• Title/Summary/Keyword: $Cl_{2}O_{2}$

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Deconvolution of UV Spectrum for Selective Measurement of $ClO_2$ Concentration Quantitatively in Solution Containing Various Chlorine Species (다양한 염소 종이 함유된 수용액에서 자외선 흡수 파장 분해법을 이용한 이산화염소 선별 정량 분석)

  • Byun, Youngchul;Kim, Jaehoon;Jang, Yumi;Lee, Kiman;Lee, Jae Myeong;Shin, Dong Nam
    • Journal of Korean Society of Environmental Engineers
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    • v.34 no.11
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    • pp.743-750
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    • 2012
  • An ultraviolet (UV) absorption method has a difficulty to analyze $ClO_{2(aq)}$ in solutions containing various chlorine species because UV spectrum of $ClO_{2(aq)}$ overlaps with other chlorine-containing species. This study has proposed the deconvolution method of UV spectrum to analyze $ClO_{2(aq)}$ concentration quantitatively in solution containing various chlorine species. We compared results obtained from UV deconvolution method with titration method. Good agreement of $ClO_{2(aq)}$ concentration between them has been shown in about 10%. This result informs us that the deconvolution method of UV spectrum could be a feasible for the analysis of $ClO_{2(aq)}$ in solution containing various chlorine species.

Chemical Equilibrium between Metalloporphyrins (MTPP and M(o-Cl)TPP) and Basic Ligands(L). (M = $Zn^{2+],\;Cu^{2+},\;Ni^{2+}$: TPP = tetraphenylporphyrin, (o-Cl)TPP = tetrakis (ortho-chlorophenyl)porphyrin: L = imidazole, pyridine, 1-methylimidazole, 2,6-lutidine) (Methalloporphyrin(MTPP 및 M(o-Cl)TPP)과 염기성리간드(L)간의 화학평형. (M = $Zn^{2+},\;Cu^{2+},\;Ni^{2+}$:TPP = tetraphenylporphyrin, (o-Cl)TPP = tetrakis (ortho-chlorophenyl)porphyrin: L = imidazole, pyridine,1-methylimidazole, 2,6-lutidine))

  • Yu Chul Park;Seong Su Kim;Hun Gil Na
    • Journal of the Korean Chemical Society
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    • v.35 no.5
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    • pp.512-519
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    • 1991
  • The axial ligations of nitrogenous bases (pyridine, imidazole, 1-methylimidazole and 2,6-lutidine) to Zn(II)-, Cu(II)-, and Ni(II)-tetrakis(o-chlorophenyl)porphyrin(o-ClTPP), and -tetraphenylporphyrin (TPP) were investigated in organic solvents $(CH_2Cl_2,\;C_6H_6,\;CH_3NO_2,\;(CH_3)_2CO,\;CHCl_3,\;DMF\;and\;DMSO)$ and at 0.01M of ionic strength. The equilibrium constants for the ligation reactions of methalloporphyrins were determined using spectrophotometric method at 15∼35${\circ}C$. In case of M(II)-TPP the equilibrium constants K were considerably larger than those of M(II)-(o-Cl)TPP, depending on steric effect of the porphyrin. The linear relationships between logK of the axial ligation and $pK_a$ of nitrogenous base were shown in M(II)-TPP, but not in M(II)-(o-Cl)TPP. The stabilities of MTPP(L) were controlled by the reation enthalpy and entropy, while those of M(o-Cl)TPP almost by the reaction entropy. The coordinating power of solvent to the methalloporphyrin were also studied in $CHCl_3,\;(CH_3)_2CO$, DMF and DMSO. From those results the solvent effects on the equilibrium constants were discussed.

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Evidence for Singlet Oxygen Involvement in Cell-free Myeloperoxidase/$H_2O_2$/ Chloride Sytem: Exclusion of Hydroxyl Radical Involvement (Cell-free Myeloperoxidase/$H_2O_3$/Chloride System에서 Singlet Oxygen이 관여한다는 실험적 증거)

  • Chung Myung-Hee;Kim Yong-Sik
    • The Korean Journal of Pharmacology
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    • v.20 no.1 s.34
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    • pp.1-11
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    • 1984
  • The present study was performed to determine oxygen metabolites involved in cell-free MPO/$H_2O_2/Cl^-$ system by observing the effects of their scavengers on NADH oxidation and ethylene production from methional by the action of MPO prepared from human leukocytes. It was clearly demonstrated that NADH was oxidized by the cell-free MPO/$H_2O_2/Cl^-$ system as evidenced by complete inhibition of the oxidation of the substrate in the presence of eiher azide or catalase, or by omitting $Cl^-$. The MPO-mediated oxidation of NADH was completely abolished by a $^1O_2$ quencher, DABCO but not by $OH{\cdot}$ scavengers, mannitol, benzoate, formate and methanol. In ethylene assay, no ethylene was detected from methional in the MPO/$H_2O_2/Cl^-$ system with evident production of the gas by xanthine-oxidase and $Cu^{++}-H_2O_2$ systems which are suggested to generate $OH{\cdot}$. From the results obtained, it is concluded that $^1O_2$ is a major mediator with exclusion of $OH{\cdot}$ involvement in the cell-free MPO-mediated oxidation.

