• 제목/요약/키워드: $H_2O$ addition

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나노영가철의 산화·환원에 의한 트리클로로에틸렌 처리특성 (Treatment Characteristics of Trichloroethylene(TCE) by Oxidation and Reduction with Nanoscale Zero-valent Iron)

  • 박영배;정용준;최정학;문병현
    • 한국환경과학회지
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    • 제23권5호
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    • pp.903-910
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    • 2014
  • This study examined the treatment characteristics of hard-to-degrade pollutants such as TCE which are found in organic solvent and cleaning wastewater by nZVI that have excellent oxidation and reduction characteristics. In addition, this study tried to find out the degradation characteristics of TCE by Fenton-like process, in which $H_2O_2$ is dosed additionally. In this study, different ratios of nZVI and $H_2O_2$, such as 1.0 mM : 0.5 mM, 1.0 mM : 1.0 mM, and 1.0 mM : 2.0 mM were used. When 1.0 mM of nZVI was dosed with 1.0 mM of $H_2O_2$, the removal efficiency of TOC was the highest and the first order rate constant was also the highest. When 1mM of nZVI was dosed with 0.5 mM of $H_2O_2$, the first order rate constant and removal efficiency were the lowest. The size of first order rate constant and removal efficiency was in the order of nZVI 1.0 mM : $H_2O_2$ 1.0 mM > nZVI 1.0 mM : $H_2O_2$ 2.0 mM > nZVI 1.0 mM : $H_2O_2$ 0.5 mM > $H_2O_2$ 1.0 mM > nZVI 1.0 mM. It is estimated that when 1.0 mM of nZVI is dosed with 1.0 mM of $H_2O_2$, $Fe^{2+}$ ion generated by nZVI and $H_2O_2$ react in the stoichiometric molar ratio of 1:1, thus the first order rate constant and removal efficiency are the highest. And when 1.0 mM of nZVI is dosed with 2.0 mM of $H_2O_2$, excessive $H_2O_2$ work as a scavenger of OH radicals and excessive $H_2O_2$ reduce $Fe^{3+}$ into $Fe^{2+}$. As for the removal efficiency of TOC in TCE by simultaneous dose and sequential dose of nZVI and $H_2O_2$, sequential dose showed higher first order reaction rate and removal efficiency than simultaneous dose. It is estimated that when nZVI is dosed 30 minutes in advance, pre-treatment occurs and nanoscale $Fe^0$ is oxidized to $Fe^{2+}$ and TCE is pre-reduced and becomes easier to degrade. When $H_2O_2$ is dosed at this time, OH radicals are generated and degrade TCE actively.

상압 공정을 이용한 침상형 5Mg(OH)2·MgSO4·3H2O 합성에 대한 MgSO4/MgO 효과 (Effect of MgSO4/MgO on the Synthesis of 5Mg(OH)2·MgSO4·3H2O Whiskers using One-step Ambient Pressure)

  • 유리;피재환;김형태;김유진
    • 한국세라믹학회지
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    • 제50권3호
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    • pp.201-205
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    • 2013
  • Magnesium hydroxide sulfate hydrate ($5Mg(OH)_2.MgSO_4{\cdot}3H_2O$, abbreviated 513 MHSH) whiskers were synthesized using MgO and $MgSO_4.7H_2O$ as reactants without addition of basic solution. Previously, MHSH whiskers were prepared by hydrothermal method using $MgSO_4$ in aqueous ammonia. In this work, for the first time, we synthesized a high purity MHSH via ambient pressure. In addition, a high molar ratio of $MgSO_4$ : MgO is an important key to the formation of high purity MHSH. Also, it was possible to prepare whiskers with high aspect ratio using an increasing reaction time in the reaction between the remaining $SO_4^{2-}$ ions and the ${Mg(OH)_6}^{4-}$ fragment, finally producing one-dimensional whiskers.

