• 제목/요약/키워드: $N_2$ plasma treatment

검색결과 411건 처리시간 0.03초

Effect of an temperatures of post-spray heat treatment on wear behavior of $8%Y_2O_3-ZrO_2$ coating

  • Chae, Y.H.;Kim, S.S.
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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    • pp.181-182
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    • 2002
  • Most recent, Plasma ceramic spray is used on parts of tribosystem, has been investigated on the tribological performance. The application of ceramic coatings by plasma spray has become essential in tribosystems to produce better wear resistance and longer life in various conditions. The purpose of this work was to investigate the wear behavior of $8%Y_2O_3-ZrO_2$ coating due to temperatures of post-spay heat treatment. The plasma-sprayed $8%Y_2O_3--Zirconia$ coating was idiscussed to know the relationship between phase transformations and temperatures of post- spray heat treatment. Wear tests was carried out with ball on disk type on normal load of 50N, 70N and 90N under room temperature. The transformation of phase and the value of residual stress were measured by X-ray diffraction method(XRD). Tribological characteristics and wear mechanisms of coatings was observed by SEM. The tribologieal wear performance was discussed a point of view for residual stress. Consequently. post-spray heat treatment plays an important role in decreasing residual stress. Residual stress in coating system has a significant influence on the wear mechanism of coating.

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플라즈마 처리된 폴리스티렌 막을 통한 순수한 CO2 와 N2 기체의 선택·투과 특성 (Selectivity and Permeability Characteristics of Pure CO2 and N2 Gases through Plasma Treated Polystyrene Membrane)

  • 황의동;신희용;곽현;배성열
    • Korean Chemical Engineering Research
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    • 제44권6호
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    • pp.588-596
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    • 2006
  • 폴리스티렌 막(polystyrene membrane, PS)의 표면을 Ar, $O_2$ 플라즈마로 처리하고, 처리 전후의 변화를 관찰하였고, $CO_2$, $N_2$의 투과도와 $N_2$에 대한 $CO_2$의 선택도는 연속흐름 기체 투과 분석장치(GPA)를 이용하여 측정하였다. Ar플라즈마 처리의 경우 O/C비율이 0에서 0.179로 증가하고, 표면 거칠기가 $15.86{\AA}$에서 $71.64{\AA}$로 증가함으로써 접촉각은 처리전의 $89.16^{\circ}$에서 $18.1^{\circ}$로 감소하였다. 따라서 플라즈마 처리는 막표면을 높은 친수성을 갖도록 만들었다. $CO_2$의 투과도와 선택도에 대한 Ar플라즈마 처리최적조건은 60 W, 2 min, $70^{\circ}C$이며, 투과도와 선택도는 각각 $2.1{\times}10^{-12}[m^3(STP){\cdot}m/m^2{\cdot}sec{\cdot}atm]$와 4.51이었다. $O_2$플라즈마 처리의 경우에, 접촉각은 O/C비율(0.189)과 표면 거칠기($57.10{\AA}$)의 증가에 의해 $13.56^{\circ}$로 감소하였다. 최적의 처리조건은 90 W-2 min-$70^{\circ}C$이며, 값 $7.1{\times}10^{-12}[m^3(STP){\cdot}m/m^2{\cdot}sec{\cdot}atm]$와 값 11.5이었다. 플라즈마 처리 후 막 표면의 변화는 표면에서의 교차결합과 식각효과의 경쟁적인 관계에 의해 결정된다. 결국 플라즈마 처리된 막의 투과도와 선택도가 플라즈마 기체, 처리시간, 출력세기등과 같은 플라즈마 상태를 제어함으로써 향상되었음을 확인할 수 있었다.

