• 제목/요약/키워드: $(Bi,La)_4Ti_3O_12$

검색결과 47건 처리시간 0.042초

박리화와 재적층법을 통한 K2La2Ti3O10부터 유전성 Bi4-xLaxTi3O12(x~2)의 합성 (Preparation of dielectric Bi4-xLaxTi3O12 (x~2) from K2La2Ti3O10 via exfoliation and restacking routes)

  • 전아영;고지은;김종영
    • 한국결정성장학회지
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    • 제23권1호
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    • pp.14-19
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    • 2013
  • 본 연구팀에서는 층상형 페로브스카이트 구조를 갖는 Ruddlesden-Popper 구조의 $K_2La_2Ti_3O_{10}$의 박리화를 통해 Aurivillius 구조의 $Bi_{4-x}La_xTi_3O_{12}$(x~2) 페로브스카이트 산화물을 성공적으로 합성하였다. 박리화된 란타늄 티타네이트 나노시트는 BiOCl 나노결정구조와 반응시켜 $Bi_{4-x}La_xTi_3O_{12}$(x~2) 결정을 얻어내었다. 박리화된 나노시트 현탁액은 $K_2La_2Ti_3O_{10}$으로부터 수소화된 $H_2La_2Ti_3O_{10}$의 층간에 에틸아민을 삽입시킴으로써 얻어내었다. 투과전자현미경(TEM) 분석을 통해, 란타늄 티타네이트가 에틸아민에 의해 박리화된 것을 확인할 수 있었다. X-선 회절분석(XRD)을 통해, 박리화된 란타늄 티타네이트와 BiOCl의 재적층과정을 거쳐 $700^{\circ}C$ 이상의 열처리 조건에서 $Bi_{4-x}La_xTi_3O_{12}$(x~2)로 형성된 것을 확인할 수 있었다.

펄스레이저 증착법으로 제작된 $Bi_4Ti_3O_{12}/LaAlO_3$ 박막과 $Bi_4Ti_3O_{12}/YBa_2Cu_3O_{7-x}/LaAlO_3$ 복합구조의 에피 성장 (Epitaxial Growth of Pulsed-Laser Deposited Bi4Ti3O12/LaAlO3 Thin Films and Bi4Ti3O12/YBa2Cu3O7-x/LaAlO3 Heterostructure)

  • 조월렴;조학주;노태원
    • 한국결정학회지
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    • 제5권2호
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    • pp.85-92
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    • 1994
  • 펄스 레이저 증착법을 이용하여 강유전체 Bi4T13012 박막을 laA109(001) 위에 성장시켰다. 넓은 영역의 온도에서 증착한 박막의 상 형성과 구조적 성질을 X선 회절법을 이용하여 조사하였다. 740℃에서 증착한 박막은 박막의 c-축이 기판에 수직한 형태의 에피 성장의 경향을 보인다. 펄스 레이저 증착법을 이용하여 Bi4Ti3O12/YBa2Cu3O7-x/LaAlO3 복합구조를 in-situ 성장시켰다. Yba2Cu3O7-x의 a-, b-축이 LaAlO3와 완벽하게 평행하게 배열되어 있지 않음에도 불구하고, Bi4Ti3012 박막은 에피 성장의 경향을 보인다.

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열처리 조건이 Bi1-xLaxTi3O12 (x=0.75) 박막의 특성에 미치는 효과 (Effects of Annealing Conditions on the Properties of Bi1-xLaxTi3O12 Thin Films)

  • 박문흠;김상수;강민주;하태곤
    • 한국재료학회지
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    • 제14권10호
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    • pp.701-706
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    • 2004
  • Bismuth layered structure ferroelectric thin films, La-substituted $Bi_{4}Ti_{3}O_{12}$ ($Bi_{1-x}La_{x}Ti_{3}O_{12}$, x=0.75, BLT) were prepared on the $Pt(111)/Ti/SiO_2/Si(100)$ substrates by a sol-gel spin coating process. The thin films were annealed in various conditions, i.e., oxygen, nitrogen and vacuum atmospheres for various annealing time. We investigated the annealing condition effects on the grain orientation and ferroelectric properties. The measured XRD patterns revealed that the BLT thin films showed only $Bi_{4}Ti_{3}O_{12}$-type phase with random orientation. $La^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of $Bi_{4}Ti_{3}O_{12}$ decreased the degree of c-axis orientation and increased the remanent polarization ($2P_{r}$). The remanent polarization ($2P_{r}$) and the coercive field ($2E_{c}$) of the BLT thin film annealed at $650^{\circ}C$ for 5 min in oxygen atmosphere were $87{\mu}C/cm^2$ and 182 kV/cm, respectively, at an applied electric field of 240 kV/cm. For all of the BLT thin films annealed in various conditions, the fatigue resistance was shown. The improvement of ferroelectric properties with La substitution in $Bi_{4}Ti_{3}O_{12}$ could be attributed to the changes in space charge densities and grain orientation in the thin film.

