• 한국수소및신에너지학회논문집
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• 제35권2호
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• pp.115-120
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• 2024

In this study, the extent of water removal in the high-moisture coal was measured. The simplified adsorption model was developed to predict the extent of water removal. The water removal was observed to increase up to 25% at saturation condition of 25℃. The modeling work shows that adsorption contributes the water removal only by 3%, whereas other factors such as CO₂ solubility and wettability would be responsible for the water removal.

• 반도체디스플레이기술학회지
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• 제16권2호
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• pp.55-60
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• 2017

The supercritical $CO_2$ (sc-$CO_2$) mixture and the sc-$CO_2$-based Photoresist(PR) stripping(SCPS) process were applied to the removal of the post etch/ash PR residue on aluminum patterned wafers and the results were observed by scanning of electron microscope(SEM). In the case of MDII wafers, the carbonized PR was able to be effectively removed without pre-stripping by oxygen plasma ashing by using sc-$CO_2$ mixture containing the optimum formulated additives at the proper pressure and temperature, and the same result was also able to be obtained in the case of HDII wafer. It was found that the efficiency of SCPS of ion implanted wafer improved as the temperature of SCPS was high, so a very large amount of MEA in the sc-$CO_2$ mixture could be reduced if the temperature could be increased at condition that a process permits, and the ion implanted photoresist(IIP) on the wafer was able to be removed completely without pre-treatment of plasma ashing by using the only 1 step SCPS process. By using SCPS process, PR polymers formed on sidewalls of metal conductive layers such as aluminum films, titanium and titanium nitride films by dry etching and ashing processes were removed effectively with the minimization of the corrosion of the metal conductive layers.

• 한국환경보건학회지
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• 제26권4호
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• pp.29-37
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• 2000

Fenton’s oxidation process is one of the most commonly applied processes to the wastewater which cannot be treated by conventional biological treatment processes. However, it is necessary to minimize the cost of Fenton’s oxidation treatment by modifying the treatment processes or other means of chemical treatment. So, as a method for the chemical oxidation of biorefractory or nonbiodegradable organic pollutants, the Photo-Fenton-Reaction which utilizes iron(11)salt. $H_2O$$_2$ and UV-light simultaneously has been proprosed. Therfore, the purpose of this study is to test a removal efficiency of dye-wastewater and treatment cost with Fenton’s and Photo-Fenton’s oxidation process. The Fe(11)/$H_2O$$_2$ reagent is referred to as the fenton’s reagent. which produces hydroxy radicals by the interaction of Fe(11) with $H_2O$$_2$. In this exoeriment, the main results are as followed; 1. The Fenton oxidation was most efficient in the pH range of 3-5. The optimal condition for initial reaction pH was 3.5 for the high CO $D_{Cr}$ & TOC-removal efficiency. 2. The removal efficiency of TOC and CO $D_{Cr}$ increased up to the molar ration between ferrate and hydrogen peroxide 0.2:1, but above that ratio removal efficiency hardly increased. 3. The highest removal efficiency of TOC and CO $D_{Cr}$ were showed when the mole ration of ferrate to hydrogen peroxide was 0.2:3.4. 4. Without pretreatment process, photo-fenton oxidation which was not absorbed UV light was not different to fenton oxidation. 5. And Fenton oxidtion with pretreatment process was similar to Fenton oxidation in the absence of coagulation, the proper dosage of F $e^{2+}$: $H_2O$$_2$ was 0.2:1 for the optimal removal efficiency of TOC or CO $D_{Cr}$ .6. Also, TOC & CO $D_{Cr}$ removal efficiency in the photo-fenton oxidation with pretreatment was increased when UV light intensity enhanced.7. Optimum light intensity in the range from 0 to 1200 W/$m^2$ showed that UV-intensity with 1200W/$m^2$ was the optimum condition, when F $e_{2+}$:$H_2O$$_2$ ratio for the highest decomposition was 0.2:2.5.EX>$_2$ ratio for the highest decomposition was 0.2:2.5.