Carbon Nano-Powder Functionalization and Disperisibility with Plasma Discharge

  • 강유석;정만기;이덕연;송석균;김성인
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.491-491
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    • 2013
  • A novel plasma system has been developed for 3-dimensional modification of the carbon nano-powders. Improvement of dispersion of these nano materials are studied by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and uniformity over the treated volume. The uniform dispersion is a critical factor for these material's nano composite applications. Using this plasma system, graphene, carbon black, and CNT was treated and functionalized. Several key discharge conditions such as Ar/H2/O2 or Ar/H2/NH3 gas ratio, treatment time, power, feeder's vibration frequency are investigated. Hydrophobic of graphene has turned some more into hydrophilic by reaction test with water, electrophoresis, surface contact angle test, and turbidity analysis. The oxygen content ratio in the plasma treated CNT has increased about 3.7 times than the untreatedone. In the case of graphene and carbon black, the oxygen- and nitrogen- content has been enhanced average 10%. O-H (N-H) peak, C-O (C-N) peak, and C=O (C=N) peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to O2 or NH3 content.

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SCM440강의 마이크로 펄스 플라즈마 질화 및 후산화처리시 질소농도에 따른 특성변화 (Effects of Nitrogen Contents on the Nitriding Characteristics of the Micro-Pulse Plasma and Post Oxidation Treated SCM440 Steel)

  • 이상기;정인상;이재식
    • 열처리공학회지
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    • 제12권2호
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    • pp.117-128
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    • 1999
  • This study was carried out to investigate the surface characteristics of SCM440 steel nitrided with various nitrogen contents for 7 hours at $520^{\circ}C$ by using micro-pulse plasma nitriding apparatus of hot wall type. The effects of oxidation treatment was also investigated on plasma nitrided in 30% nitrogen and post oxidized SCM440 steel at $500^{\circ}C$ in $H_2O$ atmosphere. The ${\gamma}^{\prime}-Fe_4N$ and ${\varepsilon}-Fe_{2-3}N$ phases were detected in compound layer of the nitrided steel. As the content of nitrogen in plasma gas increased with 30, 50, 70% on the micro-pulse plasma nitriding for SCM440 steel, the thickness of compound, diffusion layer and the surface hardness were increased. From the wear test results, the best wear resistance was appeared in the condition of ductile ${\gamma}^{\prime}-Fe_4N$ phase formed specimen at 30% nitrogen, whereas that of the treated with 50% and 70% nitrogen decreased owing to the exfoliation of brittle ${\varepsilon}-Fe_{2-3}N$ phase in the compound layer. On the nitrided and subsequently oxidized SCM440 steel, the surface layer consisted of $Fe_3O_4$, ${\gamma}^{\prime}-Fe_4N$, and ${\varepsilon}-Fe_{2-3}N$ phases. In these treatments, the dissolution of nitrides affect hardness and hardening depth in compound and diffusion layers. For the nitrided in 30% nitrogen and post oxidized specimen at $500^{\circ}C$ for 1 hour, the wear resistance was lower than that of the only nitrided one in 30% nitrogen but higher than those of the nitrided ones in 50 and 70% nitrogen.

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High-Efficiency a-Si:H Solar Cell Using In-Situ Plasma Treatment

  • Han, Seung Hee;Moon, Sun-Woo;Kim, Kyunghun;Kim, Sung Min;Jang, Jinhyeok;Lee, Seungmin;Kim, Jungsu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.230-230
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    • 2013
  • In amorphous or microcrystalline thin-film silicon solar cells, p-i-n structure is used instead of p/n junction structure as in wafer-based Si solar cells. Hence, these p-i-n structured solar cells inevitably consist of many interfaces and the cell efficiency critically depends on the effective control of these interfaces. In this study, in-situ plasma treatment process of the interfaces was developed to improve the efficiency of a-Si:H solar cell. The p-i-n cell was deposited using a single-chamber VHF-PECVD system, which was driven by a pulsed-RF generator at 80 MHz. In order to solve the cross-contamination problem of p-i layer, high RF power was applied without supplying SiH4 gas after p-layer deposition, which effectively cleaned B contamination inside chamber wall from p-layer deposition. In addition to the p-i interface control, various interface control techniques such as thin layer of TiO2 deposition to prevent H2 plasma reduction of FTO layer, multiple applications of thin i-layer deposition and H2 plasma treatment, H2 plasma treatment of i-layer prior to n-layer deposition, etc. were developed. In order to reduce the reflection at the air-glass interface, anti-reflective SiO2 coating was also adopted. The initial solar cell efficiency over 11% could be achieved for test cell area of 0.2 $cm^2$.

