• 제목/요약/키워드: $CH_4$/Ar

검색결과 166건 처리시간 0.029초

코로나 방전 시스템을 이용한 연소가스중의 NOx, $SO_2$제거 (Removal of NOx and $SO_2$ from Combustion Flue Gases by Corona Discharge Systems)

  • 박재윤
    • E2M - 전기 전자와 첨단 소재
    • /
    • 제10권8호
    • /
    • pp.830-835
    • /
    • 1997
  • In this study an experimental investigation has been conducted to remove NOx and SO$_2$simultaneously from a combustion flue gases were consisted of NO-SO$_2$-$CO_2$-$N_2$-O$_2$([NO]o:200ppm and [SO$_2$]o:800ppm) and the injection gases used as radical source gases were NH$_3$-Ar-air and CH$_4$-Ar-air. NOx and SO$_2$removal efficiency and the other by-products were measured by Fourier Transform Infrared(FTIR) as well as SO$_2$, NOx and NO$_2$gas detectors. and SEM images after sampling. The results showed that a significant Nucleating Particle Counter(CNPC) and SEM images after sampling. The results showed that a significant aerosol particle formation was observed during a simultaneous NOx and SO$_2$removal operation in corona radical shower systems. The diameter of aerosol particles was in the range of 0.18 to 3.6${\mu}{\textrm}{m}$ with a maximum fraction of particles at particles diameter of 1${\mu}{\textrm}{m}$. The NOx removal efficiency significantly increased with increasing applied voltage and NH$_3$molecule ratio. The SO$_2$removal efficiency was not significantly effected by applied voltage and slightly increased with increasing NH$_3$molecule ratio. It could be found that it is possible to use CH$_4$for NOx and SO$_2$removal by corona radical shower systems.

  • PDF

실리콘 기판 위 티타늄/나노결정다이아몬드 복합박막 성장 연구

  • 김인섭;나봉권;강찬형
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
    • /
    • pp.510-510
    • /
    • 2011
  • Si (100) 2 인치 웨이퍼 위에 RF Magnetron Sputtering 방법으로 Ti 박막을 형성하고, 그 위에 MPCVD (Microwave Plasma Chemical Vapor Deposition) 방법을 이용하여 나노결정다이아몬드 박막을 증착하였다. 지름 3인치, 두께 1/4인치의 Ti 타겟을 사용하고, Ar 가스 유량 11 sccm, 공정 압력 $4.5{\times}10^{-3}$ Torr, RF 전력 100 W, 기판온도 $70^{\circ}C$ 조건에서 2 시간 동안 Ti 박막을 증착하여 약 $0.8{\mu}m$의 박막을 얻었다. 그 위에 공정 압력 110 Torr, 마이크로웨이브 전력 1.2 kW, Ar/$CH_4$ 가스 조성비 200/2 sccm, 기판 온도 $600^{\circ}C$의 조건에서 기판에 -150 V의 DC 바이어스 전압 인가 여부를 변수로 하고, 증착 시간을 변화시켜 나노결정다이아몬드 박막을 제작하였다. FE-SEM과 AFM을 이용하여 다이아몬드 입자의 크기와 다이아몬드 박막의 두께, 표면 거칠기 등을 측정하였고, Raman spectroscopy와 XRD를 이용하여 다이아몬드 결정성을 확인하였다. 바이어스를 인가하지 않았을 경우 증착 시간이 증가할수록 다이아몬드 입자의 평균 크기가 증가하며 입자들이 차지하는 면적이 증가하는 것을 확인하였다. 그러나 2시간이 경과해도 아직 완전한 박막은 형성되지 못하고 약 4시간 이상 증착 시 완전한 박막을 이루는 것이 확인되었다. 이에 비해서 바이어스 전압을 인가할 경우 1시간 내에 완전한 박막을 이루는 것을 확인하였다. 표면 거칠기는 바이어스를 인가한 경우가 그렇지 않은 경우에 비해서 조금 높은 것으로 나타났다. 이러한 바이어스 효과는 표면에서의 핵생성 밀도 증가와 재핵생성 속도 증가에 기인하는 것으로 해석된다.

  • PDF

화학처리에 의한 천연 Zeolite의 Gas 분리 (Gas Separations of Natural Zeolite by Chemical Treatments)

