• Korean Chemical Engineering Research
• /
• v.49 no.4
• /
• pp.498-504
• /
• 2011

In this research, hollow fiber membranes were used in order to investigate to permeation and selectivity of the $CH_4$ and $N_2$. Polyimide and polyethersulfone hollow fiber membrane were prepared by the dry-wet phase inversion method and the module was manufactured by fabricating fibers after surface coating with silicone elastomer. The scanning electron microscopy (SEM) studies showed that the produced fibers typically had an asymmetric structure. The permeance of $CH_4$ and $N_2$ were increased with pressure and temperature. However, the selectivity was decreased with increasing temperature. The permeances of $CH_4$ and $N_2$ were decreased with increasing the air gap and the effect of post-treatment on membrane showed the increase in permeance up to 3.2~7.0 times.

• Journal of Industrial and Engineering Chemistry
• /
• v.67
• /
• pp.156-163
• /
• 2018

High-performance mixed-matrix membranes that comprise both zeolitic imidazolate framework-8 (ZIF-8) and graphene oxide (GO) were synthesized with a solution casting technique to realize excellent $CO_2/CH_4$ separation. The incorporation of ZIF-8 nanocrystals alone in ODPA-TMPDA polyimide can be used to significantly enhance $CO_2$ permeability compared with that of pure ODPA-TMPDA. Meanwhile, the addition of a GO nanostack alone in ODPA-TMPDA contributes to improved $CO_2/CH_4$ selectivity. Hence, a composite membrane that contains both fillers displays significant enhancements in $CO_2$ permeability (up to 60%) and $CO_2/CH_4$ selectivity (up to 28%) compared with those of pure polymeric membrane. Furthermore, in contrast to the ZIF-8 mixed-matrix membrane, which showed decreased mechanical stability, it was found that the incorporation of GO could improve the mechanical strength of mixed-matrix membranes. Overall, the synergistic effects of the use of both fillers together are successfully demonstrated in this paper. Such significant improvements in the mixed-matrix membrane's $CO_2/CH_4$ separation performance and mechanical strength suggest a feasible and effective approach for potential biogas upgrading and natural gas purification.

• Membrane Journal
• /
• v.24 no.3
• /
• pp.185-193
• /
• 2014

PDMS (polydimethylsiloxane)-HNT (halloysite nanotube) composite membranes were prepared with different amounts tendency of HNT 5, 10, 20 and 30 wt% and rubbery polymer PDMS. The characteristics of these membranes were studied by FT-IR, XRD, TGA, and SEM. Gas permeation experiment were performed under condition of $25^{\circ}C$ and $3kg/cm^2$. Gas permeability of $N_2$, $H_2$, $CH_4$, and $CO_2$ and selectivity were investigated by increasing the amount of HNT contents in the PDMS. In $H_2$, $N_2$, $CH_4$, and $CO_2$ gases, as increasing HNT contents from 0 to 30 wt%, decreasing value of the permeability were observed. The selectivity of ($CO_2/N_2$) was shown in the range of 14 to 44 and the range of selectivity of ($CO_2/CH_4$) was 3.0 to 7.0.

• Bulletin of the Korean Chemical Society
• /
• v.27 no.2
• /
• pp.315-318
• /
• 2006

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.08a
• /
• pp.132-132
• /
• 2010

In the nano-scale Si processing, patterning processes based on multilevel resist structures becoming more critical due to continuously decreasing resist thickness and feature size. In particular, highly selective etching of the first dielectric layer with resist patterns are great importance. In this work, process window for the infinitely high etch selectivity of silicon oxynitride (SiON) layers and silicon nitride (Si3N4) with EUV resist was investigated during etching of SiON/EUV resist and Si3N4/EUV resist in a CH2F2/N2/Ar dual-frequency superimposed capacitive coupled plasma (DFS-CCP) by varying the process parameters, such as the CH2F2 and N2 flow ratio and low-frequency source power (PLF). It was found that the CH2F2/N2 flow ratio was found to play a critical role in determining the process window for ultra high etch selectivity, due to the differences in change of the degree of polymerization on SiON, Si3N4, and EUV resist. Control of N2 flow ratio gave the possibility of obtaining the ultra high etch selectivity by keeping the steady-state hydrofluorocarbon layer thickness thin on the SiON and Si3N4 surface due to effective formation of HCN etch by-products and, in turn, in continuous SiON and Si3N4 etching, while the hydrofluorocarbon layer is deposited on the EUV resist surface.

