• Journal of Korean Vacuum Science & Technology
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• 제1권1호
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• pp.24-29
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• 1997

Surface morphologies and fundamental characteristics of molybdenum nitride films deposited by reactive dc magnetron sputtering were studied for application to Cu diffusion barrier. A phase transformation from Mo to $\gamma$-Mo$_2$N phase at 0.5$N_2$ flow ratio.($N_2$/(Ar+$N_2$)) equal to and larger than 0.2, whereas a second phase transformation to $\gamma$-MoN phase at 0.5 N2 flow ratio, With the variation of the N2 ratio the surface morphologies of the films were generally smooth except the cases of 0.2 and 0.3$N_2$ gas rations, where build-up of film stresses occurred. $\gamma$-Mo$_2$N film was found to crystallize at the deposition temperature of 40$0^{\circ}C$. The surfaces of $\gamma$-Mo$_2$N films deposited up to 40$0^{\circ}C$ were smooth, but the film deposited at 50$0^{\circ}C$ had very rough surface morphology. It seems that this was due to the building-up of thermal stresses at the high deposition temperature, which might lead to hillock formation.

• 한국표면공학회지
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• 제43권6호
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• pp.266-271
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• 2010

Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in $Ar/N_2$ gaseous atmosphere. As increasing $N_2$ pressure, the microstructure of Mo-N films changed from ${\gamma}-Mo_2N$ of (111) having face-centered-cubic (FCC) structure to $\delta$-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron microscope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the $Mo_2N$ and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline ${\gamma}-Mo_2N$ and $\delta$-MoN surrounded by amorphous $Cu_3N$ phase.

• 대한금속재료학회지
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• 제50권9호
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• pp.645-651
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• 2012

This study investigated changes in phase fraction caused by the addition of Mo, as well as the subsequent behaviour of N and its effect on the mechanical properties of welded 24Cr-N duplex stainless steel weld metals. Filler metal was produced by fixing the contents of Cr, Ni, N, and Mn while adjusting the Mo content to 1.4, 2.5, 3.5 wt%. The delta ferrite fraction increased as the Mo content increased. In contrast, the ${\gamma}$ fraction decreased and changed from a round to an acicular shape. Secondary austenite (${\gamma}^{\prime}$) was observed in all specimens in a refined form, but it decreased as the Mo content increased to the extent that it was nearly impossible to find any secondary austenite at 3.5 wt% Mo. Both tensile and yield strengths increased with the addition of Mo. In contrast, the highest value of ductility was observed at 1.41 wt% Mo. At all temperatures, impact energy absorption showed the lowest value at 3.5 wt% Mo, at which the amount of ${\delta}$-ferrite was greatest. There was no significant temperature dependence of the impact energy absorption values for any of the specimens. As the fraction of ${\gamma}$ phase decreased, the amount of N stacked in the ${\gamma}$ phase increased. Consequently, the stacking fault energy decreased, while the hardness of ${\gamma}$ increased.

• 한국표면공학회지
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• 제55권2호
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• pp.77-83
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• 2022

Nanocrystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) changing the plasma power from 0 W to 200 W. The properties of the coatings were analyzed by x-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, nanoindentation tester and semiconductor characterization system. As the ICP power increases, the crystal structure of the MoN coatings changed from a mixed phase of γ-Mo₂N and α-Mo to a single phase γ-Mo₂N. MoN coatings deposited by ICPMS at 200 W showed the most compact microstructure with the highest nanoindentation hardness of 27.1 GPa. The electrical resistivity of the coatings decreased from 691.6 μΩ cm to 325.9 μΩ cm as the ICP power increased.

• 대한화학회지
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• 제36권5호
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• pp.661-668
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• 1992

MoCl_5와 NaNO_2 및 산성화시킨 FeSO_4의 reductive nitrosylation 반응을 통해 다핵 화합물인 [{Mo(NO)_2Cl_2}n]을 합성하였다. 이 [{Mo(NO)_2Cl_2}n]와 한자리 및 두자리 리간드를 반응시켜 높은 수득률(80∼90%)로 중성의 단핵 화합물인 [Mo(NO)2Cl2L2(or L-L)]을 얻었다. 사용한 리간드는 3,5-Lutidine, {\gamma}-Cyanopyridine, 1,2-Phenylenediamine, 1,10-Phenanthroline, sym-Diphenylethylenediamine, 9,10-Phenanthrenequinone, 1,3-Bis(diphenylphosphino)propane 및 8-Hydroxyquinoline 이였다. 합성한 dinitrosylmolybdenum 착물은 원소분석과 적외선, 핵자기 공명 및 전자 흡수 스펙트럼 등을 이용해서 그 특성을 조사하였다. 적외선 스펙트럼은 모든 화합물이 팔면체 구조로서 두 개의 NO 기가 cis 위치로 배위되어 있음을 보였다.

