• Electrical & Electronic Materials
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• v.7 no.4
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• pp.281-288
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• 1994

According to spread volume of B(BiPbCuO) layer, composition ratio and each stage of sintering process, we studied stability of high Tc superconductor phase and generation and growth movement of superconducting phase. The dual layer composed of SrCaCuO and BiPbCuO compound were prepared to develop the Bi-2223 superconductor[108K] through interaction and diffusion during sintering process. The dual layer samples were sintered at 830.deg. C for 0-210 hours. From the result, the optimum conditions were : spread volume(A:B=1:0.6), sintering time(210h) and composition ratio(A:S $r_{2}$C $a_{2}$C $u_{2}$- $O_{x}$, B:B $i_{1.9}$P $b_{0.5}$C $u_{3}$ $O_{y}$) at 830.deg. C.. C.C.C.

• Journal of Magnetics
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• v.16 no.2
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• pp.97-100
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• 2011

Bilayers of soft NiFe (150 nm-420 nm) on hard Ni (150 nm) were prepared by electrodeposition. The process of magnetization reversal in the NiFe/Ni bilayers was then investigated. The hysteresis loop generated by a magnetization reversal of soft NiFe under a positive saturation state of a hard Ni layer shows a shift along the negative field axis, which is clear evidence for the exchange spring effect in the NiFe/Ni bilayers. The dependence of the coercive field $H_c$ and exchange bias field Hex on the thickness of the NiFe layer was also investigated. As the NiFe thickness increases from 150 nm to 420 nm, both $H_c$ and $H_{ex}$ decrease rapidly from $H_c$= 51.7 Oe and $H_{ex}$ = 12.2 Oe, and saturate to $H_c$ = 5.8 Oe and $H_{ex}$ = 3.5 Oe.

• Korean Journal of Crystallography
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• v.8 no.2
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• pp.105-110
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• 1997

1μm-CdS films for a window layer of CdS/CuInSe2 solar cell have been prepared by vacuum of 1x10-3 mTorr. Source and substrate temperature ranges were used 800-1100'C and 50-200℃ respectively. Structural, electircal and optical properties of CdS films have been investigated by X-ray diffractometer (XRD), scanning electron microscopy (SSEM), electrical resistivity, the Hall measurement and optical transmission spectra. Electrical resistivity and optical transmission of the CdS films decreased with the increase in CdS source temperature without substrate heating. All the films had hexagonal structure and strong texture with (002) orientation of grain normal to the substrate glass. CdS films evaporated at 1000℃ were the highest electrical conductivity of 0.9(S/cm). Electrical resistivity and optical transmission at the substrate temperature of 100℃ were 40(Ω,cm) and 80% respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.354-357
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• 2002

Thermally grown gate oxide on 4H-SiC wafer was investigated. The oxide layers were grown at l150$^{\circ}C$ varying the carrier gas and post activation annealing conditions. Capacitance-Voltage(C-V) characteristic curves were obtained and compared using various gate electrode such as Al, Ni and poly-Si. The interface trap density can be reduced by using post oxidation annealing process in Ar atmosphere. All of the samples which were not performed a post oxidation annealing process show negative oxide effective charge. The negative oxide effective charges may come from oxygen radical. After the post oxidation annealing, the oxygen radicals fixed and the effective oxide charge become positive. The effective oxide charge is negative even in the annealed sample when we use poly silicon gate. Poly silicon layer was dope by POCl$_3$ process. The oxide layer may be affected by P ions in poly silicon layer due to the high temperature of the POCl$_3$ doping process.

• 한국초전도학회:학술대회논문집
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• v.10
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• pp.179-183
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• 2000

For a ground plane in high-temperature superconducting ramp-edge junction devices, YBa$_2$Cu$_3$O$_{7-{\delta}}$/SrTiO$_3$/YBa$_2$Cu$_3$O$_{7-{\delta}}$ multilayer structures were fabricated using pulsed laser deposition and ECR ion milling. Various process parameters were adjusted to enhance the device characteristics. By etching the STO layer to form a tapered edge of about 15$^{\circ}$ and in-situ RF plasma treatment of bottom YBCO surface prior to deposition of top YBCO, the top-to-bottom YBCO showed T$_c$ of 75${\sim}$80 K and I$_c$ of about 40 mA through holes. It was found that the deposition of bottom YBCO at a reduced laser repetition rate of 1Hz increased the T$_c$ of top YBCO to 79.9 K. The resistivity of 570 layer was about 10$^6$ ${\Omega}$cm at 60 K, which ensures good electrical isolation between successive YBCO layers.

