• 제목/요약/키워드: $Al_2$$O_3$ thick films

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에어로졸데포지션법을 이용한 $Al_2O_3$-PMMA 복합체 후막의 형성에 있어 PMMA 파우더의 거동 (Behavior of PMMA Powder in Formation of $Al_2O_3$-PMMA Composite Thick Films Aerosol Deposition Method)

  • 나현준;윤영준;김종희;남송민
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.37-37
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    • 2008
  • 에어로졸데포지션법을 이용하여 집적화 기판을 위한 $Al_2O_3$-PMMA 복합체 후막을 상온에서 구리 기판 위 에 제조하였다. XRD, FT-IR 분석을 통해 코팅된 막은 $Al_2O_3$와 PMMA의 혼합물로 존재함을 확인하였으며 성막 중 $Al_2O_3$. PMMA의 상호작용과 PMMA 파우더의 거동에 대한 분석을 통해 $Al_2O_3$-PMMA 복할체 후막의 성막 양상을 확인할 수 있었다. 또한 기판 거칠기에 따라 초기 계면의 양상이 달라질 수 있음을 확인하였고 이러한 초기 계면의 상태가 $Al_2O_3$-PMMA 복합체 후막의 제조에 있어 매우 중요함을 알 수 있었다. 본 연구에서는 에어로졸데포지션법을 이용한 $Al_2O_3$-PMMA 복합체 후막의 성막 양상을 통해 세라믹-폴리머 복합체의 제조에 있어서의 주요 변수들을 알아보고 $Al_2O_3$-PMMA 복합체 후막의 전기적인 특성을 확인하였다.

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스크린 프린팅법으로 제조된 PAN-PZT 후막의 특성 (Charicteristics of PAN-PZT Thick Films on Si-Substrate by Screen Printing)

  • 김상종;최지원;김현재;성만영;윤석진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.139-142
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    • 2002
  • Characteristics of piezoelectric thick films prepared by screen printing were investigated. The piezoelectric thick films were fabricated using Pb(Al,Nb)O$_3$-Pb(Zr,Ti)O$_3$ system on Si-substrate. The fabricated thick films were burned out at 400$^{\circ}C$ and sintered at 850∼1000$^{\circ}C$ using rapid thermal annealing(RTA) precess. The thickness of piezoelectric thick films were 10$\mu\textrm{m}$. PAN-PZT thick film on Ag-Pd/SiO$_2$/Si prepared at 900$^{\circ}C$/1300sec had remanent polarization of 19.70 ${\mu}$C/$\textrm{cm}^2$.

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$B_2O_3-Li_2CO_3$가 첨가된 BST-MgO 후막의 구조 및 유전 특성 (Structural and Dielectric Properties of BST-MgO with $B_2O_3-Li_2CO_3$ Thick Films)

  • 강원석;김재식;고중혁;이영희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.19-20
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    • 2007
  • At first the $Ba_{0.5}Sr_{0.5}TiO_3$-MgO powder with $B_2O_3-Li_2CO_3$ were made by the Sol-Gel method. The thick films of BST-MgO with $B_2O_3-Li_2CO_3$ were fabricated on the $Al_2O_3$ substrates coated with Pt by the screen printing method. The structural and dielectric properties of the BST-MgO thick film with $B_2O_3-Li_2CO_3$, addition were investigated. The structure of the BST-MgO with $B_2O_3-Li_2CO_3$ thick films were dense and homogeneous with no pores. The dielectric constant was increased and dielectric loss was decreased with increasing the sintering temperature.

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Fe$_2O_3/(Al_2O_3+Ga_2O_3)$ 변화에 따른 $(EuBi)_3(FeAlGa)_5O_{12},(EuTbBi)_3(FeAlGa)_5O_{12}$ 가네트 단결정 후막의 성장과 자기적 특성 (Growth and Magnetic Properties $(EuBi)_3(FeAlGa)_5O_{12},(EuTbBi)_3(FeAlGa)_5O_{12}$ Garnet Single Crystal Thick Films by $Fe_2O_3/(Al_2O_3+Ga_2O_3)$ Molar Ratio)

  • 김근영;윤석규;이성문;윤대호
    • 한국세라믹학회:학술대회논문집
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    • 한국세라믹학회 2003년도 추계총회 및 연구발표회 초록집
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    • pp.144.1-144
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    • 2003
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알루미나 기판에 스크린 프린팅된 Ag(Ta,Nb)O3 후막의 유전특성 및 초고주파 특성에 대한 연구 (An Investigation on the Dielectric and Microwave Properties of Ag(Ta,Nb)O3 Thick Films on the Alumina Substrates)

  • 이규탁;고중혁
    • 한국전기전자재료학회논문지
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    • 제24권11호
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    • pp.925-928
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    • 2011
  • Perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. This article was investigated ferroelectric materials $Ag(Ta,Nb)O_3$ thick film. In this study, we have fabricated the $Ag(Ta,Nb)O_3$ thick film on the $Al_2O_3$ substrates by screen printing method. The $Ag(Ta,Nb)O_3$ thick film were fabricated by the mixed oxide method. The sintering temperature and time were 1,150$^{\circ}C$, 2 hr. The electrical properties of $Ag(Ta,Nb)O_3$ thick film were investigated at 30~100$^{\circ}C$.