• 한국대기환경학회지
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• 제5권1호
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• pp.52-61
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• 1989

The hydrodenitrogenation of quinoline dissolved in n-heptane was studied over sulfided Ni-Mo/$\gamma-Al_2O_3$ catalyst at the range of the temperature between 553 K and 673 and the total pressure between $20 \times 10^5$ Pa and $60 \times 10^5$ Pa in a fixed bed flow reactor. Quinoline conversion was very high at relatively low temperature and total pressure, and decreased with quinoline partial pressure. The thermodynamic equilibrium between quinoline and Py-THQ existed in wide ranges of experimental conditions and shifted in favor of quinoline at higher temperature. At the range of the temperature betwwen 553 K and 673 K and at the total pressure $60 \times 10^5$ Pa, the quinoline reaction rate was 1st order with respect to the concentr4ation of quinoline and its apparent activation energy was 7.15 Kcal/mole.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 추계학술대회 논문집
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• pp.153-154
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• 2007

AISI316L강은 AISI304L강과 기본 조성은 같지만 316L강이 약 2.5%의 Mo가 첨가되어 있다. 저온 플라즈마 질탄화 시 모재에 첨가된 Mo의 영향을 조사하기 위하여 처리온도를 변화시켜 실험하였다. 같은 처리온도의 경우 경화층의 두께는 316L강이 비교적 두껍게 형성되었다. 316L강의 경우 $450^{\circ}C$이하에서 약 25 ${\mu}m$까지 형성되었고, 306L강의 경우 $400^{\circ}C$에서 약 10 ${\mu}m$까지 형성되었다. $400^{\circ}C$ 이하에서 경화층은 두 가지시편 모두 확장된 오스테나이트 (${\gamma}_N,\;{\gamma}_c$)로 이루어져 있으나, 304L의 경우 $430^{\circ}C$부터 석출물(CrN)이 형성되기 시작하였다. 316L의 경우 $450^{\circ}C$까지 석출물이 형성되지 않았고, $480^{\circ}C$에서 석출물 (CrN)이 관찰되었다. 석출물이 형성된 시편을 제외한 모든 시편의 내식성은 모제보다 증가 하였다.

• 한국표면공학회지
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• 제29권6호
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• pp.615-620
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• 1996

Chromium-Molybdenum steel was plasma-nitrided at 823 K for 10.8 ks in an atmosphere of 30% $N_2$-70% $H_2$ gas under 665 Pa without and with a subsidiary cathode of $MoS_2$ to compare ion-nitriding and plasma-sulfnitriding using subsidiary cathode. When the steel was ion-nitrided without $MoS_2$, iron nitride layer of 4$\mu\textrm{m}$ and nitrogen diffusion layer of 400mm were formed on the steel. A compound layer of 15$\mu\textrm{m}$ and nitrogen diffusion layer of 400$\mu\textrm{m}$ were formed on the surface of the steel plasma-sulfnitrided with subsidiary cathode of $MoS_2$. The compound layer consisted of FeS containing Mo and iron nitrides. The nitrides of $\varepsilon$-$Fe_2$, $_3N$ and $\gamma$-$Fe_4N$ formed under the FeS. The thicker compound layer was formed by plasma-sulfnitriding than ion-nitriding. In plasma-sulfnitriding, the surface hardness was about 730 Hv. The surface hardness of the steel plasma-sulfnitrided with $MoS_2$ was lower than that of ion-nitrided without $MoS_2$. This may be due to the soft FeS layer formed on the surface of the plasma-sulfnitrided steel.

• Journal of Korean Vacuum Science & Technology
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• 제1권1호
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• pp.30-37
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• 1997

Interactions of Cu films with Si substrates separated by thin layers of molybdenum and molybdenum nitride were investigated in the viewpoint of diffusion barrier to copper. the diffusion barrier behavior of the layers was studied as functions of deposition and annealing conditions by cross-sectional transmission electron microscopy and Nomarski microscopy. the layers deposited at $N_2$ gas ratios of 0.4 and 0.5 exhibited good diffusion barrier behaviors up to $700^{\circ}C$, mainly due to the phase transformation of molybdenum to $\gamma$-Mo$_2$N phase. The increase in the N gas ratio in deposition elevates the lower limit of barrier failure temperature. Futhermore, amorphous molybdenum nitride films deposited at 20$0^{\circ}C$ and 30$0^{\circ}C$ did not fail, while the crystalline $\gamma$-Mo$_2$N films deposited at 40$0^{\circ}C$ and 50$0^{\circ}C$ showed signs of interlayer interactions between Cu and Si after annealing at 75$0^{\circ}C$ for 30 minutes. Therefore, the amorphous nature of the molybdenum nitride layer enhanced its ability to reduce Cu diffusion and its stability as a diffusion barrier at elevated temperatures.

• 핵의학기술
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• 제17권2호
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• pp.48-52
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• 2013

본 연구의 목적은 한국원자력연구원에서 개발되고 있는 $(n,{\gamma})^{99}Mo/^{99m}Tc$발생기의 성능을 평가하고 개선방안을 연구함으로써 의학적 유효성을 확보하는 것이다. 이를 위해 본 연구에서는 한국원자력연구원에서 제조된 $(n,{\gamma})^{99}Mo/^{99m}Tc$발생기를 이용하여 $^{99m}Tc$ 용출 방사능량 시험, $^{99m}Tc$정도평가, $^{99m}Tc-DPD$, $^{99m}Tc-tetrafomin$ 표지수율 및 동물영상 평가를 진행하였다. 용출 방사능양은 상용 제품에 동일 용량에 비해 다소 적었으나, 발열성 물질 검사를 제외한 전영역의 $^{9m}Tc$정 도평가 실험에서 정상범위를 나타냈다. 표지 수율도 90% 이상 높은 수율을 관찰할 수 있었다. $^{99m}Tc-HDP$와 $^{99m}Tc-DPD$를 주입한 쥐 영상에서 한국 원자력 연구원 발생기는 모두 간과 비장의 집적을 관찰할 수 있었고 간과 비장은 상용발생기 일부에서도 관찰되었다. 이에 원자력 연구원 발생기는 발열성 물질을 제거한다면 비상시 훌륭한 대체 발생기 역할을 수행할 수 있을거라 생각한다.