• Analytical Science and Technology
• /
• v.16 no.4
• /
• pp.333-338
• /
• 2003

Inclusion selectivity of a three-dimensional piperazine-ligated cyanocadmate host complex, $[Cd_x(CN)_{2x}\{HN(CH_2CH_2)_2NH\}_y]{\cdot}zG$, has been investigated for benzene (B), toluene (T), ethylbenzene (E), o- (O), m- (M), and p-xylene (P) isomers as the aromatic guest molecules. From the binary, ternary and quarternary guest mixtures of E and xylene isomer (X), the order of inclusion selectivity in the host complex is O>E>P>M. From the binary to quinary BTX mixtures, the order of preference in the complex is seen to be B>T>O${\gg}$P>M.

• Journal of Korean Society of Environmental Engineers
• /
• v.27 no.6
• /
• pp.614-619
• /
• 2005

The activated carbon fibers of different surface area and pore structures were modified by carbon deposition from the pyrolysis of benzene, in an attempt to obtain carbon molecular sieves of high adsorption capacity and selectivity for the separation of $CO_2/CH_4$ gas mixtures. The ACFs molecular sieves prepared from different temperature and time were tested by the static adsorption of $CO_2$ and $CH_4$ gas, and their pore structures were characterized by the $N_2$ adsorption isotherms. We are able to prepare ACF molecular sieve with good selectivity for $CO_2/CH_4$ separation and showing acceptable adsorption capacities from the change of porosity by carbon deposition of pyrolyzed benzene.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.210-210
• /
• 2011

The effects of CH2F2 and N2 gas flow rates on the etch selectivity of silicon nitride (Si3N4) layers to extreme ultra-violet (EUV) resist and the variation of the line edge roughness (LER) of the EUV resist and Si3N4 pattern were investigated during etching of a Si3N4/EUV resist structure in dual-frequency superimposed CH2F2/N2/Ar capacitive coupled plasmas (DFS-CCP). The flow rates of CH2F2 and N2 gases played a critical role in determining the process window for ultra-high etch selectivity of Si3N4/EUV resist due to disproportionate changes in the degree of polymerization on the Si3N4 and EUV resist surfaces. Increasing the CH2F2 flow rate resulted in a smaller steady state CHxFy thickness on the Si3N4 and, in turn, enhanced the Si3N4 etch rate due to enhanced SiF4 formation, while a CHxFy layer was deposited on the EUV resist surface protecting the resist under certain N2 flow conditions. The LER values of the etched resist tended to increase at higher CH2F2 flow rates compared to the lower CH2F2 flow rates that resulted from the increased degree of polymerization.

• Carbon letters
• /
• v.8 no.1
• /
• pp.12-16
• /
• 2007

Molecular sieving carbon (MSC) for separating $O_2-N_2$ and $CO_2-CH_4$ has been prepared through chemical vapor deposition (CVD) of methane and benzene on activated carbon spheres (ACS) derived from polystyrene sulfonate beads. The validity of the material for assessment of molecular sieving behavior for $O_2-N_2$ and $CO_2-CH_4$ pair of gases was assessed by the kinetic adsorption of the corresponding gases at $25^{\circ}C$. It was observed that methane cracking on ACS lead to deposition of carbon mostly in whole length of pores rather than in pore entrance, resulting in a reduction in adsorption capacity. MSC showing good selectivity for $CO_2-CH_4$ and $O_2-N_2$ separation was obtained through benzene cracking on ACS with benzene entrantment of $0.40{\times}10^{-4}\;g/ml$ at cracking temperature of $725^{\circ}C$ for a period of 90 minutes resulting in a selectivity of 3.31:1.00 for $O_2-N_2$ and 8.00:1.00 for $CO_2-CH_4$ pair of gases respectively.

• Membrane Journal
• /
• v.16 no.2
• /
• pp.123-132
• /
• 2006

The PTMSP-silica-PEI composite membranes were synthesized from tetraethoxysilane (TEOS) and poly (1-trimethylsilyl-1-propyne) (PTMSP) by sol-gel process. The PTMSP-silica nanocomposite membranes were characterized by $^1H-NMR$, FT-IR, TGA, XPS, SEM, GPC and gas permeation measurements were accomplished with $H_2,\;O_2,\;N_2,\;CO_2,\;CH_4$. The gases permeability increased with increasing TEOS content. Both the permeability and selectivity of $H_2,\;CH_4$ increased to 15 wt% TEOS. While the permeability of $O_2,\;CO_2$ increased without decrease of selectivity.