• 한국분말재료학회지
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• 제8권2호
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• pp.91-97
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• 2001

The conventional debinding process in metal injection molding is very long time-consuming and unfriendly environmental method. Especially, in such a case of injection molded parts from hard and fine metal powder, such as WC-Co, an extremely long period of time is necessary in the conventional slow binder removal process. On the other hand, supercritical debinding is thought to be the effective method which is appropriate to eliminate the aforementioned inconvenience in the prior art. The supercritical fluid has high diffusivity and density, it can penetrate quickly into the inside of the green metal bodies, and extract the binder. In this paper, super-critical debinding is compared with wicking debinding process. Wax-based binder system is used in this study. The binder removal rate in supercritical $CO_2$ have been measured at $65^{\circ}C$, 75$^{\circ}C$ in the pressure range from 20 MPa to 28 MPa. Pores and cracks in silver bodies after sintering were observed using SEM When the super-critical $CO_2$ debinding was carried out at 75$^{\circ}C$, almost all the wax (about 70 wt% of binder) was removed in 2 hours under 28 MPa and 2.5 hours under 25 MPa.

• 한국환경보건학회지
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• 제28권1호
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• pp.51-65
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• 2002

This study was carried out to apply some basic physical and chemical treatment options including Fenton's oxidation, and to evaluate the performances and the characteristics of organic and nitrogen removal using lab-scale biological treatment system such as complete-mixing activated sludge and sequencing batch reactor(SBR) processes for the treatment of leachate from a municipal waste landfill in Gyeongnam province. The results were as follows: Chemical coagulation experiments using aluminium sulfate, ferrous sulfate and ferric chloride resulted in leachate CO $D_{Cr}$ removal of 32%, 23% and 21 % with optimum reaction dose ranges of 10,000～15,000 mg/$\ell$, 1,000 mg/$\ell$ and 500～2,000 mg/$\ell$, respectively. Fenton's oxidation required the optimum conditions including pH 3.5, 6 hours of reaction time, and hydrogen peroxide and ferrous sulfate concentrations of 2,000 ～ 3,000 mg/$\ell$ each with 1:1 weight ratio to remove more than 50% of COD in the leachate containing CO $D_{Cr}$ between 2,000 ～ 3,000 mg/$\ell$. Air-stripping achieved to remove more than 97% of N $H_3$-N in the leachate in spite of requiring high cost of chemicals and extensive stripping time, and, however, zeolite treatment removing 94% of N $H_3$-N showed high selectivity to N $H^{+}$ ion and much faster removal rate than air-stripping. The result from lab-scale experiment using a complete-mixing activated sludge process showed that biological treatability tended to increase more or less as HRT increased or F/M ratio decreased, and, however, COD removal efficiency was very poor by showing only 36% at HRT of 29 days. While COD removal was achieved more during Fenton's oxidation as compared to alum treatment for the landfill leachate, the ratio of BOD/COD after Fenton's oxidation considerably increased, and the consecutive activated sludge process significantly reduced organic strength to remove 50% of CO $D_{Cr}$ and 95% of BO $D_{5}$ . The SBR process was generally more capable of removing organics and nitrogen in the leachate than complete-mixing activated sludge process to achieve 74% removal of influent CO $D_{Cr}$ , 98% of BO $D_{5}$ and especially 99% of N $H_3$-N. However, organic removal rates of the SBR processes pre-treated with air-stripping and with zeolite were not much different with those without pre-treatment, and the SBR process treated with powdered activated carbon showed a little higher rate of CO $D_{Cr}$ removal than the process without any treatment. In conclusion, the biological treatment process using SBR proved to be the most applicable for the treatment of organic contents and nitrogen simultaneously and effectively in the landfill leachate.e.

• 한국정밀공학회지
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• 제25권9호
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• pp.109-115
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• 2008

The cleaning process of contaminant particles adhering to the microchips, integrated circuits (ICs) or the like is essential in modern microelectronics industry. In the cleaning process particularly working with the application of inert gases, the removal of contaminant particles of submicron scale is very difficult because the particles are prone to reside inside the boundary layer of the working fluid, The use of cryogenic $CO_2$ cleaning method is increasing rapidly as an alternative to solve this problem. In contrast to the merits of high efficiency of this process in the removal of minute particles compared to the others, even fundamental parametric studies for the optimal process design in this cleaning process are hardly done up to date, In this study, we attempted to measure the cleaning efficiency with the variations of some principal parameters such as mass flow rate, injection distance and angle, and tried to draw out optimal cleaning conditions by measuring and evaluating an effective cleaning width called $d_{50}$.

