• Title/Summary/Keyword: $A_2O$ 공정

Search Result 1,999, Processing Time 0.031 seconds

Development of $O_2$ Purifier by Pressure Swing Adsorption Process (고순도 산소 생산을 위한 산소 정제 PSA 공정 개발)

  • Lee Chang-Ha;Jee Jeong-Geun;Lee Sang-Jin;Moon Heung-Man;Lee Sang-Hoon
    • Journal of the Korean Institute of Gas
    • /
    • v.8 no.1 s.22
    • /
    • pp.37-47
    • /
    • 2004
  • Pressure swing adsorption (PSA) process using CMS as an oxygen purifier was developed to produce high purity oxygen over $99\%$ with high productivity. The cyclic performances such as purity, recovery, and productivity of PSA process were compared experimentally and theoretically under the non-isothermal condition. A binary ($O_2$/Ar 95:5 vol.$\%$) and two kinds of ternary ($O_2/Ar/N_2$ 95:4:1 and 90:4:6 vol.$\%$) mixtures were used as feed gases. The developed process with the consecutive two blowdown steps produced the oxygen with $99.8\%$ purity and $56\%$ recovery from $95\%$ oxygen containing feed. However, in the feed with $90\%$ oxygen, the $O_2$ Purity was decreased up to $97.3\%$. In addition, because the cyclic performances of the suggested process was significantly affected by the diffusion rate, the non-isothermal model with the the modified LDF model was applied for the process simulation. The concentration-dependent rate parameter of the applied rate model was incorporated with the Langmuir isotherm.

  • PDF

Comparative Study of Thermal Annealing and Microwave Annealing in a-InGaZnO Used to Pseudo MOSFET

  • Mun, Seong-Wan;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.08a
    • /
    • pp.241.2-241.2
    • /
    • 2013
  • 최근, 비정질 산화물 반도체 thin film transistor (TFT)는 수소화된 비정질 실리콘 TFT와 비교하여 높은 이동도와 큰 on/off 전류비, 낮은 구동 전압을 가짐으로써 빠른 속도가 요구되는 차세대 투명 디스플레이의 TFT로 많은 연구가 진행되고 있다. 한편, 기존의 MOSFET 제작 시 우수한 박막을 얻기 위해서는 $500^{\circ}C$ 이상의 높은 열처리 온도가 필수적이며 이는 유리 기판과 플라스틱 기판에 적용하는 것이 적합하지 않고 높은 온도에서 수 시간 동안 열처리를 수행해야 하므로 공정 시간 및 비용이 증가하게 된다는 단점이 있다. 따라서, 본 연구에서는 RF sputter를 이용하여 증착된 비정질 InGaZnO pesudo MOSFET 소자를 제작하였으며, thermal 열처리와 microwave 열처리 방식에 따른 전기적 특성을 비교 및 분석하고 각 열처리 방식의 열처리 온도 및 조건을 최적화하였다. P-type bulk silicon 위에 산화막이 100 nm 형성된 기판에 RF 스퍼터링을 이용하여 InGaZnO 분말을 각각 1:1:2mol% 조성비로 혼합하여 소결한 타겟을 사용하여 70 nm 두께의 InGaZnO를 증착하였다. 연속해서 Photolithography 공정과 BOE(30:1) 습식 식각 과정을 이용해 활성화 영역을 형성하여 소자를 제작하였다. 제작 된 소자는 pseudo MOSFET 구조이며, 프로브 탐침을 증착 된 채널층 표면에 직접 접촉시켜 소스와 드레인 역할을 대체하여 동작시킬 수 있어 전기적 특성을 간단하고 간략화된 공정과정으로 분석할 수 있는 장점이 있다. 열처리 조건으로는 thermal 열처리의 경우, furnace를 이용하여 각각 $300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$, $600^{\circ}C$에서 30분 동안 N2 가스 분위기에서 열처리를 실시하였고, microwave 열처리는 microwave를 이용하여 각각 400 W, 600 W, 800 W, 1000 W로 20분 동안 실시하였다. 그 결과, furnace를 이용하여 열처리한 소자와 비교하여 microwave 를 통해 열처리한 소자에서 subthreshold swing (SS), threshold voltage (Vth), mobility 등이 개선되는 것을 확인하였다. 따라서, microwave 열처리 공정은 향후 저온 공정을 요구하는 MOSFET 제작 시의 훌륭한 대안으로 사용 될 것으로 기대된다.

