• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권2호
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• pp.103-106
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• 2000

ZnO is a wide-bandgap II-IV semiconductor and has a variety of potnetial applications. ZnO exhibits good piezoelectric, photoelectric and optical properties, and is a good candidate for an electroluminescence device. ZnO films have been deposited on (001) sapphire by PLD technique. Nd:YAG pulsed laser was operated at a wavelength of $\lambda=355nm$. The ZnO films were deposited at oxygen pressures from base to 500 mTorr. The substrate temperatures was increased from $200^{\circ}C\; to\;700^{\circ}C$ films showed strong UV emission by increasing the partial oxygen pressure. We have investigated the relationship between partial oxygen pressure and the intensity of UV emission.

• Bulletin of the Korean Chemical Society
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• 제35권5호
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• pp.1465-1468
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• 2014

In this study, an intermediate temperature ionic conductor, $Ce_{0.95}Eu_{0.05}P_2O_7$, was prepared by solid state reaction. The variation of conductivities with the pressure $pH_2O$ or time were studied. The highest conductivity of $Ce_{0.95}Eu_{0.05}P_2O_7$ sample was observed in dry air atmosphere at $300^{\circ}C$ to be $1.1{\times}10^{-4}S{\cdot}cm^{-1}$ and in wet air atmosphere ($pH_2O=7.4{\times}10^3Pa$) at $100^{\circ}C$ to be $1.4{\times}10^{-3}S{\cdot}cm^{-1}$, respectively. The log ${\sigma}$ ~ log ($pO_2$) plot result indicated that $Ce_{0.95}Eu_{0.05}P_2O_7$ was almost a pure ionic conductor under high oxygen partial pressure and a mixed conductor of ion and electron under low oxygen partial pressure.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.729-732
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• 2001

In this study, the effect of oxygen partial pressure on the electrical properties of vanadium oxide(VO$_{x}$) thin films were investigated. The thin films were prepared by r.f. magnetron sputtering from V$_2$O$_{5}$ target in a gas mixture of argon and oxygen. The oxygen partial pressure ratio is changed from 0% to 8%. I-V characteristics were distinguished between linear and nonlinear region. In the low field region the conduction is due to Schottky emission, while at high fields it changes to Fowler-Nordheim tunneling type conduction. The conductivity measurements have shown an Arrhenius dependence of the conductivity on the temperature.ure.

• Bulletin of the Korean Chemical Society
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• 제7권5호
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• pp.341-346
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• 1986

The electrical conductivity of the system ${\alpha}-Fe_2O_3-CoO$ was measured in the temperature range 200-1000$^{\circ}C$ and PO$_{2}$ range 10$^{-7}-2{\times}10^{-1}$ atm. Possible defect models were suggested on the basis of conductivity data, which were measured as a function of temperature and of oxygen partial pressure. The observed activation energies were 0.50 eV and 1.01 eV in the low- and high-temperature regions, respectively. The observed conductivity dependences on PO$_{2}$ were ${\sigma}\;{\alpha}\;PO_2^{-1/6}$ in the PO$_{2}$ range $10^{-7}-10^{-4}$ atm and ${\sigma}\;{\alpha}\;PO_2^{-1/4}$ at PO$_{2}$ 's of $10^{-4}-2{\times}10^{-1}$ atm at temperatures from 300-1000$^{\circ}C$. An extrinsic electron conduction due to an Vo defect and an intrinsic electron conduction due to an Fei' defect were suggested at different temperature and oxygen partial pressure regions, respectively.

• 한국광물학회지
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• 제30권2호
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• pp.59-70
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• 2017