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The Characteristics of (Ba,Sr)$TiO_3$ Thin Films Etched With The high Density $BCl_3/Cl_2$/Ar Plasma ($BCl_3/Cl_2$/Ar 고밀도 플라즈마에서 (Ba,Sr)$TiO_3$ 박막의 식각 특성에 관한 연구)

  • Kim, Seung-Bum;Kim, Chang-Il
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.863-866
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    • 1999
  • (Ba,Sr)$TiO_3$ thin films have attracted groat interest as new dielectric materials of capacitors for ultra-large-scale integrated dynamic random access memories (ULSI-DRAMs) such as 1 Gbit or 4 Gbit. In this study, inductively coupled $BCl_3/Cl_2$/Ar plasmas was used to etch (Ba,Sr)$TiO_3$ thin films. RF power/dc bias voltage = 600 W/-250 V and chamber pressure was 10 mTorr. The $Cl_2/(Cl_2+Ar)$ was fixed at 0.2, the (Ba,Sr)$TiO_3$ thin films were etched adding $BCl_3$. The highest (Ba,Sr)$TiO_3$ etch rate is 480$\AA/min$ at 10 % $BCl_3$ adding to $Cl_2$/Ar. The characteristics of the plasmas were estimated using optical emission spectroscopy (OES). The change of Cl, B radical density measured by OES as a function of $BCl_3$ percentage in $Cl_2$/Ar. The highest Cl radical density was shown at the addition of 10% $BCl_3$ to $Cl_2$/Ar. To study on the surface reaction of (Ba,Sr)$TiO_3$ thin films was investigated by XPS analysis. Ion enhancement etching is necessary to break Ba-O bond and to remove $BaCl_2$. There is a little chemical reaction between Sr and Cl, but Sr is removed by physical sputtering. There is a chemical reaction between Ti and Cl, and Tic14 is removed with ease. The cross-sectional of (Ba,Sr)$TiO_3$ thin film was investigated by scanning electron microscopy (SEM), the etch slope is about $65\;{\sim}\;70$.

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Study of the Etched ZnO Thin Film Surface in the $BCl_{3}/Ar/Cl_{2}$ Plasma ($Cl_{2}/BCl_{3}$/Ar 플라즈마에 의해 식각된 ZnO 박막 표면의 연구)

  • U, Jong-Chang;Ha, Tae-Gyeong;Wi, Jae-Hyeong;Ju, Yeong-Hui;Eom, Du-Seung;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.264-265
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    • 2009
  • 본 연구에서 유도결합 플라즈마 식각 장치외 $BCl_3/Ar/Cl_2$ 가스 혼합비를 이용하여 ZnO 박막을 식각 하였을 때, 식각 된 ZnO 박막의 표면 반응에 관하여 관찰하였다. ZnO 박막의 식각 실험 조건은 RF 전력 700 W, 직류바이어스 전압 - 150 V, 공정 압력 15 mTorr로 고정하였고, $Cl_2/(Cl_2+BCl_3+Ar)$ 가스 혼합비를 변경하면서 식각 실험을 수행하였다. $Cl_2$ 가스가 3 sccm 일 때, ZnO 박막의 식각속도는 53 nm/min으로 가장 높았으며, 이때 ZnO 박막에 대한 $SiO_2$의 선택비는 0.89 이었다. 식각된 ZnO 박막의 표면은 XRD (X-ray diffraction)와 AFM(atomic force microscopy)를 이용하여 결정상의 변화와 표면의 거칠기를 분석하였다. AFM 분석 결과에서 Ar, $BCl_3$$Cl_2$ 플라즈마를 이용하여 식각된 시료의 표면 거칠기 근 값이 식각전의 시료나 $BCl_3/Ar/Cl_2$ 플라즈마로 식각된 시료보다 큰 것을 확인하였다. 이는 식각된 시료에서의 Zn 양의 감소나 비휘발성 식각 잔류물에 의한 영향으로 판단된다. SIMS(secondary ion mass spectrometery) 분석을 통해 검증 하였다.

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An Efficient Procedure for the Synthesis of Benzimidazoles Using H2O2/SiO2-FeCl3 System (H2O2/SiO2-FeCl3 계를 이용한 Benzimidazoles의 효율적인 합성)

  • Fazlinia, Abbas;Mosslemin, Mohammad Hossein;Sadoughi, Hesamaddin
    • Journal of the Korean Chemical Society
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    • v.54 no.5
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    • pp.579-581
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    • 2010
  • Solid silica supported ferric chloride ($SiO_2-FeCl_3$) catalyzed one-step synthesis of various benzimidazoles from o-phenylenediamine and aldehydes using $H_2O_2$ as the oxidant. The salient features of this method are simple and convenient procedure, easy purification and shorter reaction times.