적층주기에 따른 $BaTiO_3/SrTiO_3$ 이종층 후막의 유전 특성 (The Dielectric Properties of $BaTiO_3/SrTiO_3$ Heterolayered Thick Films with Stacking Periodicity)

  • 이의복;최의선;이문기;류기원;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.194-196
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    • 2004
  • $BaTiO_3/SrTiO_3$ heterolayered thick films on the $Al_2O_3$ substrate by screen printing method with stacking periodicity. The stacking periodicity of $BaTiO_3/SrTiO_3$ heterolayer structure was varied from $(BaTi_O_3)_1/(SrTiO_3)_1$ to $(BaTi_O_3)_3/(SrTiO_3)_3$. The total thickness of the $BaTiO_3/SrTiO_3$ films was about $120{\mu}m$. There was an interdiffusion at the interface of the $BaTiO_3$ and $SrTiO_3$ layers. The dielectric constant of $BaTiO_3/SrTiO_3$ heterolayered thick films was increased with decreasing stacking periodicity of the $BaTiO_3/SrTiO_3$. The dielectric constant of the ($(BaTi_O_3)_1/(SrTiO_3)_1$ herterolayered thick films was about 1780.

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MgO가 첨가된 $Ba_{0.5}Sr_{0.5}TiO_3$ 후막의 구조 및 유전 특성 (Structural and Dielectirc Properties of $Ba_{0.5}Sr_{0.5}TiO_3$ Thick Films Doped with MgO)

  • 강원석;남성필;고중혁;이성갑;이영희
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권12호
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    • pp.555-559
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    • 2006
  • Using the $Ba_{0.5}Sr_{0.5}TiO_3$(BST) powders prepared by the Sol-Gel method, the BST thick films were fabricated on the $Al_2O_3 $substrates coated with Pt by the screen printing method. Compared with pure BST thick films, the structural and dielectric properties of the BST thick films doped with $1{\sim}10$ wt % MgO were investigated. It was observed that the Mg substitution into BST causes a shift in the cubic-tetragonal BST phase transition peak to a lower temperature. The microstructure of the BST substituted with Mg was homogeneous and dense. Mg substitution into BST had a significant effect on the grain size reduction. Dielectric constant was decreased with increasing the MgO content and temperature. In the case of BST thick films doped with 1 wt% MgO, the relative permittivity and dielectric loss were 1581 and 1.4 % at 1 MHz.

$B_{2}O_{3}-Li_{2}CO_{3}$의 첨가량에 따른 BST-MgO 후막의 구조 및 유전 특성 (Structural and Dielectirc Properties of BST-MgO with $B_{2}O_{3}-Li_{2}CO_{3}$ Thick Films)

  • 강원석;고중혁;남송민;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 제38회 하계학술대회
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    • pp.1261-1262
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    • 2007
  • At first the $Ba_{0.5}Sr_{0.5}TiO_{3}$-MgO powder with $B_{2}O_{3}-Li_{2}CO_{3}$ were made by the Sol-Gel method. And then the thick films of BST-MgO with $B_{2}O_{3}-Li_{2}CO_{3}$ were fabricated on the $Al_{2}O_{3}$ substrates coated with Pt by the screen printing method. The structural and dielectric properties of the BST-MgO thick film with $B_{2}O_{3}-Li_{2}CO_{3}$ addition were investigated. The structure of the BST-MgO with $B_{2}O_{3}-Li_{2}CO_{3}$ thick films were dense and homogeneous with no pores. The dielectric constant and dielectric loss were increased with decreasing the $B_{2}O_{3}-Li_{2}CO_{3}$ addition ratio.

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스크린 프린트된 후막의 Impedance Spectroscopy 특성 분석 (Impedance Spectroscopy Analysis of the Screen Printed Thick Films)

  • 함용수;문상호;남송민;이영희;고중혁;정순종;김민수;조경호
    • 한국전기전자재료학회논문지
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    • 제23권6호
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    • pp.477-480
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    • 2010
  • In this study, we fabricate 3 wt% $Li_2CO_3$ doped $(Ba,Sr)TiO_3$ thick films on the Ag/Pd bottom electrode printed $Al_2O_3$ substrates for the LTCCs (low temperature co-fired ceramics) applications. From the X-ray diffraction analysis, 3 wt% $Li_2CO_3$ doped BST thick films on the Ag/Pd printed $Al_2O_3$ substrates, which sintered at $900^{\circ}C$, showed perovskite structure without any pyro phase. The dielectric properties of 3 wt% $Li_2CO_3$ doped BST thick films are measured from 1 kHz to 1 MHz. To investigate the electrical properties of 3 wt% $Li_2CO_3$ doped BST thick films, we employ the impedance spectroscopy. The complex impedance of 3 wt% $Li_2CO_3$ doped BST thick films are measured from 20 Hz to 1 MHz at the various temperatures.

Can be the dielectric constant of thin films as-grown at room temperature higher than that of its bulk material?

  • Jung, Hyun-June;Kim, Chung-Soo;Lee, Jeong-Yong;Yoon, Soon-Gil
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.23-23
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    • 2010
  • The $Bi_2Mg_{2/3}Nb_{4/3}O_7$ (BMNO)-Bi composite films sandwiched by an $Al_2O_3$ protection layer exhibited a linear increase of a dielectric constant with increasing thickness and the 1000nm-thick BMNO-Bi composite films showed a dielectric constant (~220) higher than that of its bulk material (~210), keeping a low leakage current density of about $0.1{\mu}A/cm^2$. An enhancement of the dielectric constant in the BMNO-Bi composite films was attributed to the hybrid model combined by a space charge polarization, dipolar response, and nano-capacitors. On the other hand, 1000nm-thick BMNO-Bi composite films sandwiched by 40nm-thick BMNO layer exhibited a dielectric constant of about 450 at 100 kHz and a leakage current density of $0.1{\mu}A/cm^2$ at 6V.

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