Colemanite 광물로부터 붕소화합물의 제조에 관한 연구 : 붕산제조 및 반응기구 (I) (Studies on Preparation of Boron Compounds from Colemanite Ore : Preparation of Boric Acid and Reaction Mechanism (I))

  • 최병현;임형미;지미정;장재훈;백종후;이미재
    • 한국세라믹학회지
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    • 제41권10호
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    • pp.756-765
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    • 2004
  • Colemanite($Ca_2B_6O_{11}{\cdot}5H_2O$)원광을 황산과 반응시켜 붕산을 추출하는 방법과 그 반응 기구에 대하여 연구하였다. colemanite에 황산을 첨가하고 가열하여 colemanite의 칼슘 성분을 황산칼슘으로 분리하고 붕산을 추출할 때, 첨가하는 황산 첨가량 은 colemanite에 존재하는 Ca 성분을 분리할 때 필요한 화학 양론적인 양보다 많아야 되며, 또한 초기 pH가 5 미만이어야 대부분의 colemanite가 분해되었다. 붕산으로 추출 시 영향을 주는 인자로는 분해온도, 분해시간, 황산 첨가량, 황산암모늄 첨가량, pH. 농축 정도 및 건조온도와 시간이었다. 황산 첨가 시 colemanite에 포함되어 있는 불순물 중 CaO와 MgO는 황산과 반응하여 침전을 형성하고, $SiO_2$는 불용 성분으로 황산칼슘과 함께 분리되고, $Al_2O_3,\;Fe_2O_3,\;TiO_2,\;Na_2O$ 등은 황산과 반응하여 액상 상태로 존재하였다. 이 액상에 암모니아를 첨가하여 존재하는 나머지 불순물을 수산화물 형태로 분리, 석출하였으며, pH 조정과 산성화, 농축, 재결정화 과정을 통하여 붕산을 제조하였다.

$NH_3/O_2$산화법으로 성장한 산화막의 특성평가 (Characterizations of Oxide Film Grown by $NH_3/O_2$ Oxidation Method)

    • 한국진공학회지
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    • 제7권2호
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    • pp.82-87
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    • 1998
  • $O_2$기체에 $NH_3/O_2$기체를 첨가하여 실리콘 표면에 산화막을 형성하는 $NH_3/O_2$산화법 에 의한 산화공정시 반응석영관 외부에 방출하는 기체는 $N_2,O_2$$H_2O$이며 극소량의 $CO_2$, NO 및 $NO_2$가 검출되었다. 두 종류의 산화제($O_2$$H_2O$)가 산화에 기여하며 성장률은 $NH_3$$O_2$ 의 부분압과 온도에 의해 결정되며, 그 기울기는 건식 및 습식 산화법의 중간에 평행 하게 위치함을 확인하였다. Auger Electron Spectroscopy(AES) 측정결과 $NH_3/O_2$ 산화막은 정확한 $SiO_2$의 화학량론을 가지며 $SiO_2/Si$계면에 발생하는 결합을 억제하며 고정전하의 발 생을 최소화함을 알 수 있었다. $NH_3/O_2$ 산화막(470$\AA$)의 항복전압을 57.5Volt이며, C-V특성 곡선을 축정한 결과 플랫밴드 전압은 0.29Volt이며 곡선의 형태는 이상곡선과 일치하였다.

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Acid Structure of MgO-SiO₂Binary Oxide Catalyst and Activity for Acid Catalysis

  • 손종락;박은희;김하원
    • Bulletin of the Korean Chemical Society
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    • 제18권2호
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    • pp.203-208
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    • 1997
  • A series of MgO-SiO2 catalysts were prepared by coprecipitation from the mixed solution of magnesium chloride and sodium silicate. Some of the sample were modified with 1 N H2SO4 and used as modified catalysts. The addition of MgO to SiO2 caused the increase of acidity and the shift of O-H and Si-O stretching bands of the silanol group to a lower frequency in proportion to the MgO content. The acid structure of MgO-SiO2 agreed with that proposed by Tanabe et al.. Catalytic activity for 2-propanol dehydration increased in relation to the increase of acidity and band shift to a lower frequency.

