• Title/Summary/Keyword: $O_2$ transmission rate

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Characterization of Al2O3 Thin Film Encasulation by Plasma Assisted Spatial ALD Process for Organic Light Emitting Diodes

  • Yong, Sang Heon;Cho, Sung Min;Chung, Ho Kyoon;Chae, Heeyeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.234.2-234.2
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    • 2014
  • Organic light emitting diode (OLED) is considered as the next generation flat panel displays due to its advantages of low power consumption, fast response time, broad viewing angle and flexibility. For the flexible application, it is essential to develop thin film encapsulation (TFE) to protect oxidation of organic materials from oxidative species such as oxygen and water vapor [1]. In many TFE research, the inorganic film by atomic layer deposition (ALD) process demonstrated a good barrier property. However, extremely low throughput of ALD process is considered as a major weakness for industrial application. Recently, there has been developed a high throughput ALD, called 'spatial ALD' [2]. In spatial ALD, the precursors and reactant gases are supplied continuously in same chamber, but they are separated physically using a purge gas streams to prevent mixing of the precursors and reactant gases. In this study, the $Al_2O_3$ thin film was deposited by spatial ALD process. We characterized various process variables in the spatial ALD such as temperature, scanning speed, and chemical compositions. Water vapor transmission rate (WVTR) was determined by calcium resistance test and less than $10-^3g/m^2{\cdot}day$ was achieved. The samples were analyzed by x-ray photoelectron spectroscopy (XPS) and field emission scanning electron microscope (FE-SEM).

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Synthesis, Characterization and Ammonia Decomposition Reaction Activity of Vanadium Oxynitride Obtained from the Reduction/Nitridation of Vanadium Oxide (바나디움 산화물의 환원 및 질화반응으로부터 얻어진 바나디움 산화질화물의 제조, 특성분석 및 암모니아 분해반응에서의 촉매 활성)

  • Yun, Kyung Hee;Shin, Chae-Ho
    • Korean Chemical Engineering Research
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    • v.60 no.4
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    • pp.620-629
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    • 2022
  • By varying various experimental conditions such as heating rate, molar hourly space velocity (MHSV), and nitridation reaction temperature, vanadium oxynitride was prepared through temperature programmed reduction/nitridation reaction (TPRN) of vanadium pentoxide and ammonia, and characterization were performed. In order to investigate the physico-chemical properties of the prepared catalyst, N2 adsorption-desorption analysis, X-ray diffraction analysis (XRD), hydrogen temperature programmed reduction (H2-TPR), temperature programmed oxidation (TPO), ammonia temperature programmed desorption (NH3-TPD), transmission electron microscopy (TEM) was performed. Transformation of V2O5 with 5 m2 g-1 low specific surface area by reduction at 340 ℃ to V2O3 showed a high specific surface area value of 115 m2 g-1 by micropore formation. As the nitridation temperature increased beyond that, the specific surface area continued to decrease due to sintering. The nitridation reaction variable that had the greatest influence on the specific surface area was the reaction temperature, and the x + y value of VNxOy of a single phase approached from 1.5 to 1.0 as the nitridation reaction temperature increased. At a high reaction temperature of 680 ℃, the cubic lattice constant a was VN. close to the value. At 680 ℃, the highest nitridation temperature among the experimental conditions, the ammonia conversion rate was 93%, and no deactivation was observed.

플라즈마 도핑 후 급속열처리법을 이용한 n+/p 얕은 접합 형성

  • Do, Seung-U;Seo, Yeong-Ho;Lee, Jae-Seong;Lee, Yong-Hyeon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.50-50
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    • 2009
  • In this paper, the plasma doping is performed on p-type wafers using $PH_3$ gas(10 %) diluted with He gas(90 %). The wafer is placed in the plasma generated with 200 W and a negative DC bias (1 kV) is applied to the substrate for 60 sec under no substrate heating. the flow rate of the diluted $PH_3$ gas and the process pressure are 100 sccm and 10 mTorr, respectively. In order to diffuse and activate the dopant, annealing process such as rapid thermal annealing (RTA) is performed. RTA process is performed either in $N_2$, $O_2$ or $O_2+N_2$ ambient at $900{\sim}950^{\circ}C$ for 10 sec. The sheet resistance is measured using four point probe. The shallow n+/p doping profiles are investigated using secondary ion mass spectromtry (SIMS). The analysis of crystalline defect is also done using transmission electron microscopy (TEM) and double crystal X-ray diffraction (DXRD).