• 한국산학기술학회논문지
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• 제15권7호
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• pp.4698-4706
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• 2014

본 연구에서는 디메틸에테르(dimethyl ether) 생산 공정에 포함된 이산화탄소 제거공정에서 이산화탄소 제거 방법으로 복합막(composite membrane)을 사용하는 공정에 대해 공정구성과 모사를 수행하였다. 복합막은 (주)에어레인에서 제조한 PEI-PDMS(polyetherimide-polydimethyl siloxane) 복합막을 대상으로 하였으며 복합막 공정을 모델링하기 위해서 상용성 화학공정 모사기인 Invensys 사의 PRO/II with PROVISION 9.2를 사용하였다. 그리고 복합막 공정을 모사하기 위해 필요한 각 순수성분들의 투과도 상수는 (주)에어레인에서 수행한 실험 데이터를 회귀분석 하여 새롭게 결정 하였다. 결국 실험을 통해 얻은 투과도 상수와 상용성 화학공정 모사기를 활용하여 이산화탄소를 제거하기 위한 복합막 공정을 구성하고 제거에 필요한 분리막 면적과 Utility 비용을 도출하였다.

• KEPCO Journal on Electric Power and Energy
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• 제4권1호
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• pp.33-38
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• 2018

This study applied upgrades to the processes of a 10 MW wet amine $CO_2$ capture pilot plant and conducted performance evaluation. The 10 MW $CO_2$ Capture Pilot Plant is a facility that applies 1/50 of the combustion flue gas produced from a 500 MW coal-fired power plant, and is capable of capturing up to 200 tons of $CO_2$. This study aimed to quantitatively measure efficiency improvements of post-combustion $CO_2$ capture facilities resulting from process upgrades to propose reliable data for the first time in Korea. The key components of the process upgrades involve absorber intercooling, lean/rich amine exchanger efficiency improvements, reboiler steam TVR (Thermal Vapor Recompression), and lean amine MVR (Mechanical Vapor Recompression). The components were sequentially applied to test the energy reduction effect of each component. In addition, the performance evaluation was conducted with the absorber $CO_2$ removal efficiency maintained at the performance evaluation standard value proposed by the IEA-GHG ($CO_2$ removal rate: 90%). The absorbent used in the study was the highly efficient KoSol-5 that was developed by KEPCO (Korea Electric Power Corporation). From the performance evaluation results, it was found that the steam consumption (regeneration energy) for the regeneration of the absorbent decreased by $0.38GJ/tonCO_2$ after applying the process upgrades: from $2.93GJ/ton\;CO_2$ to $2.55GJ/tonCO_2$. This study confirmed the excellent performance of the post-combustion wet $CO_2$ capture process developed by KEPCO Research Institute (KEPRI) within KEPCO, and the process upgrades validated in this study are expected to substantially reduce $CO_2$ capture costs when applied in demonstration $CO_2$ capture plants.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2008년도 추계학술대회 논문집
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• pp.242-245
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• 2008

In the power generation industry, various efforts are needed to cope with tightening regulation on carbon dioxide emission. Integrated gasification combined cycle (IGCC) is a relatively environment friendly power generation method using coal. Moreover, pre-combustion $CO_2$ removal is possible in the IGCC system. Therefore, much effort is being made to develop advanced IGCC systems. However, removal of $CO_2$ may affect the system performance and operation through reduction of fuel gas supplied to the gas turbine. This study predicts system performance change due to $CO_2$ capture by pre-combustion process from the normal IGCC performance without $CO_2$ capture and presents results of design parametric analysis.

• 반도체디스플레이기술학회지
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• 제11권3호
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• pp.7-11
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• 2012

Among various wet cleaning methods, megasonic and jet spray gained their popularity in single wafer cleaning process for the efficient removal of particulate contaminants from the wafer surface. In the present study, we evaluated these two cleaning methods for particle removal efficiency (PRE) and pattern damage on the aluminum layered wafer surface. Also the effect of $CO_2$ dissolved water in jet spray cleaning is assessed by measuring PRE. It is observed that the jet spray cleaning process is more effective in terms of PRE and pattern damage compared to megasonic cleaning and the mixing of $CO_2$ in the water during jet sprays further increases the PRE. We believe that the outcome of the present study is useful for the semiconductor cleaning process engineers and researchers.