있는지를 밝히려는 데 있다. 이를 위하여 토박이 텍사스 인에 한하여 한 가정에서 두 세대(늙은 세대와 젊은 세대)를 대표하는 정보제공자 두 명씩을 각각 추출하여 네 가정 모두 여덟 명에게서 얻은 언어자료를 녹음하여 이를 분석, 정리하였다. 텍사스 지역방언에 대해 밝혀진 주요 내용은 다음과 같다. 1. /l/앞에 나오는 단순모음 /i/는 [$r{\partial}$] 또는 [$r{\partial}$]로 이중모음화된다. 2. 강세음절에서 비음 앞에 나오는 /e/와 /I/는 중화된다. 3. 늙은 세대에서는 /a/와 /${\supset}$/가 융합되어 쓰이나, 젊은 세대에서는 융합이 일어나지 않는다. 4. 이중모음 /ar/는 /a:/또는 /a/로 단순모음화하는 것으로 보인다. 5. 이중로음 /$a{\mho}$/ /$o{\mho}$/의 앞모음이 전설화한다. 6. [u], [ju] 와 [${\mho}$]는 모두 [${\mho}$]로 된다. 7. [w] 와 [M]는 일관성 없이 교대로 사용되나 [M]는 특히 늙은 세대에서 더 많이 사용된다.

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ECR Microwave 중성입자빔을 이용한 Si 양자점 형성 및 특성분석

  • Park, Jong-Bae;O, Gyeong-Suk;Kim, Dae-Cheol;Kim, Jong-Sik;Kim, Yeong-U;Yun, Jeong-Sik;Yu, Seok-Jae;Lee, Bong-Ju;Seon, Ho-Jeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.397-397
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    • 2011
  • 최근 태양전지 연구가 활발히 진행되는 가운데 저가 고효율 태양전지로 제안되는 제3세대 태양전지로 Quantum Dots (QD: 양자점) 태양전지에 대한 연구가 많은 연구자들에 의해 관심이 모아지고 있다. 현재까지 보고된 최고효율은 NSWU의 13%의 효율을 보고하고 있으며, 국내에서도 다양한 분야에서 연구가 진행되고 있다. 본 연구에서는 기존의 PECVD에서 문제시 되고 있는 플라즈마에 의한 박막손상과 고온 증착온도 등의 단점을 보완한 증착 기술로 중성입자빔 (Hyper-thermal neutral beam ; HNB)을 이용한 저온 증착방법에 대한 연구를 진행하였다. 유리기판과 p-type Si 기판 그리고 SiNx 박막 위에 Ar, He, H2, 그리고 SiH4 가스를 소스 가스로 활용하여 ECR-microwave 플라즈마에서 생성된 중서입자빔을 이용한 Si 양자점을 형성하였고, Si 양자점 형성 특성과 크기제어 방법에 대한 연구를 진행하였다. 또한 TEM, FTIR, Raman, Photo Luminescence 등의 분석 방법을 이용하여 결정성 및 성분 등을 분석하여 HNB의 특성 및 효과를 규명하였다.

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Effect of Deposition Parameters and Post-annealing on the Luminescent Properties of CaWO4 Phosphor (증착조건 및 열처리 분위기가 CaWO4 형광체의 발광특성에 미치는 영향)

  • 한상혁;정승묵;송국현;김영진
    • Journal of the Korean Ceramic Society
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    • v.40 no.10
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    • pp.949-953
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    • 2003
  • Blue emitting CaWO$_4$ thin films were deposited by rf magnetron sputtering. The effect of sputtering parameters and annealing conditions on the luminescent properties were investigated. Structural and stoichiometric properties of thin films were affected by $O_2$/Ar gas ratio and substrate temperature. Post-annealing caused the phosphor thin films to emit improved luminescent properties. The atomic composition of films might depend on annealing atmosphere, which resulted in the changes of luminescent properties. Blue-green emission that was due to oxygen vacancies was observed. However, by controlling oxygen defects, only blue emission could be obtained.