• Journal of the Korean Society for Heat Treatment
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• v.1 no.1
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• pp.8-12
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• 1988

This study has been carried out to evaluate gaseous nitrocarburizing treatment undertaken for pure iron at $570^{\circ}C$ in an atmosphere containing 50% endothermic gas, generated from natural gas, and 50% ammonia. The results obtained from the experiment are as follows ; 1) The microstructure of gaseous nitrocarburized pure iron consists of the compound layer on the surface and the diffusion zone beneath it. The compound layer progresses uniformly into ferrite with a thickness of $20{\mu}$ obtained after treating for 3 hours. 2) Chemical analysis has shown that the compound layer has a C/N ratio of 0.19 and that the average combined interstitial content of the compound layer is about 30 atomic percent, which is close to the lower limit of the ${\varepsilon}$-carbonitride phase field in Fe-C-N phase diagram. 3) X-ray diffraction analysis has revealed that the compound layer consists mainly of the c.p.h. phase, ${\varepsilon}-Fe_3$(C.N) and a small amount of $Fe_4N$ and traces of ferrite are also present in the compound layer. 4) The microhardness of the compound layer is about 600 V.H.N and shows a relatively sharp fall-off at the compound layer/diffusion zome interface. 5) The average actual degree of ammonia dissociation is calculated to be 27% for a gaseous nitrocarburizing treatment carried out at $570^{\circ}C$.

• Progress in Superconductivity and Cryogenics
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• v.10 no.3
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• pp.5-8
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• 2008

On highly-textured IBAD-MgO templates, we have tried to find proper buffer layers among various candidate materials, including $LaMnO_3$ (LMO), $La_2Zr_2O_7$ (LAO), $LaAlO_3$ (LAO), $LaGaO_3$ (LGO), $NdGaO_3$ (NGO), and $BaZrO_3$ (BZO). All buffer layers were deposited on the IBAD-MgO templates by KrF pulsed laser deposition(PLD). LAO layer showed an armorphous phase. LZO, LGO, and NGO layers showed polycrystalline growth. Only LMO and BZO layers exhibited c-axis oriented biaxially textured films. Optimally processed LMO buffer layer at deposition temperature of $750^{\circ}C$ and $PO_2$ of 100mTorr exhibited ${\triangle}{\phi}$ value of ${\sim}-5.2^{\circ}$ and RMS roughness of 5.6nm. Interestingly, BZO buffer layers with ${\triangle}{\phi}$ values of ${\sim}-6^{\circ}$ could be routinely produced over a wide PLD processing condition.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.05a
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• pp.9-9
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• 2009

Coated conductor is required to have good critical current property for high efficiency of electric power applications. Until now, long coated conductor does not show high Jc over 3 MA/$cm^2$ in thick superconducting layer because of texture degradation by thick superconducting layer. In this study, in order to overcome this issue, thicker superconducting layer was deposited with optimized conditions to reduce the degradation of critical current density. SmBCO superconducting coated conductor was deposited with 1~3 um of thickness at $750\sim850^{\circ}C$ under 15~20 mTorr of oxygen partial pressure using batch type EDDC( evaporation using drum in dual chamber). The buffered substrate for superconducting layer deposition was used IBAD-MgO template with the architecture of $LaMnO_3/MgO/Y_2O_3/Al_2O_3$/Hastelloy. After fabrication of coated conductor, critical current was measured by 4-prove method under self-magnetic field and 77K. In addition, surface morphology and texture were analyzed by SEM and XRD, respectively. 3 um thick SmBCO coated conductor shows highest $I_C$ values of 638A/cm-w in 1 m long in the world.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.149-149
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• 2000

Alkali and alkali-earth metal on si(001) surface has been investigated widly for both scientific and technological aspects. In particular, the Ba/Si(001) system has been studied by several groups and they reported many phases such as (2$\times$3), (2$\times$4) and c(6$\times$2) 표 LEED and AES for various temperature and coverages. But there has not been the result of the atomic structure for these phases. Recently some works about the atomic structure of Ba/Si(001) at only room temperature were presented. In this study, we investigated 3-dimensional atomic structure and growth mode of Ba layer on si(001) by coaxial impact collision ion scattering spectroscopy (CAISS) at room temperature and high temperature.

• Proceedings of the KIEE Conference
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• 1987.11a
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• pp.200-202
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• 1987

Sintered CdS films on glass substrate with low electrical resistivity and high optical transmittance have been prepared by coating and sintering method. All-polycrystalline CdS/CdTe solar cells with different microstructure and properties of CdTe layer were fabricated by coating a number of CdTe slurries, which consisted of Cd and Te powders, an appropriate amount of propylene glycol and 2 or 7.5 w/o $CdC1_2$, on the sintered CdS films and by sintering the glass-CdS-(Cd+Te) composites at various temperature. To explore the dependence of the solar efficiency on the preparation conditions of the CdTe layer, Cd powder with an average particle size of $0.3{\mu}m$ or $5{\mu}m$ was prepared. The use of Cd with finer particles forms more dense or uniform microstructure of the nuclear of CdTe during the heating. Therefore the use of Cd with finer particles improves the efficiency of the sintered CdS/CdTe solar cell by improving the microstructure of sintered CdTe layer. But the difference of solar efficiency by varing a particle size of Cd is decreased with increasing amount of $CdC1_2$ in the (Cd+Te) layer. All-polycrystalline CdS/CdTe solar cells with an efficiency of 10.2% under solar irradiation have been fabricated using a Cd with finer particles.