NF3 / H2O 원거리 플라즈마 건식 세정에 의한 SiGe 표면 특성 변화 (SiGe Surface Changes During Dry Cleaning with NF3 / H2O Plasma)

  • 박세란;오훈정;김규동;고대홍
    • 반도체디스플레이기술학회지
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    • 제19권2호
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    • pp.45-50
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    • 2020
  • We investigated the Si1-xGex surface properties when dry cleaning the films using NF3 / H2O remote plasma. After the dry cleaning process, it was found that about 80-250 nm wide bumps were formed on the SiGe surface regardless of Ge concentration in the rage of x = 0.1 ~ 0.3. In addition, effects of the dry cleaning processing parameters such as pressure, substrate temperature, and H2O flow rates were examined. It was found that the surface bump is significantly dependent on the flow rate of H2O. Based on these observations, we would like to provide additional guidelines for implementing the dry cleaning process to SiGe materials.

Inhibition of Escherichia coli O157:H7 Attachment by Interactions Between Lactic Acid Bacteria and Intestinal Epithelial Cells

  • Kim, Young-Hoon;Kim, Sae-Hun;Whang, Kwang-Youn;Kim, Young-Jun;Oh, Se-Jong
    • Journal of Microbiology and Biotechnology
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    • 제18권7호
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    • pp.1278-1285
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    • 2008
  • The intestinal epithelial cell (IEC) layer of the intestinal tract makes direct contact with a number of microbiota communities, including bacteria known to have deleterious health effects. IECs possess innate protective strategies against pathogenic challenge, which primarily involve the formation of a physicochemical barrier. Intestinal tract mucins are principal components of the mucus layer on epithelial surfaces, and perform a protective function against microbial damage. However, little is currently known regarding the interactions between probiotics/pathogens and epithelial cell mucins. The principal objective of this study was to determine the effects of Lactobacillus on the upregulation of MUC2 mucin and the subsequent inhibition of E. coli O157:H7 attachment to epithelial cells. In the current study, the attachment of E. coli O157:H7 to HT-29 intestinal epithelial cells was inhibited significantly by L. acidophilus A4 and its cell extracts. It is also important to note that the expression of MUC2 mucin was increased as the result of the addition of L. acidophilus A4 cell extracts (10.0 mg/ml), which also induced a significant reduction in the degree to which E. coli O157:H7 attached to epithelial cells. In addition, the mRNA levels of IL-8, IL-1$\beta$, and TNF-$\alpha$ in HT-29 cells were significantly induced by treatment with L. acidophilus A4 extracts. These results indicate that MUC2 mucin and cytokines are important regulatory factors in the immune systems of the gut, and that selected lactobacilli may be able to induce the upregulation of MUC2 mucin and specific cytokines, thereby inhibiting the attachment of E. coli O157:H7.

침전제적하법에 의한 나노 TiO2코팅 석탄회 복합체 제조 (Synthesis of Nano TiO2 Coated on Fly Ash Composites by the Precipitation Dropping Method)