$SiO_2$는 지각과 맨틀을 구성하는 풍부한 물질로 고압 상태의 $SiO_2$ 원자구조를 결정짓는 전자구조적 특성에 대한 상세한 이해는 지구 내부의 탄성과 열역학적 성질에 대한 통찰을 제공한다. $SiO_2$처럼 경원소(low-z)로 이루어진 지구 물질의 고압상 전자구조는 in situ 고압 XRS (x-ray Raman scattering) 실험을 통해 연구되어 왔다. 하지만 기존의 고압 실험 방법으로는 물질의 국소 원자구조와 XRS 스펙트럼 간 상관관계를 밝히는데 한계가 있다. 이를 극복하고 더 높은 압력에서 존재하는 $SiO_2$에 대한 XRS 정보를 얻기 위해 밀도 범함수 이론(density functional theory; DFT)에 기반을 둔 제1원리(ab initio) 계산법을 이용한 XRS 스펙트럼 계산 연구들이 진행되고 있다. 비탄성 X-선 산란에 의하여 원자핵 주변 1s 오비탈에 만들어지는 전자-정공(core-hole)은 경원소 물질의 국소 전자구조에 크게 영향을 미치기 때문에 O K-edge XRS 스펙트럼 형태를 계산할 때 중요하게 고려해야 한다. 본 연구에서는 온-퍼텐셜 선형보충파(full-potential linearized augmented plane wave; FP-LAPW) 방법론에 기반하는 WIEN2k 프로그램을 사용하여 ${\alpha}-quartz$, ${\alpha}-cristobalite$ 그리고 $CaCl_2$-구조를 갖는 $SiO_2$에 대한 O 원자 전자 오비탈의 부분 상태밀도(partial density of states; PDOS)와 O K-edge XRS 스펙트럼을 계산하였다. 또한, $CaCl_2$-구조를 갖는 $SiO_2$의 O 원자 PDOS의 전자-정공 효과의 적용 여부에 따른 차이를 비교하여, 원자핵 부근 전자구조 변화에 따른 PDOS의 피크 세기와 위치 변화가 크게 나타났다는 사실을 확인할 수 있었다. 또한 계산된 각 $SiO_2$ 구조의 O K-edge XRS 스펙트럼이 각 $SiO_2$ 구조에서 계산된 O 원자의 $p^*$ 오비탈의 PDOS 결과와 매우 유사한 형태를 갖고 있음을 확인하였다. 이는 O K-edge XRS 스펙트럼이 갖는 대부분의 특징적인 피크들이 O 원자의 점유 1s 오비탈에서 $2p^*$ 오비탈로의 전자전이에 기인하기 때문이다. 본 연구의 결과는 $SiO_2$에 대한 정확한 O K-edge XRS 스펙트럼을 계산하는데 있어 전자-정공 효과를 고려해야 한다는 사실을 보여준다. 또한, 실험적으로는 재현이 어려운 고압 환경에 존재하는 $CaCl_2$-구조를 갖는 $SiO_2$ (~63 GPa)에 대한 O K-edge XRS 스펙트럼 계산을 통해, 제1원리 계산이 고압상 물질의 물성 연구에 이용될 수 있다는 사실을 보여준다.

• 대한금속재료학회지
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• 제47권2호
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• pp.107-113
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• 2009

Molten iron with 2 mass % carbon content was decarbonized at 1823 K~1923 K by bubbling $Ar+O_2$ gas through a submerged nozzle. The reaction rate was significantly influenced by the oxygen partial pressure and the gas flow rate. Little evolution of CO gas was observed in the initial 5 seconds of the oxidation; however, this was followed by a period of high evolution rate of CO gas. The partial pressure of CO gas decreased with further progress of the decarbonization. The overall reaction is decomposed to two elementary reactions: the decarbonization and the dissolution rate of oxygen. The assumptions were made that these reactions are at equilibrium and that the reaction rates are controlled by mass transfer rates within and around the gas bubble. The time variations of carbon and oxygen contents in the melt and the CO partial pressure in the off-gas under various bubbling conditions were well explained by the mathematical model. Based on the present model, it was explained that the decarbonization rate of molten iron was controlled by gas-phase mass transfer at the first stage of reaction, but the rate controlling step was transferred to liquid-phase mass transfer from one third of reaction time.

• 한국재료학회지
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• 제24권2호
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• pp.81-86
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• 2014

The nitrogen solubility and nitride capacity of $CaO-SiO_2-Al_2O_3-MgO-CaF_2$ slag systems were measured by using gas-liquid equilibration at 1773K. The nitrogen solubility of this slag system decreased with increasing CO partial pressure, with the linear relationship between nitrogen contents and oxygen partial pressure being -3/4. This system was expected to show two types of nitride solution behavior. First, the nitrogen solubility decreased to a minimum value and then increased with the increase of CaO contents. These mechanisms were explained by considering that nitrogen can dissolve into slags as "free nitride" at high basicities and as "incorporated nitride" within the network at low basicities. Also, the basicity of slag and nitride capacity were explained by using optical basicity. The nitrogen contents exhibited temperature dependence, showing an increase in nitrogen contents with increasing temperature.