  • PDF

Development of an Oxide Reduction Process for the Treatment of PWR Spent Fuel (PWR 사용후핵연료 처리를 위한 금속전환공정 개발)

  • Hur, Jin-Mok;Hong, Sun-Seok;Jeong, Sang-Mun;Lee, Han-Soo
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
    • /
    • v.8 no.1
    • /
    • pp.77-84
    • /
    • 2010
  • Reduction of oxides has been investigated for the volume reduction and recycling of the spent oxide fuel from commercial nuclear power plants. Various oxide reduction methods were proposed and KAERI (Korea Atomic Energy Research Institute) is currently developing an electrochemical reduction process using a LiCl-$Li_2O$ molten salt as a reaction medium. The electrochemical reduction process, the front end of the pyroprocessing, can connect the PWR (Pressurized Water Reactor) oxide fuel cycle to a metal fuel cycle of the sodium cooled fast reactor. This paper summarizes KAERI efforts on the development, improvement, and scale-up of the oxide reduction process.

Study on the applicability of the ozone / AOP and activated carbon process for the removal of trace organic contaminants and taste odor causing substances (미량오염물질 및 맛 냄새유발물질의 제거를 위한 오존/AOP 및 활성탄 공정의 적용성에 관한 연구)

  • Ha, Jeongtae;Im, Jiyeol;Gil, Kyungik
    • Journal of Wetlands Research
    • /
    • v.17 no.2
    • /
    • pp.155-162
    • /
    • 2015
  • This study was conducted to assess the removal characteristics of taste and odor causing compounds(2-MIB and geosmin) and micro organic matters. GAC and BAC process consisting of Ozone/AOP and activated carbon was applied. As a result, the influent concentration of 2-MIB 159 ng/L and geosmin 371 ng/L were removed 42% and 86% by ozone 1.0 mg/L, and 58%, 90% by AOP(ozone 1.0 mg/L + $H_2O_2$ 0.5 mg/L). Also it showed less than 2 ng/L effluent in GAC process and 99.8% removal efficiency in BAC process. Therefore, BAC process combining ozone/AOP and GAC is effective for persistent removal of micro organic matters, taste and odor. It is needed for optimization of Ozone/AOP process according to influent concentrations.

Parallel pattern fabrication on metal oxide film using transferring process for liquid crystal alignment (전사 공정을 이용한 산화막 정렬 패턴 제작과 액정 배향 특성 연구)

  • Oh, Byeong-Yun
    • Journal of IKEEE
    • /
    • v.23 no.2
    • /
    • pp.594-598
    • /
    • 2019
  • We demonstrate an alternative alignment process using transferring process on solution driven HfZnO film. Parallel pattern is firstly fabricated on a silicon wafer by laser interference lithography. Prepared HfZnO solution fabricated by sol-gel process is spin-coated on a glass substrate. The silicon wafer with parallel pattern is placed on the HfZnO film and annealed at $100^{\circ}C$ for 30 min. After transferring process, parallel grooves on the HfZnO film is obtained which is confirmed by atomic force microscopy and scanning electron microscopy. Uniform liquid crystal alignment is achieved which is attributed to an anisotropic characteristic of HfZnO film by parallel grooves. The liquid crystal cell exhibited a pretilt angle of $0.25^{\circ}$ which showed a homogeneous alignment property.