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내식성 및 표면경도 향상을 위한 AISI 304L 스테인리스강의 저온 플라즈마질화 프로세스 (Low Temperature Plasma Nitriding Process of AISI 304L Austenitic Stainless Steels for Improving Surface Hardness and Corrosion Resistance)

  • 이인섭
    • 대한금속재료학회지
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    • 제47권10호
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    • pp.629-634
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    • 2009
  • The effects of processing parameters on the surface properties of the hardened layers processed by the low temperature plasma nitrocarburizing and the low temperature two-step plama treatment (carburizing+nitriding) were investigated. The nitrogen-enriched expanded austenite structure (${\gamma}_N$) or S phase was formed on all of the treated surface. The surface hardness reached up to 1200 $HV_{0.025}$, which is about 5 times higher than that of untreated sample (250 $HV_{0.1}$). The thickness of hardened layer of the low temperature plasma nitrocarburized layer treated at $400^{\circ}C$ for 40 hour was only $15{\mu}m$, while the layer thicknesss in the two-step plama treatment for the 30 hour treatment increased up to about $30{\mu}m$. The surface thickness and hardness increased with increasing treatment temperature and time. In addition, the corrosion resistance was enhanced than untreated samples due to a high concentration of N on the surface. However, higher treatment temperature and longer treatment time resulted in the formation of $Cr_2N$ precipitates, which causes the degradation of corrosion resistance.

Reverse-bias Leakage Current Mechanisms in Cu/n-type Schottky Junction Using Oxygen Plasma Treatment

  • Kim, Hogyoung
    • Transactions on Electrical and Electronic Materials
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    • 제17권2호
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    • pp.113-117
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    • 2016
  • Temperature dependent reverse-bias current-voltage (I-V) characteristics in Cu Schottky contacts to oxygen plasma treated n-InP were investigated. For untreated sample, current transport mechanisms at low and high temperatures were explained by thermionic emission (TE) and TE combined with barrier lowering, respectively. For plasma treated sample, experimental I-V data were explained by TE or TE combined with barrier lowering models at low and high temperatures. However, the current transport was explained by a thermionic field emission (TFE) model at intermediate temperatures. From X-ray photoemission spectroscopy (XPS) measurements, phosphorus vacancies (VP) were suggested to be generated after oxygen plasma treatment. VP possibly involves defects contributing to the current transport at intermediate temperatures. Therefore, minimizing the generation of these defects after oxygen plasma treatment is required to reduce the reverse-bias leakage current.