  • 임굉
    • 자연과학논문집
    • /
    • 제5권1호
    • /
    • pp.67-75
    • /
    • 1992
  • 결정성 aluminosilicate 광물의 일종인 천연 zeolite는 광물학적 특성과 화학적 표면활성으로 인하여 다방면의 공업화학적 이용가치가 매우 높고 광물중 특히 가장 높은 양이온교환능을 가지고 있어 기체분자에 대한 선택적 흡착력이 큰 molecular sieve로써 흡착분리제로는 물론, 건조제, 흡습제, 이온교환체, 촉매, 증량제 그리고 폐수처리제, 경수의 연화제등으로 이용도가 날로 증가하고 있다. 국내산 천연 zeolite를 IN HCL용액과 NaCl용액으로 화학처리하여 다공성을 증가시켜 column충전제로 사용한 결과, 혼합기체 Ar, $N_2$ CO및 $CH_4$의 분리특성에 관해서 HCL용액으로 처리한 mordenite 시료는 활성화온도가 $300^{\circ}C$일 경우, CO와 $CH_4$의 분리는 곤란하나 $350^{\circ}C$에서는 분리가 용이하였고 NaCl용액으로 처리한 시료는 미처리한 것과 거의 유사하였다. Ar과 $N_2$와의 분리에는 산 또는 알칼리로 화학처리한 시료에도 별로 효과가 없었으나 HCL용액과 NaCl용액을 연속적으로 처리한 천연 zeolite는 합성 zeolite의 특성에 견줄만한 정도로 기체분리효과와 HETP값을 보여주었다. 한편 시료의 화학처리에 의한 Ar과 CO의 흡착열의 변화는 극성기체인 CO의 경우, 별로 변화가 없지만 무극성기체인 Ar은 영향을 받기가 용이하였다. 또한 carrier gas He의 유속이 대략 20~30ml min범위일때 최소의 HETP값을 가지며 column의 효능이 좋았다.

  • PDF

BCl3 기반의 혼합가스들을 이용한 InP 고밀도 유도결합 플라즈마 식각 (High Density Inductively Coupled Plasma Etching of InP in BCl3-Based Chemistries)

  • 조관식;임완태;백인규;이제원;전민현
    • 한국재료학회지
    • /
    • 제13권12호
    • /
    • pp.775-778
    • /
    • 2003
  • We studied InP etching in high density planar inductively coupled $BCl_3$and $BCl_3$/Ar plasmas(PICP). The investigated process parameters were PICP source power, RIE chuck power, chamber pressure and $BCl_3$/Ar gas composition. It was found that increase of PICP source power and RIE chuck power increased etch rate of InP, while that of chamber pressure decreased etch rate. Etched InP surface was clean and smooth (RMS roughness <2 nm) with a moderate etch rate (300-500 $\AA$/min) after the planar $BCl_3$/Ar ICP etching. It may make it possible to open a new regime of InP etching with $CH_4$$H_2$-free plasma chemistry. Some amount of Ar addition (<50%) also improved etch rates of InP, while too much Ar addition reduced etch rates of InP.

전기선폭발법을 이용한 core/shell 구조 Ag/C 나노 입자의 제조 및 열처리조건에 따른 특성 (Synthesis of Core/shell Structured Ag/C Nano Particles and Properties on Annealing Conditions)

  • 전수형;엄영랑;이창규
    • 한국분말재료학회지
    • /
    • 제17권4호
    • /
    • pp.295-301
    • /
    • 2010
  • Multi shell graphite coated Ag nano particles with core/shell structure were successfully synthesized by pulsed wire evaporation (PWE) method. Ar and $CH_4$ (10 vol.%) gases were mixed in chamber, which played a role of carrier gas and reaction gas, respectively. Graphite layers on the surface of silver nano particles were coated indiscretely. However, the graphite layers are detached, when the particles are heated up to $250^{\circ}C$ in the air atmosphere. In contrast, the graphite coated layer was stable under Ar and $N_2$ atmosphere, though the core/shell structured particles were heated up to $800^{\circ}C$. The presence of graphite coated layer prevent agglomeration of nanoparticles during heat treatment. The dispersion stability of the carbon coated Ag nanoparticles was higher than those of pure Ag nanoparticles.

핵융합 배가스 중 수소 회수를 위한 촉매반응 특성 연구 (Study on the Characteristics of Catalyst Reaction for Hydrogen Recovery from Nuclear Fusion Exhaust Gas)

  • 정우찬;정필갑;김정원;문흥만
    • 한국수소및신에너지학회논문집
    • /
    • 제26권5호
    • /
    • pp.402-408
    • /
    • 2015
  • In D-T fusion reaction, $D_2$ (duterium) and $T_2$(tritium) are used as fuel gas. The exhaust gas of nuclear fusion includes hydrogen isotopes $Q_2$ (Q means H, D or T), tritiated components ($CQ_4$ and $Q_2O$), CO, $CO_2$, etc. All of hydrogen isotopes should be recovered before released to the atmosphere. This study focused on the recovery of hydrogen isotopes from $CQ_4$ and $Q_2O$. Two kinds of experiments were conducted to investigate the catalytic reaction characteristics of SMR (Steam Methane Reforming) and WGS (Water Gas Shift) reactions using Pt catalyst. First test was performed to convert $CH_4$ into $H_2$ using 6% $CH_4$, 6% CO/Ar feed gas. In the other test, 100% CO gas was used to convert $H_2O$ into $H_2$ at various reaction conditions (reaction temperature, S/C ratio, GHSV). As a result of the first test, $CH_4$ and CO conversion were 41.6%, 57.8% respectively at $600^{\circ}C$, S/C ratio 3, GHSV $2000hr^{-1}$. And CO conversion was 72% at $400^{\circ}C$, S/C ratio 0.95, GHSV $333hr^{-1}$ in the second test.