Low Temperature Deposition of ITO Thin Films for Flat Panel Displays by ICP Assisted DC Magnetron Sputtering (유도결합 플라즈마(ICP) Sputtering에 의한 평판 디스플레이(FPD)용 ITO 박막의 저온 증착)

  • 구범모;정승재;한영훈;이정중;주정훈
    • Journal of the Korean institute of surface engineering
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    • v.37 no.3
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    • pp.146-151
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    • 2004
  • Indium tin oxide (ITO) is widely used to make a transparent conducting film for various display devices and opto-electric devices. In this study, ITO films on glass substrate were fabricated by inductively coupled plasma (ICP) assisted dc magnetron sputtering. A two-turn rf coil was inserted in the process chamber between the substrate and magnetron for the generation of ICP. The substrates were not heated intentionally. Subsequent post-annealing treatment for as-deposited ITO films was not performed. Low-temperature deposition technique is required for ITO films to be used with heat sensitive plastic substrates, such as the polycarbonate and acrylic substrates used in LCD devices. The surface roughness of the ITO films is also an important feature in the application of OLEDs along with the use of a low temperature deposition technique. In order to obtain optimum ITO thin film properties at low temperature, the depositions were carried out at different condition in changing of Ar and $O_2$ gas mixtures, ICP power. The electrical, optical and structural properties of the deposited films were characterized by four-point probe, UV/VIS spectrophotometer, atomic force microscopy(AFM) and x-ray diffraction (XRD). The electrical resistivity of the films was -l0$^{-4}$ $\Omega$cm and the optical transmittance in the visible range was >85%. The surface roughness ( $R_{rms}$) was -20$\AA$.>.

Fabrication of IGZO Transparent Conducting thin Films by The Use of Combinational Magnetron Sputtering (콤비네이숀 마그네트론 스퍼터링법에 의한 IGZO 투명전도막의 제조)

  • Jung, Jae-Hye;Lee, Se-Jong;Cho, Nam-In;Lee, Jai-Youl
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.425-425
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    • 2008
  • The transparent conducting oxides(TCOs) are widely used as electrodes for most flat panel display devices(FPDs), electrodes in solar cells and organic light emitting diodes(OLED). Among them, indium oxide materials are mostly used due to its high electrical conductivity and a high transmittance in the visible spectrum. The present study reports on a study of the electrical and optical properties of IGZO thin films prepared on glass and PET substrates by the combinational magnetron sputtering. We use the targets of IZO and Ga2O3 for the deposition process. In some case the deposition process is coupled with the End-Hall ion-beam treatment onto the substrates before the sputtering. In addition we control the deposition rate to optimize the film quality and to minimize the surface roughness. Then we investigate the effects of the Ar gas pressure and RF power during the sputtering process upon the electrical, optical and morphological properties of thin films. The properties of prepared IGZO thin films have been analyzed by using the XRD, AFM, a-step, 4-point probe, and UV spectrophotometer.

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A study on the electron transport coefficients using monte carlo method in argon gas (몬테칼로법을 이용한 Ar기체의 전자수송계수에 관한 연구)

  • 하성철;전병훈
    • Electrical & Electronic Materials
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    • v.8 no.6
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    • pp.685-692
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    • 1995
  • The electron transport coefficients in argon gas is studied over the range of E/N values from 85 to 566 Td by the Monte Carlo method considering the latest cross section data. The result of the Monte Carlo method analysis shows that the value of the electron transport coefficients such as the electron drift velocity, the ratio of the longitudinal and transverse diffusion coefficients to the mobility. It is also found that the electron transport coefficients calculated by the two-term approximation analysis agree well with those by Monte Carlo calculation. The electron energy distributions function were analysed in argon at E/N=283, and 566 Td for a case of the equilibrium region in the mean electron energy. A momentum transfer cross section for the argon atom which was consistent with both of the present electron transport coefficients was derived over the range of mean electron energy from 10.3 to 14.5 eV, also suggested as a set of electron cross section for argon atom. The validity of the results obtained has been confirmed by a Monte Carlo simulation method.