Silicon 기판과 SiON 박막 사이의 계면 결함 감소를 위한 $NH_3$ Plasma Treatment 방법에 관한 연구

  • 공대영;박승만;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.131-131
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    • 2011
  • 이종접합 태양전지 제작을 위해 기판의 buffer layer로 사용되는 기존의 a-Si 박막을 SiON 박막으로 대체하려는 연구가 진행 중이다. 기존의 a-Si 박막은 대면적에서 균일도를 담보하기 어렵고, 열적 안정성에 취약한 문제점이 있다. 이에 반해 SiON 박막은 일종의 화학 반응인 oxidation 방법으로 형성이 되기 때문에 막의 균일도를 담보 할 수 있고, $400^{\circ}C$이상의 온도에서 형성되기 때문에 열적 안정성이 우수한 장점이 있다. 이러한 장점에도 불구하고 기판위에 직접 형성이 되기 때문에 기판과 SiON 계면 사이의 pssivation이 무엇보다 중요하다. 본 연구에서는 비정질 실리콘 이종접합 태양전지에 적용키 위한 SiON 박막을 형성하고, 기판과 SiON 계면에서의 passivation 향상을 위한 계면 결함 감소에 대한 연구를 진행하였다. 실험을 위한 SiON 박막은 공정온도 $450^{\circ}C$, 공정압력 100 mTorr, 증착파워 120 mW/cm2에서 5분간 증착하였으며, 이때 50 sccm의 N2O 가스를 주입하였다. 증착된 박막은 2~4 nm의 두께로 증착이 되었으며, 1.46의 광학적 굴절률을 가지는 것으로 분석되었다. 계면의 결함을 줄이기 위해 PECVD를 이용한 NH3 plasma treatment를 실시하였다. 공정온도 $400^{\circ}C$, 공정압력 150mTorr~450 mTorr, 플라즈마 파워 60mW/cm2에서 30분간 진행하였으며, 50 sccm의 N2O 가스를 주입하였다. 계면의 결함이 줄었는지 확인하기 위해 C-V 측정을 위한 시료를 제작하여 분석을 하였다. 실험 결과 VFB가 NH3 plasma treatment 이후 positive 방향으로 shift 됨을 알 수 있었다. Dit 분석을 통해 공정 압력 450 mTorr에서 $4.66{\times}108$[cm2/eV]로 가장 낮은 계면 결함 밀도를 확인 할 수 있었다. 결과적으로 NH3 plasma 처리를 통해 positive charge를 갖는 N-content가 형성되었음을 예측해 볼 수 있으며, N-content가 증가하면, 조밀한 Si-N 결합을 형성하면서, boron 및 phosphorus diffusion을 막는데 효과적이다. 또한, plasma treatment 과정에서 H-content에 의한 passivation 효과를 기대할 수 있다.

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Gas Pemeation of pure $CO_{2}$ and $N_{2}$ through plasma-Treated Polypropylene Membranes

  • Lee, Woo-Sup;Rew, Dae-Sun;Bae, Seong-Youl;Kumazawa, Hidehiro
    • Korean Membrane Journal
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    • 제1권1호
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    • pp.65-72
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    • 1999
  • The surface of polypropylene membrane was modified by plasma treatment using Ar,$N_{2}$, $NH_{2}$ and $O_{2}$ Permeabilities for $CO_{2}$, $N_{2}$ and separation factor for $CO_{2}$ relative to $N_{2}$ were measured. The permeation experiments were performed by a variable volume method at $25^{\circ}C$ and 0.303MPa. The effects of the plasma conditions such as treatement time power input gas flow rate and pressure in the reactor on the transport properties of modified membrane were investigated. The surface of the plasma treated membrane was analyzed by means of FTIR-ATR XPS and AFM. The surface structure of the plasma treated membrane was fairly different from that of the untreated membrane. Although the permeation rates for both $CO_{2}$ and $N_{2}$ decreased with increasing plasma treatement time the separation factor was found to be improved by the plasma treatement. The operating conditions of plasma treatement imposed on membranes had notable effect on the permeability and separation factor.

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N2 plasma treatment of pigments with minute particle sizes to improve their dispersion properties in deionized water

  • Zhang, Jingjing;Park, Yeong Min;Tan, Xing Yan;Bae, Mun Ki;Kim, Dong Jun;Jang, Tae Hwan;Kim, Min Su;Lee, Seung Whan;Kim, Tae Gyu
    • Journal of Ceramic Processing Research
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    • 제20권6호
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    • pp.589-596
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    • 2019
  • Pigments with minute particle sizes, such as carbon black (CB) and pigment red 48:2 (P.R.48:2), are the most important types of pigment and have been widely used in many industrial applications. However, minute particles have large surface areas, high oil absorption and low surface energy. They therefore tend to be repellent to the vehicle and lose stability, resulting in significant increases in viscosity or reaggregation in the vehicle. Therefore, finding the best way to improve the dispersion properties of minute particle size pigments presents a major technical challenge. In this study, minute particle types of CB and P.R.48:2 were treated with nitrogen gas plasma generated via radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) to increase the dispersion properties of minute particles in deionized (DI) water. The morphologies and particle sizes of untreated and plasma treated particles were evaluated using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The average distributions of particle size were measured using a laser particle sizer. Fourier transform infrared spectroscopy was carried out on the samples to identify changes in molecular interactions during plasma processing. The results of our analysis indicate that N2 plasma treatment is an effective method for improving the dispersibility of minute particles of pigment in DI water.