  • 신대용;한상목
    • 한국세라믹학회지
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    • 제39권6호
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    • pp.550-557
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    • 2002
  • 광촉매용 TiO$_2$코팅 석탄회 복합체를 침전제적하법을 이용하여 합성한 후, $700^{\circ}C$에서 2시간 열처리하여 제조하였다. 석탄회 표면의 TiO$_2$ 입자 석출상태와 결정상은 반응용액의 pH, 침전제인NH$_4$HCO$_3$의 주입속도, 교반속도, 반응온도 및 TiC1$_4$ 의 첨가량에 영향을 받았다. NH$_4$HCO$_3$의 주입속도=1.0ml/min, 반응용액의 pH=6, 교반속도=1,000rpm 및 반응온도=8$0^{\circ}C$인 석탄회의 표면에는 약 10m의 TiO$_2$ 입자가 균일하게 석출되었으나,NH$_4$HCO$_3$의 주입속도=0.3 및 0.5ml/min, 반응용액의 pH=2 및 11 ,교반속도=300~500rpm 및 반응온도=5$0^{\circ}C$ 이하인 석탄회의 표면에는 불균일한 TiO$_2$ 입자의 석출이 관찰되었다. NH$_4$HCO$_3$의 주입속도와 반응온도가 증가하고 TiC1$_4$의 농도가 감소함에 따라 석탄회 표면에 석출된 anatase상의 결정성은 열처리온도에 따라 증가하였으나,800"C에서 rutile로 전이하였다 반응온도와 NH$_4$HCO$_3$의 주입속도 및 Tic14의 농도가 증가함에 따라 rutile상이 생성되었다. $700^{\circ}C$에서 2시간 열처리하여 약 21m의 anatase상 TiO$_2$ 입자가 코팅된 석탄회 복합체는 1.25g/㎤의 밀도, 82.8%의 강도 및 69.5Lab의 백색도를 나타내었으며, 광촉매로 응용이 가능하였다.능하였다.

$Y_{2}O_{3}$가 첨가된 $Pr_{6}O_{11}$계 ZnO 바리스터의 d.c. 스트레스에 따른 안정성 (Stability of $Pr_{6}O_{11}$-Based ZnO Varistors Doped with $Y_{2}O_{3}$ under d.c. Stresses)

  • 윤한수;류정선;남춘우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.551-554
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    • 2000
  • The stability of $Pr_6$$O_{11}$-based ZnO varistors doped with $Y_2$$O_3$ was investigated under various d.c. stresses. The varistors were sintered at $1350^{\circ}C$ for 1h in the addition range of 0.0 to 4.0 mol% $Y_2$$O_3$. The varistors doped with $Y_2$$O_3$ exhibited much higher nonlinearity than that without $Y_2$$O_3$. In Particular, the varistors containing 0.5 mol% $Y_2$$O_3$ showed very excellent V-I characteristics, which the nonlinear exponent was 51.19 and the leakage current was 1.32 $\mu\textrm{A}$. And these varistors also showed an excellent stability, which the variation rate of the varistor voltage and the nonlinear exponent were -0.80% and -2.17%, respectively, under 4th d.c. stress, such as (0.80 $V_ {1mA}$/$90^{\circ}C$/12h)+(0.85 $V_{1mA}$/$115^{\circ}C$/12h)+(0.90 $V_{1mA}$/$120^{\circ}C$/12h)+(0.95 $V_{1mA}$/$125^{\circ}C$/12h). Consequently, since $Pr_ 6$$O_{11}$-based ZnO varistors doped with 0.5 mol% $Y_2$$O_3$ have an excellent stability as well as good nonlinearity, it is expected to be usefully used to develop the superior varistors in future.

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평면형 PLASMA 시스템에서의 방전 전압에 관한 연구 (A STUDY OF DISCHARGE VOLTAGE IN PLANER PLASMA SYSTEM)

  • 김종식;강봉구;권오대
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1989년도 하계종합학술대회 논문집
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    • pp.426-428
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    • 1989
  • As a first phase of plasma study intended for semiconductor processing research, we have studied the discharge phenomena. In particular, we have obtained a specific formula for the breakdown voltage as a function of the neutral state pressure of reactive gases. Our experimental results with H2,O2,Ar,CF4 seem ro verify this formula. In addition we find the voltage levels for various gases in the descending order of CF4>O2=Ar>H2 in high pressure region, while H2>CF4>O2>Ar in low pressure region. When H2 and CF4 were mixed, we observe the overall voltage dominated by the gas with lower breakdown volotage.

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