Study of reforming catalyst for synthesis gas for GTL-FPSO process (GTL-FPSO 공정용 합성가스 제조를 위한 개질 촉매 연구)

  • Park, Dae-Il;Moon, Dong-Ju;Kim, Tae-Gyu
    • Proceedings of the Korean Society of Propulsion Engineers Conference
    • /
    • 2012.05a
    • /
    • pp.414-415
    • /
    • 2012
  • Reforming catalyst of synthesis gas for GTL-FPSO process is presented in this paper. In the present study, the Ni foam catalyst was compared with the existing $Al_2O_3$ pellet catalyst. The SCR reaction on the catalyst was evaluated at the different temperature. The $CH_4$ conversions increased with the reactor temperature. Also, the Ni foam catalyst had a higher $CH_4$ conversion than a pellet catalyst.

  • PDF

Pentachlorophenol(PCP) Decomposition by the Electron-beam Process (전자빔 공정에 의한 Pentachlorophenol 분해)

  • Kwon, Joongkuen;Kim, Jongoh;Kwon, Bumgun
    • Journal of the Korean GEO-environmental Society
    • /
    • v.13 no.7
    • /
    • pp.49-54
    • /
    • 2012
  • This study focuses on the decomposition of pentachlorophenol(PCP) by an electron beam (E-beam) process. To attain this objective, we investigated the reactive species generated from E-beam process during irradiation (reaction time 0.6 s) and G-values of PCP decomposition and effects of pH and $H_2O_2$ as an additive. The effect of pH values was independent on the decomposition of PCP. However, during E-beam irradiation a scavenging effect of added $H_2O_2$ (> 1mM) for the decomposition of PCP was shown, which was supported by the decreased amounts of $Cl^-$ produced by the decomposition of PCP. Meanwhile, oxalic acid and unidentified organic chlorine compounds as by-products were increased by the addition of $H_2O_2$. Thus, in order to enhance the efficiency of PCP decomposition, the E-beam process has to consider a proper concentration of $H_2O_2$ as a well-known source of strong oxidant hydroxyl radical.

FBAR devices employing the ZnO:N films (질소 주입된 산화아연 박막을 사용한 박막 음향 공진 소자 연구)

  • Lee, Eun-Ju;Zhang, Ruirui;Yoon, Gi-Wan
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • 2011.05a
    • /
    • pp.696-698
    • /
    • 2011
  • We present a new method for the fabrication of film bulk acoustic wave resonator (FBAR) devices that exploits the thin piezoelectric ZnO films particularly sputter-deposited in a mixture of N2O and Ar gases as the reactive and sputtering gases, respectively. Some thermal annealing treatments were performed on the as-deposited ZnO films and also their effects on the resonance characteristics of the FBAR devices were investigated. It was found that with an optimized process, the resonance characteristics of the fabricated FBAR devices could be further improved.

  • PDF

A study on the NO oxidation using dry oxidant produced by the catalytic conversion of H2O2 (H2O2 촉매 전환에 의해 생성된 건식산화제를 이용한 NO 산화에 관한 연구)

  • Jang, Jung Hee;Han, Gi Bo
    • Journal of the Korean Applied Science and Technology
    • /
    • v.33 no.1
    • /
    • pp.100-109
    • /
    • 2016
  • In this study, the NO oxidation using dry oxidant produced by catalytic $H_2O_2$ conversion was conducted. It was shown that Mn-based $Fe_2O_3$ support catalyst has the best performance in the catalytic $H_2O_2$ conversion and its combined-NO oxidation. The reaction characteristics of NO oxidation was investigated by the various operation conditions such as $H_2O_2$ amount, oxidation temperature and space velocity. As a results, the oxidation efficiency of NO greatly depends on the oxidation reaction temperature, $H_2O_2$ amount and space velocity. The performance of NO oxidation was increased with increasing the oxidation temperature and $H_2O_2$ amount. Also, the performance of NO oxidation was decreased with increasing the space velocity.