• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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• pp.38-41
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• 1994

The method of passivation for protecting the $Hg_{1-x}Cd_{x}$Te surface is important device fabrication process. Because the surface components are highly reactive leading to its chemical and electrical instability. Especially. the material of detecting for infrared radiation, of which composition is x=0.2 or 0.3, is narrow bandgap semi- conductor. The narrow bandgap semi conductors are largely governed by the properties of the semiconductor surface. The narrow bandgap semi-conductors are largely governed by the properties of the semiconductor surface. The electro-chemical processing of $Hg_{1-x}Cd_{x}$Te allows rigorous control of the surface chemistry and provides an in-suit monitor of surface reaction. So electro-chemical reduction at specific potential can be selectively eliminated the undesirable species on the surface and mainpulated to reproducibly attain the desired stoichiometry. This method shows to assess the quality of chemically treated good $Hg_{1-x}Cd_{x}$Te surface.

• 센서학회지
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• 제10권1호
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• pp.80-85
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• 2001

$Hg_{1-x}Cd_xTe$(MCT)박막을 $CdSO_4$, $TeO_2$, 및 $HgCl_2$이 혼합된 수용액을 사용하여 음극 전착법으로 ITO 유리와 티타늄기판 위에 성장하였다. 주된 박막의 성장 조건 변수로 전착전위와 성장 온도를 고려하였다. 전착된 MCT 박막은 SEM사진과 XRD 및 EPMA측정을 통하여 박막의 성장 조건이 결정 구조와 성분 조성비에 미치는 영향을 분석 연구하였다. XRD 분석으로부터 전착된 MCT 박막은 cubic zinc blonde 구조임을 알 수 있었고, EPMA에 의한 성분조성비의 분석결과로부터 전착전위를 변화시키므로서 MCT의 성분 조성비를 조절할 수 있음을 알 수 있었다.

• 센서학회지
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• 제13권4호
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• pp.277-281
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• 2004

$Hg_{1-x}Cd_{x}Te$ (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of $590^{\circ}C$ for 15 min. When the thickness of the CdTe buffer layer was $5{\mu}m$ or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111)/GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.

• 센서학회지
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• 제18권2호
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• pp.135-138
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• 2009

$64{\times}1$ forcal plane infrared detector has been fabricated by using HgCdTe epi layer. HgCdTe was grown on GaAs substrate by using metal organic chemical vapor deposition. This paper describes key developments in the epi layer growth and device fabrication process. The performance of IR imaging system is summarized.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.379-379
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• 2010

$Hg_{1_x}Cd_xTe$ (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of $590^{\circ}C$ for 15 min. When the thickness of the CdTe buffer layer was $5\;{\mu}m$ or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111) /GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.

• 대한전기학회논문지
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• 제43권3호
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• pp.420-431
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• 1994

The HgCdTe material, which is II-VI compound semiconductor, is important materials for the fabrication of the infrared detectros. To suggest the model of accurate MIS C-V calculation for narrow band gap semiconductors such as HgCdTe, non-parabolicity from k.p theory and degeneracy effect are considered. And partially ionized effect and compensation effect which are material's properties are also considerd. Especially, degenerated material C-V characteristics from Fermi-Dirac statistics and exact charge theory are presented to get more accurate analysis of the experimental results. Also the comparison with calculation results between the general MIS theory from Boltzmann appoximation method and this model which is considered the narrow band gap semiconductor properties, show that this model is more useful theory to determination of accurate low and high frequency C-V characteristics.

• 전자통신동향분석
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• 제3권4호
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• pp.45-56
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• 1988

적외선검출기용 반도체소자($Hg_1_xCd_xTe$)의 특성 및 응용에 대하여 조사하고, 국외의 연구현황과 국내의 문제점 및 향후 전망에 대하여 기술하였다. $Hg_1_xCd_xTe$는 조성에 따라 검지기 파장영역을 조절할 수 있으며, 그 자체에 검지부와 신호처리부를 집적할 수 있는 monolithic기술이 유망하여 앞으로 중요한 반도체중의 하나로 확립될 것이다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1993년도 추계 학술발표 강연 및 논문 개요집
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• pp.90-90
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• 1993

• 한국결정성장학회지
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• 제4권4호
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• pp.388-394
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• 1994

단결정 Hg(1-x)Cd(x)Te (MCT,X=0,21)가 특수 제작된 고압로에서 Traveling Heater Method(THM)으로 성장되었다.X-선 회절 실험으로 MCT는 입방ZnS 구조임을 확인하였다. 측정된 격자상수는 $6.464 {\AA}$이엇으며, J.C.Wooley가 측정한 값과 비교하여 얻은 MCT의 성분비는 0.21이었다.MCT의 결정 구조를 분석하기 위하여 X-선 회절 강도로 부터 전자 밀도를 계산하였다.전자 분포 밀도도로 부터 MCT는 주로 공유 결합을 하고 있으며, 인접 원자들 상에는 사면체 구조를 이루고 있음을 알 수 있다. 격자 상수가 Vegard line으로 부터 편이 되는 원인은 성분비x가 증가될 때 원자간 거리 변화의 비선형적 증가로 판단되며, 이것은 결합 에너지와 관련될 것으로 추축된다.

• 한국진공학회지
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• 제2권4호
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• pp.410-415
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• 1993

The direct growth OMVPE system, designed specificallyfor direct growth of Hg1-xCdxTe using annular rectant inlet inverted verticla (ARIIV) reactor, was constructed. This paper presents the detailed technical approach on a newly designed ARIIV reactor that increases Hg incorporation, imposes uniformity, and avoids the needs for temperature processing to create alloys by inter diffusion approach.