• Journal of the Korean Society of Radiology
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• v.13 no.2
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• pp.261-270
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• 2019

The separation permeation characteristics of $N_2-O_2$ gas in air at cell membrane model of skin which irradiated by high energy electron(linac 6 MeV) were investigated. The cell membrane model of skin used in this experiment was a sulfonated polydimethyl siloxane(PDMS) non-porous membrane. The pressure range of $N_2$ and $O_2$ gas were appeared from $1kg_f/cm^2$ to $6kg_f/cm^2$. In this experiment(temperature $36.5^{\circ}C$), the permeation change of $N_2$ and $O_2$ gas in non-porous membrane by non-irradiation were found to be $1.19{\times}10^{-4}-2.43{\times}10^{-4}$, $1.72{\times}10^{-4}-2.6{\times}10^{-4}cm^3(STP)/cm^2{\cdot}sec{\cdot}cmHg$, respectively. That of $N_2$ and $O_2$ gas in non-porous membrane by irradiation were found to be $0.19{\times}10^{-4}-0.56{\times}10^{-4}$, $0.41{\times}10^{-4}-0.76{\times}10^{-4}cm^3(STP)/cm^2{\cdot}sec{\cdot}cmHg$, respectively. The irradiated membrane was significantly decreased about 4-10 times than membrane which was not irradiated. And ideal separation factor of $N_2$ and $O_2$ gas by non-irradiation was found to be from 1.32 to 0.42 and that of $N_2$ and $O_2$ gas by irradiation was found to be from 0.237 to 0.125. The irradiated membrane was significantly decreased about 4-5 times than membrane which was not irradiated. When the operation change(cut) and pressure ratio(Pr) by non-irradiation were about 0, One was increased to the oxygen enrichment and the other was decreased to the oxygen enrichment. The irradiated membrane was significantly decreased about 4-19 times than membrane which was not irradiated. As the pressure of $N_2$ and $O_2$ gas was increased, the selectivity was decreased. As separation permeation characteristics of $N_2-O_2$ gas in cell membrane model of skin were abnormal, cell damages were appeared at cell.

• Journal of Korea Soil Environment Society
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• v.3 no.3
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• pp.75-86
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• 1998

This paper is going to show the way we can sample the landfill gases flowing out to the air through final cover soil by using an closed chamber in the field for a short time. In addition, we came to the following results through the application of model with actual measurements. 1) Analyzing changes of concentration in the chamber(H: 10-30cm) every 5 minutes, considering analysis time of gas chromatograph for an half hour. 2) The proportion of $CE_4$to $CO_2$changes rapidly near the surface of final cover soil by the influence of methane oxidation reaction. 3) When flux of landfill gas is F=$10^{-5}$mol/$\textrm{m}^2$.s), methane oxidation reaction has an influence on composition of gases, however there is little influence when F=$10^{-6}$ mol/($\textrm{m}^2$.s).

• Textile Coloration and Finishing
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• v.5 no.4
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• pp.29-41
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• 1993

In order to surface Hydrophobilization of Poly(ethylene terephthalate) (PET) fiber samples were treated in the atmosphere of CF$_{4}$ or $C_{2}$F$_{6}$glow discharge. The sample used in this study was PET film which is 75$\mu$m thick made by Teijin, O-Type(Japan). The cleaned samples were placed in plasma reactor made of pyrex glass cylinder, and plasma processing was carried out by glow discharge of CF$_{4}$ or $C_{2}$F$_{6}$ gas, being continuously fed by gas flow and continuously pumped out by a vacuum system. Electric power source for generate plasma state was sustained alternating current(60Hz) and voltage was sustained 600 volt. The duration of plasma treatment varied from 15 to 120 seconds except special case, the monomer gase pressure varied from 0.02 to 0.3 Torr and power range was 10 to 90 watts. The hydrophobic features of changed PET surface were evaluated by contact angle measurement and surface chemical characteristics were analyzed by ESCA. Results can be summerized as follows. 1. The most favorable setting position of substrate was the center area between the two electrodes. 2. $C_{2}$F$_{6}$ discharge current was lower than that of CF$_{4}$ when same voltage was sustained. Treated efficiency between CF$_{4}$ and $C_{2}$F$_{6}$ did not revealed significant differences under same electric power(wattage). 3. When monomer pressure is very low below 0.02 torr, as though substrate is exposed to CF$_{4}$ or $C_{2}$F$_{6}$ plasma, it tend to be hydrophilic through a little of fluorine bond and a great deal of oxidizing reaction. 4. There brought good hydrophobilization when monomer pressure was more 0.1 torr and duration of glow discharge treatment was over 45 seconds. When monomer pressure was too high, discharge current became low. Although prolong the duration, there was no more high hydrophobilization. 5. According to ESCA analysis, there were a little CF bond and a prevailing CF$_{2}$ bond in CF$_{4}$-treated substrate. There were CF$_{3}$, a little CF and a prevailing CF$_{2}$ bond in $C_{2}$F$_{6}$-treated substrate.d substrate.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.6
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• pp.472-476
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• 1998