Thermodynamical and Experimental Analyses of Chemical Vapor Deposition of ATO from SnCl4-SbCl5-H2O Gas Mixture ($SnCl_4-SbCl_5-H_2O$ 기체혼합물로부터 ATO(Antimony Tin Oxide) 박막의 화학증착에 관한 열역학 및 실험분석)

  • 김광호;강용관;이수원
    • Journal of the Korean Ceramic Society
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    • v.29 no.12
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    • pp.990-996
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    • 1992
  • Chemical vapor deposition of ATO from SnCl4-SbCl5-H2O gas mixture was investigated with thermodynamic and experimental analyses. Electrical conductivity of the ATO film was much improved under deposition conditions of low input-gas ratio, Psbcl5/Psbcl4. This increase of the conductivity was attributed to donor electrons produced mainly by the pentavalent Sb ions in SnO2 lattice. However high input-gas ratio conditions produced an ATO film consisting of a mixture of SnO2 and very fine Sb2O5 phase. It was found that the deterioration of electrical conductivity and optical transmission of the film was caused by the deposition of fine Sb2O5 phase in the SnO2 matrix.

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A Study on Improvement of the Physical Properties of 4 Component Working Fluid in Gas Fired Absorption Chillers (가스흡수식 냉방기용 4성분계 작동매체의 물성 향상 연구)

  • Baek, Young-Soon;Oh, Young-Sam;Lee, Yong-Won;Park, Dal-Ryung;Koo, Ki-Kap
    • Applied Chemistry for Engineering
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    • v.10 no.3
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    • pp.400-406
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    • 1999
  • In an effort to obtain high efficiency in gas fired absorption chillers, a new working fluid has been developed with thc addition of the component of $LiNO_3$, LiCl and LiI to the conventional solution of $LiBr-H_2O$. The solubility and vapor pressure of the 4 component working fluid developed in this work were measured and compared to the results of $LiBr-H_2O$ solution. It was observed that there exists an optimal mole ratio of the inorganic salts in terms of solubility. The mole ratio of LiBr, $LiNO_3$ and LiCl was found to be around 5:1:1~2 in the $LiBr-LiNO_3-LiCl-H_2O$ mixture, and in the case of $LiBr-LiO_3-Lil-H_2O$ and $LiBr-Lil-LiCl-H_2O$ mixtures, the mole ratio of LiBr, $LiNO_3$ and Lil/ LiBr, LiI and LiCl were found to be around 5:1:1 and 5:1:0.5~1 respectively. The vapor pressure of the 4 component working fluid of the optimal mole ratio was increascd with adding the component of $LiNO_3$, LiCl and LiI except for $LiBr-LiNO_3-LiCl-H_2O$ mixture. The absorption capacity of $LiBr-LiNO_3-LiCl-H_2O$ mixture was obtained higher than that of $LiBr-H_2O$ mixture.

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Atomic Layer Deposition (ALD) of ZrO2 in Ultrahigh Vacuum (UHV)

  • Roy, Probir Chandra;Jeong, Hyun Suck;Doh, Won Hui;Kim, Chang Min
    • Bulletin of the Korean Chemical Society
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    • v.34 no.4
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    • pp.1221-1224
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    • 2013
  • The atomic layer deposition (ALD) of $ZrO_2$ was conducted in ultrahigh vacuum (UHV) conditions. The surface was exposed to $ZrCl_4$ and $H_2O$ in sequence and the surface species produced after each step were identified in situ with X-ray photoelectron spectroscopy (XPS). $ZrCl_4$ is molecularly adsorbed at 140 K on the $SiO_2$/Si(111) surface covered with OH groups. When the surface is heated to 300 K, $ZrCl_4$ loses two Cl atoms to produce $ZrCl_2$ species. Remaining Cl atoms of $ZrCl_2$ species can be completely removed by exposing the surface to $H_2O$ at 300 K followed by heating to 600 K. The layer-by-layer deposition of $ZrO_2$ was successfully accomplished by repeated cycles of $ZrCl_4$ dosing and $H_2O$ treatment.

Aqueous Chlorine Dioxide Treatment Improves the Shelf Life of Panax ginseng C.A. Meyer

  • Chun, Ho-Hyun;Song, Kyung-Bin
    • Preventive Nutrition and Food Science
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    • v.12 no.4
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    • pp.284-288
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    • 2007
  • Effect of aqueous chlorine dioxide $(ClO_2)$ treatment on the quality change of fresh ginseng during storage was examined. Fresh ginseng samples were treated with 0, 50, and 100 ppm of $ClO_2$ solution, respectively, and stored at $4^{\circ}C$. Microbiological data of the fresh ginseng after $ClO_2$ treatment revealed that the populations of total aerobic bacteria, and yeast and mold were significantly reduced with the increase of $ClO_2$ concentration. In particular, the populations of total aerobic bacteria, and yeast and mold in the fresh ginseng decreased by 2.1 and 1.2 log CFU/g at 100 ppm $ClO_2$ treatment, respectively. Aqueous $ClO_2$ treatment improved the color of the fresh ginseng during storage, but there was no significant difference in weight loss during storage among treatments. Sensory evaluation results represented that the qualities of the fresh ginseng treated with aqueous $ClO_2$ during storage were better than those of the control. These results clearly indicate that aqueous $ClO_2$ treatment could be useful in decreasing the microbial growth and extending the shelf life of fresh ginseng.