• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1010-1014
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• 2004

High quality GaN layer and $In_xGa_{1-x}N$ alloy were obtained on (0001)sapphire substrate using ammonia$(NH_3)$ and dimethylhydrazine$(DMH_y)$ as a nitrogen source by gas source molecular hem epitaxy(GSMBE) respectively. As a result, RHEED is used to investigate the relaxation processes which take place during the growth of GaN and $In_xGa_{1-x}N$. The full Width at half maximum of the x-ray diffraction(FWHM) rocking curve measured from Plane of GaN has exhibitted as narrow as 8 arcmin. Photoluminescence measurement of GaN and $In_xGa_{1-x}N$ were investigated at room temperature, where the intensity of the band edge emission is much stronger than that of deep level emission. In content of $In_xGa_{1-x}N$ epitaxial layer according to growth condition was investigated.

• 한국재료학회지
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• 제12권1호
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• pp.54-57
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• 2002

We have grown undoped $In_ xGa_{1-x}N,\; In_xGa_{1-x}N:Si\;and\;In_{0.1}Ga_{0.9}N:Zn$ thin films by MOCVD at temperature between 880 and $710^{\circ}C which endows various In composition in the epilayer from 0.07 to 0.22 as examined using X-ray diffraction, optical absorption(OA), photocurrent (PC) and photoluminescence (PL). The In molar fraction estimated from PL results is higher than that from the OA, PC, and X-ray data for $X{\le}0.22$, which may be caused by phase separation. However, the In molar fraction estimated by X-ray diffraction, OA, PC and PL for $In_xGa_{1-x}N:Si$ does not show discrepancy. With the appropriate Zn doping in undoped $In_{0.1}Ga_{0.9}N$, the emission peak is shifted from 3.15 eV which originates from the band edge emission peak to 2.65 eV which resulted from the conduction band to acceptor transition due to a deep acceptor level.

• 한국전기전자재료학회논문지
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• 제22권8호
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• pp.677-681
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• 2009

$In_xGa_{1-x}N$ alloys with 20-nm-thickness were deposited onto Mg:GaN/AlN/SiC substrates by MOCVD at $800\;^{\circ}C$. TMGa, TMIn and $NH_3$ were used as the precursor of gallium, indium and nitrogen, respectively. The mole ratio of indium in $In_xGa_{1-x}N$ films varied between 0 and 0.2. The energy-band-gaps of the films were obtained from the photoluminescence and cathodoluminescence peaks. The mole ratios of $In_xGa_{1-x}N$ films were calculated by applying Vegard's law to XRD results. The energy-band-gap versus indium composition plot for $In_xGa_{1-x}N$ alloys were well fit with a bowing parameter of 2.27.

• 한국진공학회지
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• 제15권2호
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• pp.162-167
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• 2006

[ $GaAs_{1-x}N_{x}$ ]의 전도띠 바닥전자상태의 특성을 Ge 기판위에 성장시킨 $GaAs_{1-x}N_{x}(x{\leq}0.7)$ 박막에 대한 공명라만산란 실험을 수행함으로써 조사하였다. LO(longitudinal optical)-phonon 라만세기의 강한 공명상승이 $E_+$ 뿐만 아니라 $E_0$ 전이에너지 근처에서 관측되었다. 그러나 $E_+$ 전이에너지 아래와 근처에서 관측되는 분명한 LO-phonon 선폭 공명상승과 다양한 X와 L 영역경계 (zone-boundary) phonon의 활성화와는 대조적으로, $E_0$ 전이에너지 근처에서는 어떠한 LO-phonon 선폭 확장공명이나 날카로운 영역경계 phonon의 활성화가 관측되지 않았다. 관찰된 공명라만산란 결과는 GaAsN의 전도띠 바닥전자상태가 비국소화된 bulk GaAs와 거의 흡사한 ${\Gamma}$대칭 상태로 구성되었다는 사실을 의미한다.

• 전자공학회논문지A
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• 제28A권1호
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• pp.30-39
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• 1991

The influence of physical parameters (Al mole fraction, thickness, doping concentration) in the window and emitter on the efficiency characteristics of heteroface p-$Al_{x}Ga_{1-x}As/p-GaAs/n-GaAs/n^{+}$-GaAs solar cell is investigated. The maximum efficiency theoretically calculated in this device is obtained when a thickness of the window is in a range of (400-1000))$\AA$and a thickness/doping concentration of the emitter is in a range of (0.5-0.8)$\mu$m/(1-7)${\times}10^{17}cm^{-3}$, respectively. Also is the efficiency improved according to the increase of Al mole fraction in the indirect gap window(0.41${\le}x{\le}1.0$). The optimum designed heteroface cell with an area of 0.165cm$^2$fabricated using MOCVD exhibits an active area conversion efficiency of 17%, having a short circuit current density of 21.2mA/cm\ulcorner an open circuit voltage of 0.94V, and a fill factor of 0.75 under ELH-100mW/cm$^2$illumination.

• 한국전자통신학회논문지
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• 제14권5호
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• pp.877-886
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• 2019

본 연구에서는 band anticrossing 모델을 사용하여 온도와 조성비 변화에 따른 4원계 질화물계 화합물 반도체 $In_yGa_{1-y}As_{1-x}N_x$의 에너지 밴드갭과 광학상수를 계산하였다. 300K의 조성비 구간($0{\leq}x{\leq}0.05$, $0{\leq}y{\leq}1.0$)에서 에너지 밴드갭들이 연속적으로 감소하며, 계산된 휨 매개변수는 0.522eV가 사용되었다. 에너지 밴드갭 계산 결과는 다른 연구 결과와 대체로 잘 일치하였다. 또한 에너지 밴드갭 결과를 새롭게 제안한 모델식에 적용하여 굴절률 n과 고주파 유전상수 ${\varepsilon}$를 계산하였다.