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Improved Adhesion of Solar Cell Cover Glass with Surface-Flourinated Coating Using Atmospheric Pressure Plasma Treatment (상압 플라즈마 표면처리를 통한 태양광모듈 커버글라스와 불소계 코팅의 응착력 향상)

  • Kim, Taehyeon;Park, Woosang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.4
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    • pp.244-248
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    • 2018
  • We propose a method for improving the reliability of a solar cell by applying a fluorinated surface coating to protect the cell from the outdoor environment using an atmospheric pressure plasma (APP) treatment. An APP source is operated by radio frequency (RF) power, Ar gas, and $O_2gas$. APP treatment can remove organic contaminants from the surface and improve other surface properties such as the surface free energy. We determined the optimal APP parameters to maximize the surface free energy by using the dyne pen test. Then we used the scratch test in order to confirm the correlation between the APP parameters and the surface properties by measuring the surface free energy and adhesive characteristics of the coating. Consequently, an increase in the surface free energy of the cover glass caused an improvement in the adhesion between the coating layer and the cover glass. After treatment, adhesion between the coating and cover glass was improved by 35%.

Characteristics of Ta-Ti alloy Metal for NMOS Gate Electrodes (NMOS 게이트 전극에 사용될 Ta-Ti 합금의 특성)

  • Kang, Young-Sub;Lee, Chung-Keun;Kim, Jae-Young;Hong, Shin-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.15-18
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    • 2003
  • Ta-Ti metal alloy is proposed for alternate gate electrode of ULSI MOS device. Ta-Ti alloy was deposited directly on $SiO_2$ by a co-sputtering method and good interface property was obtained. The sputtering power of each metal target was 100W. Thermal and chemical stability of the electrode was studied by annealing at $500^{\circ}C$ and $600^{\circ}C$ in Ar ambient. X-ray diffraction was measured to study interface reaction and EDX(energy dispersive X-ray) measurement was performed to investigate composition of Ta and Ti element. Electrical properties were evaluated on MOS capacitor, which indicated that the work function of Ta-Ti metal alloy was ${\sim}4.1eV$ compatible with NMOS devices. The measured sheet resistance of alloy was lower than that of poly silicon.

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Characteristics of amorphous IZO anode based flexible organic light emitting diodes (비정질 IZO 애노드 박막을 이용한 플렉서블 유기발광소자 특성)

  • Moon, Jong-Min;Bae, Jung-Hyeok;Jeong, Soon-Wook;Kim, Han-Ki;Kang, Jae-Wook
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.491-492
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    • 2006
  • We report on the fabrication of organic-based flexible display using an amorphous IZO anode grown at room temperature. The IZO anode films were grown by a conventional DC reactive sputtering on polycarbonate (PC) substrate at room temperature using a synthesized IZO target in a Ar/$O_2$ ambient. X-ray diffraction examination results show that the IZO anode film grown at room temperature is complete amorphous structure due to low substrate temperature. It is shown that the $Ir(ppy)_3$ doped flexible organic light emitting diode (OLED) fabricated on the IZO anode exhibit comparable current-voltage-luminance characteristics to OLED fabricated on conventional ITO/glass substrate. These findings indicate that the IZO anode film grown on PC substrate is a promising anode materials for the fabrication of organic based flexible displays.

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Real-Time Plasma Process Monitoring with Impedance Analysis and Optical Emission Spectroscopy

  • Jang, Hae-Gyu;Kim, Dae-Kyoung;Kim, Hoon-Bae;Han, Sa-Rum;Chae, Hee-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.473-473
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    • 2010
  • Plasma is widely used in various commercial etchers and chemical vapor deposition. Unfortunately, real-time plasma process monitoring is still difficult. Some methods of plasma diagnosis is improved, however, it is possible for real-time plasma diagnosis to use non-intrusive probe only. In this research, the object is to investigate the suitability of using impedance analysis and optical emission spectroscopy (OES) for real-time plasma process monitoring. It is assumed that plasma system is a equivalent circuit. Therefore, V-I probe is used for measuring impedance, which can be a new non-intrusive probe for plasma diagnosis. From impedance data, we tried to analyse physical properties of plasma. And OES, the other method of plasma diagnosis, is a typical non-intrusive probe for analyzing chemical properties. The amount of the OES data is typically large, so this poses a difficulty in extracting relevant information. To solve this problem, principal component analysis (PCA) can be used. For fundamental information, Ar plasma and $O_2$ plasma are used in this experiment. This method can be applied to real-time endpoint and fault detections.

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