The surface reactions of silica film($SiO_2-P_2O_5-B_2O_3-GeO_2$) with fluorocarbon plasma has been studied by using angle -resolved x-ray photoelectron spectroscopy(XPS). It has been confirmed that residual carbon consists of C-C and C-CFx bonds and fluorine mainly binds silicon in the case of etched silica by using $CF_4$ gas plasma. The surface reaction of silica with various fluorocarbon gases, such as $CF_4,C_2F_6 and CHF_3$ were investigated. XPS results showed that though the etching gases were changed, the elements and binding states of the residual layers on the etched silica by using various fluorocarbon gas plasma were nearly the same . This seems to be due to the high volatility of byproducts, that is, $SiF_4 and CO_2$ etc..

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1236-1238
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• 1994

TiAlN thin films were prepared by a multi target r.f magnetron sputtering system under different conditions. We have investigated the resistivity and T.C.R. (Temperature Coefficient of Resistance) characteristics of TiAlN films deposited on $Al_2O_3$ and glass substrates by sputtering in an $Ar:N_2$ gas mixture. We used Al and Ti metal as Target Material and $Ar:N_2$ gas as working gas. We varied the partial pressure ratio of $N_2/Ar$ from 0.2/7 to 1.0/6.2 (SCCM). And the R.F power of Ti and Al Target also were varied as 160/240, 200/200 and 240/160(W). In this experiment, we can get the precision thin film resistor with a very low T.C.R. (Temperature Coefficient of Resistance) below 25 ppm ${\Omega}/^{\circ}C$.

• Journal of the Korean Vacuum Society
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• v.7 no.4
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• pp.403-409
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• 1998

In this study, the effects of multi-dipole type of magnets on the characteristics of the inductively coupled plasmas and $SiO_2$ etch properties were investigated. As the magnets, 4 pairs of permanent magnets were used and, to etch $SiO_2, C_2F_6, CHF_3, C_4F_8, H_2$, and their combinations were used. The characteristics of the magnetized inductively coupled plasmas were investigated using a Langmuir probe and an optical emission spectrometer, and $SiO_2$ etch rates and the etch selectivity over photoresist were measured using a stylus profilometer. The use of multi-dipole magnets increased the uniformity of the ion density over the substrate location even though no significant increase of ion density was observed with the magnets. The use of the magnets also increased the electron temperature and radical densities while reducing the plasma potential. When $SiO_2$ was etched using the fluorocarbon gases, the significant increase of $SiO_2$ etch rates and also the increase of etch uniformity over the substrate were obtained using the magnets. In case of gas combinations with hydrogen, $C_4F_8/H_2$ showed the highest etch rates and etch selectivities over photoresist among the gas combinations with hydrogen used in the experiment. By optimizing process parameters at 1000 Watts of inductive power with the magnets, the highest $SiO_2$ etch rate of 8000 $\AA$/min could be obtained for 50% $C_4F_8/50% H_2$.