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Influence of Inorganic Ions and pH on the Photodegradation of 1-Methylimidazole-2-thiol with TiO2 Photocatalyst Based on Magnetic Multi-walled Carbon Nanotubes

  • Jiang, Yinhua;Luo, Yingying;Lu, Ziyang;Huo, Pengwei;Xing, Weinan;He, Ming;Li, Jiqin;Yan, Yongsheng
    • Bulletin of the Korean Chemical Society
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    • v.35 no.1
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    • pp.76-82
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    • 2014
  • 1-Methylimidazole-2-thiol, as a kind of mercaptans, is a typical organic pollutant which has not been efficiently removed. In this study, titanium dioxide ($TiO_2$) photocatalyst based on magnetic multi-walled carbon nanotubes (MWCNTs) was synthesized via hydrothermal and sol-gel methods. The as-prepared photocatalyst was extensively characterized by X-ray diffraction (XRD), X-ray energy diffraction spectrum (EDS), transmission electron microscope (TEM), Fourier transform infrared (FT-IR) spectra, UV-Vis diffuse reflectance spectra (UV-vis DRS) and vibrating sample magnetometer (VSM). This photocatalyst of $TiO_2$/$Fe_3O_4$/MWCNTs was proved to exhibit high photocatalytic efficiency and the photodegradation rate could reach nearly 82.7% for the degradation of 1-methylimidazole-2-thiol under ultraviolet irradiation. In addition, the results demonstrated that inorganic ions had a negative impact on photodegradation of 1-methylimidazole-2-thiol to varying degrees. Moreover, pH had a great and complex effect on photocatalytic degradation of 1-methylimidazole-2-thiol under ultraviolet irradiation.

Synthesis of MnO2 Nanowires by Hydrothermal Method and their Electrochemical Characteristics (수열합성법을 이용한 망간 나노와이어 제조 및 이의 전기화학적 특성 연구)

  • Hong, Seok Bok;Kang, On Yu;Hwang, Sung Yeon;Heo, Young Min;Kim, Jung Won;Choi, Bong Gill
    • Applied Chemistry for Engineering
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    • v.27 no.6
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    • pp.653-658
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    • 2016
  • In this work, we developed a synthetic method for preparing one-dimensional $MnO_2$ nanowires through a hydrothermal method using a mixture of $KMnO_4$ and $MnSO_4$ precursors. As-prepared $MnO_2$ nanowires had a high surface area and porous structure, which are beneficial to the fast electron and ion transfer during electrochemical reaction. The microstructure and chemical structure of $MnO_2$ nanowires were characterized by scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, and Brunauer-Emmett-Teller measurements. The electrochemical properties of $MnO_2$ nanowire electrodes were also investigated using cyclic voltammetry and galvanostatic charge-discharge with a three-electrode system. $MnO_2$ nanowire electrodes showed a high specific capacitance of 129 F/g, a high rate capability of 61% retention, and an excellent cycle life of 100% during 1000 cycles.

Preparation of Al2O3 Thin Films by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide and Water and Their Reaction Mechanisms