• 한국전자통신학회논문지
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• 제13권6호
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• pp.1213-1222
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• 2018

본 연구에서는 무질서 효과가 고려된, 새로이 가정한 가상 결정 근사법을 갖는 empirical pseudopotential method를 사용하여 온도와 조성비 변화에 따른 3원계 질화물계 화합물 반도체 $GaAs_{1-X}N_X$의 휨 매개변수 및 에너지 밴드갭을 계산하였다. 300K의 조성비 구간($0{\leq}x{\leq}0.05$)에서 에너지 밴드갭들이 급격히 감소하며, 해당하는 계산된 휨 매개변수가 15eV임을 알 수 있었다. 에너지 밴드갭 계산 결과로부터 굴절률 n과 고주파 유전상수 ${\varepsilon}$ 등의 광학상수를 계산하였고, 에너지 밴드갭 계산 결과는 실험치를 대체로 잘 설명하였다.

• 한국재료학회지
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• 제22권4호
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• pp.185-189
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• 2012

We report plasma-assisted molecular beam epitaxy of $In_XGa_{1-X}N$ films on c-plane sapphire substrates. Prior to the growth of $In_XGa_{1-X}N$ films, GaN film was grown on the nitride c-plane sapphire substrate by two-dimensional (2D) growth mode. For the growth of GaN, Ga flux of $3.7{\times}10^{-8}$ torr as a beam equivalent pressure (BEP) and a plasma power of 150 W with a nitrogen flow rate of 0.76 sccm were fixed. The growth of 2D GaN growth was confirmed by $in-situ$ reflection high-energy electron diffraction (RHEED) by observing a streaky RHEED pattern with a strong specular spot. InN films showed lower growth rates even with the same growth conditions (same growth temperature, same plasma condition, and same BEP value of III element) than those of GaN films. It was observed that the growth rate of GaN is 1.7 times higher than that of InN, which is probably caused by the higher vapor pressure of In. For the growth of $In_xGa_{1-x}N$ films with different In compositions, total III-element flux (Ga plus In BEPs) was set to $3.7{\times}10^{-8}$ torr, which was the BEP value for the 2D growth of GaN. The In compositions of the $In_xGa_{1-x}N$ films were determined to be 28, 41, 45, and 53% based on the peak position of (0002) reflection in x-ray ${\theta}-2{\theta}$ measurements. The growth of $In_xGa_{1-x}N$ films did not show a streaky RHEED pattern but showed spotty patterns with weak streaky lines. This means that the net sticking coefficients of In and Ga, considered based on the growth rates of GaN and InN, are not the only factor governing the growth mode; another factor such as migration velocity should be considered. The sample with an In composition of 41% showed the lowest full width at half maximum value of 0.20 degree from the x-ray (0002) omega rocking curve measurements and the lowest root mean square roughness value of 0.71 nm.

• 한국진공학회지
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• 제18권1호
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• pp.37-43
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• 2009

$In_xGa_{1-x}N$/GaN 다중양자우물 구조의 EL 특성을 온도와 주입전류 변화에 따른 특성을 조사하였다 저전류와 고전류 주입시 EL 효율의 온도 의존 변화는 매우 다르게 나타나는데, 이러한 온도와 전류의 변화에 의한 독특한 EL 효율의 변화는 내부전기장의 존재 하에 순방향 바이어스에 기인한 외부전기장의 영향인 것으로 볼 수 있다. 그리고 $In_xGa_{1-x}N$/GaN 다중양자우물 구조에서 In 성비의 증가는 발광파장위치의 적색이동을 보였다. 15K에서 주입 전류의 증가에 따라 녹색 양자우물 구조는 80 meV와 청색 양자우물 구조는 22 meV의 청색 편이를 하였다. 이는 전류의 증가에 의해 단위 시간당 생성되는 캐리어 수가증가하게 되고 그에 따라 subband가 급격히 채워지는 band filling 현상이 일어나게 되어 짧은 파장에서 재결합이 증가하기 때문이다. 그리고 청색과 녹색 다중 양자우물구조의 짧은 파장 쪽으로의 편이 차이는 In 농도에 기인한 것으로 In 농도가 높으면 양자우물 깊이가 증가되어 더 강한 양자속박효과가 작용하여 캐리어 구속력이 증가하기 때문 것으로 볼 수 있다.

• 한국진공학회지
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• 제7권s1호
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• pp.15-19
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• 1998

Structural and optical properties of $In_xGa_{1-X}N$ as well as $In_{0.1}Ga_{0.9}N$/GaN single quantum we11 (SQW) grown on sapphire (0001) substrate with an based GaN using rf-plasma assisted MBE have been investigated. The quality of the InXGal.,N fdm was improved as the growth temperature increased. In PL measurements at low temperatures, the band edge emission peaks of $In_xGa_{1-X}N$ was shifted to red region as an indium cell and substrate temperature increased. For $In_{0.1}Ga_{0.9}N$/GaN SQW, the optical emission energy has blue shift about 15meV in PL peak, due to the confined energy level in the well region. And, the FWHM of the $In_{0.1}Ga_{0.9}N$/GaN SQW was larger than that of the bulk Ino,la.9N films. The broadening of FWHM can be explained either as non-uniformity of Indium composition or the potential fluctuation in the well region. Photoconductivity (PC) decay measurement reveals that the optical transition lifetimes of the SQW measured gradually increased with temperatures.