기판 바이어스 DC 전원의 종류와 반응가스 분압비가 3성분계 B-C-N 코팅막의 합성과 마찰 특성에 미치는 영향 (Effects of DC Substrate Bias Power Sources and Reactant Gas Ratio on Synthesis and Tribological Properties of Ternary B-C-N Coatings)

  • 정다운;김두인;김광호
    • 한국표면공학회지
    • /
    • 제44권2호
    • /
    • pp.60-67
    • /
    • 2011
  • Ternary B-C-N coatings were deposited on Si(100) wafer substrate from $B_4C$ target by RF magnetron sputtering technique in $Ar+N_2+CH_4$ gas mixture. In this work, the effect of reactant gas ratio, $CH_4/(N_2+CH_4)$ on the composition, kinds and amounts of bonding states comprising B-C-N coatings were investigated using two different bias power sources of continuous and unipolar DCs. In addition, the tribological properties of coatings were studied with the composition and bonding state of coating. It was found that the substrate bias power had an effect on chemical composition, and all of the obtained coatings were nearly amorphous. Main bonding states of coatings were revealed from FTIR analyses to be h-BN, C-C, C-N, and B-C. The amount of C-C bonging mainly increased with increase of the reactant gas ratio. From our studies, both C-C and h-BN bonding states improved the tribological properties but B-C one was found to be harmful on those. The best coating from tribological points of view was found to be $BC_{1.9}N_{2.3}$ composition.

ZnO/나노결정다이아몬드 적층 박막 SAW 필터 (SAW Filter Made of ZnO/Nanocrystalline Diamond Thin Films)

  • 정두영;강찬형
    • 한국표면공학회지
    • /
    • 제42권5호
    • /
    • pp.216-219
    • /
    • 2009
  • A surface acoustic wave (SAW) filter structure was fabricated employing $4{\mu}m$ thick nanocrystalline diamond (NCD) and $2.2{\mu}m$ thick ZnO films on Si wafer. The NCD film was deposited in an $Ar/CH_4$ gas mixture by microwave plasma chemical vapor deposition method. The ZnO film was formed over the NCD film in an RF magnetron sputter using ZnO target and $Ar/O_2$ gas. On the top of the two layers, copper film was deposited by the RF sputter and inter digital transducer (IDT) electrode pattern (line/space : $1.5/1.5{\mu}m$) was defined by the photolithography including a lift-off etching process. The fabricated SAW filter exhibited the center frequency of 1.66 GHz and the phase velocity of 9,960 m/s, which demonstrated that a giga Hertz SAW filter can be realized by utilizing the nanocrystalline diamond thin film.

PECVD 로 합성된 Ti-Si-C-N 코팅막의 미세구조 및 기계적 성질 (Microstructure and Mechanical Properties of Ti-Si-C-N Coatings Synthesized by Plasma-Enhanced Chemical Vapor Deposition)

  • 홍영수;김광호
    • 한국표면공학회:학술대회논문집
    • /
    • 한국표면공학회 2008년도 추계학술대회 초록집
    • /
    • pp.83-85
    • /
    • 2008
  • 4성분계 Ti-Si-C-N 코팅막은 $TiCl_4$, $SiH_4$, $CH_4$, Ar, 그리고 $N_2$ 가스 혼합체를 이용하여 RF-PECVD 기법에 의해 Si 와 AISI 304 기판위에 합성하였다. Ti-C-(0.6)-N(0.4) 조성의 코팅막에 Si를 첨가함으로 Ti(C,N) 결정질은 줄어들고, Si3N4 및 SiC 비정질상이 나타났다. Ti-Si(9.2 at.%)-C-N의 조성에서 나노 크기의 nc-Ti(C,N) 결정질을 비정질 a-Si3N4/SiC가 둘러싸고 있는 형태의 나노 복합체를 나타내었다. 경도 24 Gpa의 Ti-C-N 코팅막은 Si를 첨가함으로 Ti-Si(9.2 at.%)-C-N 조성에서 46 Gpa의 최고 경도를 나타내었으며, 마찰계수의 경우에도 Ti-C-N 코팅막에 Si를 첨가함으로 크게 낮아졌다.

  • PDF

Enhancement of Surface Hardness and Corrosion Resistance of AISI 310 Austenitic Stainless Steel by Low Temperature Plasma Carburizing Treatment

  • Lee, Insup
    • 한국표면공학회지
    • /
    • 제50권4호
    • /
    • pp.272-276
    • /
    • 2017
  • The response of AISI 310 type austenitic stainless steel to the novel low temperature plasma carburizing process has been investigated in this work. This grade of stainless steel shows better corrosion resistance and high temperature oxidation resistance due to its high chromium and nickel content. In this experiment, plasma carburizing was performed on AISI 310 stainless steel in a D.C. pulsed plasma ion nitriding system at different temperatures in $H_2-Ar-CH_4$ gas mixtures. The working pressure was 4 Torr (533Pa approx.) and the applied voltage was 600 V during the plasma carburizing treatment. The hardness of the samples was measured by using a Vickers micro hardness tester with the load of 100 g. The phase of carburized layer formed on the surface was confirmed by X-ray diffraction. The resultant carburized layer was found to be precipitation free and resulted in significantly improved hardness and corrosion resistance.