  • An, Ki-Seok;Cho, Won-Tae;Sung, Ki-Whan;Lee, Sun-Sook;Kim, Yun-Soo
    • Bulletin of the Korean Chemical Society
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    • v.24 no.11
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    • pp.1659-1663
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    • 2003
  • $Al_2O_3$ thin films were grown on H-terminated Si(001) substrates using dimethylaluminum isopropoxide [DMAl: $(CH_3)_2AlOCH(CH_3)_2$], as a new Al precursor, and water by atomic layer deposition (ALD). The selflimiting ALD process by alternate surface reactions of DMAI and $H_2O$ was confirmed from measured thicknesses of the aluminum oxide films as functions of the DMAI pulse time and the number of DMAI-$H_2O$ cycles. Under optimal reaction conditions, a growth rate of ~1.06 ${\AA}$ per ALD cycle was achieved at the substrate temperature of $150\;^{\circ}C$. From a mass spectrometric study of the DMAI-$D_2O$ ALD process, it was determined that the overall binary reaction for the deposition of $Al_2O_3\;[2\;(CH_3)_2AlOCH(CH_3)_2\;+\;3\;H_2O\;{\rightarrow}\;Al_2O_3\;+\;4\;CH_4\;+\;2\;HOCH(CH_3)_2]$can be separated into the following two half-reactions: where the asterisks designate the surface species. Growth of stoichiometric $Al_2O_3$ thin films with carbon incorporation less than 1.5 atomic % was confirmed by depth profiling Auger electron spectroscopy. Atomic force microscopy images show atomically flat and uniform surfaces. X-ray photoelectron spectroscopy and cross-sectional high resolution transmission electron microscopy of an $Al_2O_3$ film indicate that there is no distinguishable interfacial Si oxide layer except that a very thin layer of aluminum silicate may have been formed between the $Al_2O_3$ film and the Si substrate. C-V measurements of an $Al_2O_3$ film showed capacitance values comparable to previously reported values.

Effect of Modified Atmosphere Packaging on Postharvest Quality of Kohlrabi (콜라비의 수확 후 MA 포장에 따른 품질 유지 효과)

  • Park, Me-Hea;Choi, Ji-Weon;Kim, Yong-Bum;Kim, Myeong-Hae;Won, Hee-Yeon;Shin, Sun-Young;Kim, Ji-Gang
    • Horticultural Science & Technology
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    • v.32 no.5
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    • pp.655-665
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    • 2014
  • The effect of modified atmosphere packaging (MAP) on kohlrabi (Brassica olerace L. gongulodes group)'s quality and antioxidant molecule during storage was examined to determine the optimal film package for maintaining freshness. To extend shelf life, MAP was tested using PE $50{\mu}m$ and oriented polypropylene (OPP) films with oxygen transmission rate (OTR) at 3,000, 10,000, $15,000mL/m^2/day/atm$. The OPP film packaging with modified oxygen transmission rate showed a delay in a weight loss and extended storage period. The package with OTR 3000 attained the desired gas composition of $O_2$ 3.2-6.7 kPa and $CO_2$ 13.1-19.8 kPa, in storage at room temperature. Kohlrabi stored in this package showed the lowest weight loss and the highest visual quality. Deterioration and off-odor were developed more rapidly in PE $50{\mu}m$ towards the end of the storage at room temperature. However, there are no differences among OTR films in visual quality and off-odor until 60 days at cold storage. Vitamin C content of kohlrabi was reduced rapidly in OTR 15000 with high transmission rate and showed less loss in PE $50{\mu}m$ and OTR 3000 in both room temperatures and cold storage. Results revealed that an OPP film with OTR 3000 extended the shelf life of kohlrabi in storage with maintained quality and vitamin C.

Effect of the Concentration of Complexing Agent on the Formation of ZnS Buffer Layer by CBD Method (CBD 방법에 의한 ZnS 버퍼층 형성의 착화제 농도에 따른 영향)

  • Kwon, Sang Jik;Yoo, In Sang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.10
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    • pp.625-630
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    • 2017
  • ZnS was chemically deposited as a buffer layer alternative to CdS, for use as a Cd-free buffer layer in $Cu(In_{1-x}Ga_x)Se_2$ (CIGS) solar cells. The deposition of a thin film of ZnS was carried out by chemical bath deposition, following which the structural and optical properties of the ZnS layer were studied. For the experiments, zinc sulfate hepta-hydrate ($ZnSO_4{\cdot}7H_2O$), thiourea ($SC(NH_2)_2$), and ammonia ($NH_4OH$) were used as the reacting agents. The mole concentrations of $ZnSO_4$ and $SC(NH_2)_2$ were fixed at 0.03 M and 0.8 M, respectively, while that of ammonia, which acts as a complexing agent, was varied from 0.3 M to 3.5 M. By varying the mole concentration of ammonia, optimal values for parameters like optical transmission, deposition rate, and surface morphology were determined. For the fixed mole concentrations of $0.03M\;ZnSO_4{\cdot}7H_2O$ and $0.8M\;SC(NH_2)_2$, it was established that 3.0 M of ammonia could provide optimal values of the deposition rate (5.5 nm/min), average optical transmittance (81%), and energy band gap (3.81 eV), rendering the chemically deposited ZnS suitable for use as a Cd-free buffer layer in CIGS solar cells.