• 한국재료학회지
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• 제5권5호
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• pp.583-597
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• 1995

We investigated the effect of the oxygne partial pressure on the phase stability of B $i_{2}$S $r_{2}$Ca C $u_{2}$ $O_{8+x}$ and B $i_{2}$S $r_{2}$C $a_{2}$C $u_{3}$ $O_{10+x}$ at 82$0^{\circ}C$. As the oxygen pressure decreased, B $i_{2}$Sr/sb 2/CaC $u_{2}$ $O_{8+x}$ melted at 2.2$\times$10$^{-3}$ atm $O_{2}$. In the case of the B $i_{1.7}$P $b_{0.4}$S $r_{2}$C $a_{2}$ $O_{10+x}$, it started to decompose into theree phases of B $i_{2}$S $r_{2}$Cu $O_{6+y}$, $Ca_{2}$Cu $O_{3}$ and C $u_{4}$ $O_{3}$ and C $u_{4}$ $O_{3}$ at 8.0$\times$10$^{-3}$ atm $O_{2}$ and was completely decomposed at 4.3$\times$10$^{-3}$ atm $O_{2}$ B $i_{2}$S $r_{2}$C $a_{2}$C $u_{3}$ $O_{10+x}$ phase was not formed by the solid state reaction from the mixutre of $i_{2}$S $r_{2}$CaCu.sub 2/ $O_{8+x}$, $Ca_{2}$Cu $O_{3}$ and CuO down to 2.2$\times$10.sub -3/ atm O.sub 2/ but formed by the solidifciation of the formed from the mixture of the intermediate compounds in the Bi-Sr-Ca-Cu-O system and the fromation temperature of Bi.sub 2/S $r_{2}$C $a_{2}$Cu.$_{3}$ $O_{10+x}$ can be lowered by reducing oxygen partial pressure.e.e.ure.e.e.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.364-368
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• 1997

We have investigated Pt and RuO$_2$as a bottom electrode for a device application of PZT thin film. The bottom electrodes were prepared by using an RF magnetron sputtering method. We studied some of the property influencing factors such as substrate temperature, gas flow rate, and RF power. An oxygen partial pressure from 0 to 50% was investigated. The results show that only Ru metal was grown without supp1ying any O$_2$gas. Both Ru and RuO$_2$phases were formed for O$_2$partial pressure between 10∼40%. A Pure RuO$_2$ phase was obtained with O$_2$partial pressure of 50%. A substrate temperature from room temperature to 400$^{\circ}C$ was investigated with XRD for the film crystallinity examination. The substrate temperature influenced the surface morphology and the resistivity of Pt and RuO$_2$as well as the film crystal structure. From the various considerations, we recommend the substrate temperature of 300$^{\circ}C$ for the bottom electrode growth. Because PZT film growth on top of bottom electrode requires a temperature process higher than 500$^{\circ}C$, bottom electrode properties were investigated as a function of post anneal temperature. As post anneal temperature was increased, the resistivity of Pt and RuO$_2$was decreased. However, almost no change was observed in resistivity for an anneal temperature higher than 700$^{\circ}C$. From the studies on resistivity and surface morphology, we recommend a post anneal temperature less than 600$^{\circ}C$.

• 한국전기전자재료학회논문지
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• 제18권3호
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• pp.226-230
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• 2005

This paper describes the photocatalytic degradation properties by oxygen partial pressure for TiO$_2$ thin films fabricated by dc magnetron reactive sputtering. And the structural, chemical, optical and photocatalytic properties were investigated at various analysis system. When TiO$_2$ thin film was made at deposition time of 120 min and Ar:O$_2$ ratio of 60:40, the best properties were obtained. That results were as follows: thickness; 360∼370 nm, gram size; 40 nm, optical energy band gap; 3.4 eV and Benzene conversion in the photocatalytic degradation; 11 %.