• Journal of environmental and Sanitary engineering
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• v.4 no.2 s.7
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• pp.91-99
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• 1989

An anaerobic acidogenic fermentation experiment was carried out in order to investigate the distribution of volatile acid products and gas generations with varing temperatures and pH values. The experiment was carried out using $1\%$ glucose as substrate and a pair of 3.5 liter vessle as bench scale batch reactors. The reactors were operated for 7 days at 25, 30 and $35^{\circ}C$ and at pH values of 4.0, 4.5, 5.0, 5.5 and 6.0 at each temperature conditions. Major products at all experiment pH's at $35^{\circ}C$ were acetic acids and butyric acids which together composed around $90^{\circ}F$ of total product acids. At higher pH values at $35^{\circ}C$, propionic acid reached around $10\%$. At all experiment conditions, 52 to $55\%$ of generated gases comprised of hydrogen gas and 45 to $48\%$ of carbon dioxide. With temperature increase from 25 to $35^{\circ}C$, the production rate of acetic acid increased 2.9 fold, butyric acid 22 fold, hydrogen gas 2.0 fold and carbon dioxide gas 2.3 fold. Optimum reaction conditions for highest production of acetic acid and hydrogen gas was determined to be pH 5.5 at $35^{\circ}C$.

• Korean Journal of Optics and Photonics
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• v.6 no.3
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• pp.201-213
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• 1995

By the use of computer simulation including collisional mixing kinetic processes of the B- and C-state in the upper laser level the output characteristics of electron-beam pumped XeF$(C\rightarrowA$ excimer laser are analyzed. We compared the results between experiments and simulations for the $XeF^*(C)$ formation that correlated the number of densities of the $XeF^*(B)$. We obtained good agreement$(28.5 mJ\pm5%)$ with comparisons between experiment and simulation and confirmed the optimal gas mixing ratio of $Xe/F_2/Ar=5.26/0.49/94.28%$ at atmospheric pressure laser medium under the condition of 70 ns [FWHM] electron-beam (800 kV, 21 kA). Also through the simulation we have investigated that the $XeF^*(C)$ formation channel, the $XeF^*(C)$ relaxation channel, and the absorption channel of bluegreen wavelength region as a function of F2 halogen donor and Xe partial pressure. ssure.

• Proceedings of the Korean Biophysical Society Conference
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• 2003.06a
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• pp.73-73
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• 2003

We report here the results on N-acetyl-N'-methylamide of alanine (Ac-Ala-NHMe) calculated using the ab initio molecular orbital method with the self-consistent reaction field (SCRF) theory at the HF level with the 6-3l+G(d) basis set to investigate the conformational preference of alanine depending on the backbone torsion angles $\square$ and$\square$ in the gas phase, chloroform, and water. There are seven local minima (LM) in the gas phase and two additional LM are found in chloroform and water. These two additional LM A (an $\square$-helical structure) and F (a polyproline structure) are stabilized only in solutions. In the gas phase, the lowest LM is the conformation C with a C$\sub$7/ intramolecular hydrogen bond and the relative conformational energies range from 0.3 to 6.0 ㎉/mol. In chloroform, the lowest LM is the conformation E (an extended structure) and the relative conformational energies range from 0.7 to 4.9 ㎉/mol. In particular, we identified 14 possible transition states connecting between seven LM in the gas phase. The search for transition states probable in chloroform and water is now in progress.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.5
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• pp.265-269
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• 2000

$(Ba, Sr)TiO_3$thin films were etched with a magnetically enhanced inductively coupled plasma (MEICP) at different CF4/Ar gas mixing ratios. Experimental was done by varying the etching parameters such as rf power, dc bias and chamber pressure. The maximum etch rate of the BST films was $1800{AA}/min$ under $CF_4/(CF_4+Ar)$ of 0.1, 600 W/350 V and 5 mTorr. The selectivity of BST to Pt and PR was 0.6, 0.7, respectively. X-ray photoelectron spectroscopy (XPS) results show that surface reaction between Ba, Sr, Ti and C, F radicals occurs during the (Ba, Sr)TiO3 etching. To analyze the composition of surface residue after the etching, films etched with different CF_4/Ar$ gas mixing ratio were investigated using XPS and secondary ion mass spectroscopy (SIMS).