The etching characteristics of $(Ba_{0.6}Sr_{0.4})TiO_{3}$ film Using $Ar/CF_{4}$ Inductively Coupled Plasma
($Ar/CF_{4}$ 유도결합 플라즈마로 식각된 $(Ba_{0.6}Sr_{0.4})TiO_{3}$ 박막의 특성분석)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2002.05b
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- pp.16-19
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- 2002