Flowable Oxide를 이용한 저온 Flexible OLED 박막봉지 제작

  • Yong, Sang-Hyeon;Kim, Dae-Gyeong;Kim, Hun-Bae;Jo, Seong-Min;Chae, Hui-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.249-249
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    • 2012
  • 최근 주목받고 있는 Flexible Organic Light Emitting Diode (OLED) display에서는 Flexible 특성이 요구된다. 이는 현재 쓰이는 유리기판 대신 플라스틱기판으로 만들어야 가능하다. 하지만 플라스틱기판은 구성물질로 유기물을 사용하므로 수분과 산소의 투과에 매우 취약하다. 이는 장시간 사용 시 기판 위에 제작된 소자성능저하를 야기하는 등의 소자 신뢰도에 치명적 결함을 갖게 하는 원인이 된다. 따라서 기판 위의 소자를 보호할 수 있는 봉지기술 개발이 필요한데 가장 잘 알려진 플라스틱 기판에 적합한 Barrier기술로 유기물과 무기물을 교대로 적층하는 기술[1] 등이 있다. 본 연구에서는 PE-CVD 공정기술을 이용한 Flowable Oxide 박막과 ALD 공정기술을 이용한 Al2O3 무기물 박막을 적층하여 봉지박막을 구성하려 한다. Flowable Oxide는 저온공정이 가능하며 높은 증착속도와 뛰어난 Gap fill 특성을 가지고 있는데 이는 플라스틱기판의 엉성한 분자구조를 치밀하게 만들 것으로 예상되며 표면의 Pin-hole 또한 쉽게 채우는 특성이 있다. 실험은 Polyethylene Naphthalate (PEN) film 위에 PE-CVD 공정을 이용하여 Flowable Oxide를 증착하고, 그 후에 ALD 공정을 이용하여 Al2O3을 적층한 것을 하나의 샘플로 하였다. 샘플의 분석은 Ca test를 이용한 Water Vapor Transmission rate(WVTR)과 FT-IR, FE-SEM을 이용하여 분석하였다. FT-IR로 박막의 구성요소를 확인 하고 FE-SEM으로 박막의 Cross section image를 얻을 수 있었으며 또한 $4.85{\times}10^{-5}g/m^2$ day의 초기 WVTR 값을 얻을 수 있었다.

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The effect of the modification methods on the catalytic performance of activated carbon supported CuO-ZnO catalysts

  • Duan, Huamei;Yang, Yunxia;Patel, Jim;Burke, Nick;Zhai, Yuchun;Webley, Paul A.;Chen, Dengfu;Long, Mujun
    • Carbon letters
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    • v.25
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    • pp.33-42
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    • 2018
  • Activated carbon (AC) was modified by ammonium persulphate or nitric acid, respectively. AC and the modified materials were used as catalyst supports. The oxygen groups were introduced in the supports during the modifications. All the supports were characterized by $N_2$-physisorption, Raman, X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), and thermogravimetric analysis. Methanol synthesis catalysts were prepared through wet impregnation of copper nitrate and zinc nitrate on the supports followed by thermal decomposition. These catalysts were measured by the means of $N_2$-physisorption, X-ray diffraction, XPS, temperature programmed reduction and TEM tests. The catalytic performances of the prepared catalysts were compared with a commercial catalyst (CZA) in this work. The results showed that the methanol production rate of AC-CZ ($23mmol-CH_3OH/(g-Cu{\cdot}h)$) was higher, on Cu loading basis, than that of CZA ($9mmol-CH_3OH/(g-Cu{\cdot}h)$). We also found that the modification methods produced strong metal-support interactions leading to poor catalytic performance. AC without any modification can prompt the catalytic performance of the resulted catalyst.