Electrical Properties of Metal-Ferroelectric-Insulator-Semiconductor Field-Effect Transistor Using an Au/$(Bi,La)_4Ti_3O_{12}/LaZrO_x$/Si Structure

  • Jeon, Ho-Seung;Lee, Gwang-Geun;Kim, Joo-Nam;Park, Byung-Eun;Choi, Yun-Soo
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.171-172
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    • 2007
  • We fabricated the metal-ferroelectric-insulator-semiconductor filed-effect transistors (MFIS-FETs) using the $(Bi,La)_4Ti_3O_{12}\;and\;LaZrO_x$ thin films. The $LaZrO_x$ thin film had a equivalent oxide thickness (EOT) value of 8.7 nm. From the capacitance-voltage (C-V) measurements for an Au/$(Bi,La)_4Ti_3O_{12}/LaZrO_x$/Si MFIS capacitor, a hysteric shift with a clockwise direction was observed and the memory window width was about 1.4 V for the bias voltage sweeping of ${\pm}9V$. From drain current-gate voltage $(I_D-V_G)$ characteristics of the fabricated Fe-FETs, the obtained threshold voltage shift (memory window) was about 1 V due to ferroelectric nature of BLT film. The drain current-drain voltage $(I_D-V_D)$ characteristics of the fabricated Fe-FETs showed typical n-channel FETs current-voltage characteristics.

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La 첨가량에 따른 $Bi_{4-x}La_{x}Ti_{3}O_{12}$ 강유전체의 주파수특성 (The Ferroelectric Frequency characteristics of $Bi_{4-x}La_{x}Ti_{3}O_{12}$ ceramics with the variation of Lanthanum additives)

  • 김응권;박복기;박기엽;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.463-466
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    • 2001
  • In recent year, Ferroelectric $BLT(Bi_{4-x}La_{x}Ti_{3}O_{12})$ is a promising candidate materials. This study was practiced to make good conditions of BL T targets. In this study, calcination and sintering temperature were kept at $750^{\circ}C$, $1100^{\circ}C$ for 2 hour respectively. the density obtained 7.612, 7.98, $7.877g/cm^{3}$ as $La_{2}O_{3}$ contents were 0.0mol%, 0.25mol%, 0.5mol%. Especially, the lanthanum content of 0.5 mol% measured C-axis (117) preferred orientation more than the others targets in the XRD. In $\varepsilon_{r}-f$ relationship using by HP 4194 A impedance analyzer, the 0.5 mol% observed above 200 relative dielectric constant. but the dissipation factor was higher than others targets at 100Hz~13MHz range. SEM photograph with the content of $La_{2}O_{3}$ was observed like rod and plate types.

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La 첨가량에 따른 Bi$_{4-x}La_x$Ti$_3O_12$ 강유전체의 주파수특성 (The Ferroelectric Frequency characteristics of Bi$_{4-x}La_x$Ti$_3O_12$ ceramics with the variation of Lanthanum additives)

  • 김응권;박복기;박기엽;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.463-466
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    • 2001
  • In recent year, Ferroelectric BLT($Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$) is a promising candidate materials. This study was Practiced to make good conditions of BLT targets. In this study, calcination and sintering temperature were kept at 75$0^{\circ}C$, 110$0^{\circ}C$ for 2 hour respectively. the density obtained 7.612, 7.98, 7.877 g/㎤ as La$_2$O$_3$ contents were 0.0mol%, 0.25mo1%, 0.5mol%. Especially, the lanthanum content of 0.5 mol% measured C-axis (117) preferred orientation more than the others targets in the XRD. In $\varepsilon$$_{r}$-f relationship using by HP 4194 A impedance analyzer, the 0.5 mol% observed above 200 relative dielectric constant. but the dissipation factor was higher than others targets at 100Hz~13MHz range. SEM photograph with the content of La$_2$O$_3$ was observed like rod and plate types.types.s.

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초음파분무 MOCVD법에 의한 $Bi_4Ti_3O_{12}$ 박막의 제조와 La과 V의 Co-Substitution 에 의한 효과 (Effects of substitution with La and V in $Bi_4Ti_3O_{12}$ thin film by MOCVD using ultrasonic spraying)

  • 김기현;곽병오;이승엽;이진홍;박병옥
    • 한국결정성장학회지
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    • 제13권6호
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    • pp.272-278
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    • 2003
  • 초음파 분무에 의한 유기금속 화학증착법 (MOCVD)법으로 $Bi_4Ti_3O_{12}$(BIT)와 Bi와 Ti 대신에 La과 V을 동시에 치환시킨 ($Bi_{3.75}La_{0.75})(Ti_{2.97}V_{0.03})O_{12}$ (BLTV)박막을 ITO/glass 기판 위에 증착하였다. 산소 분위기에서 30분 동안 증착한 후, RTA 방식의 직접삽입법으로 열처리를 하였다. 박막은 페로브스카이트상 생성 온도, 미세구조, 전기적 성질에 관해서 조사하였다. XRD(X-Ray diffraction) 측정결과 BLTV 박막의 페로브스카이트상 생성 온도는 약 $600^{\circ}C$로써 BIT의 $650^{\circ}C$보다 더 낮았다. BLTV 박막의 누설전류는 인가전압 1 V에서 $1.52\times10^{-19}$ A/cm^2$로 측정되었다 또한, $650^{\circ}C$에서 증착했을 경우 잔류 분극값이 $5.6\mu$C/$cm^2$, 항전계값 96.5 kV/cm으로 명확한 강유전성을 보이고 있다.

MOD법을 이용한 BLT박막의 제초 및 특성에 관한 연구 (The Preparation and Characterization of BLT Thin Films by MOD Process)

  • 이진한;장건익
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.186.1-189
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    • 2001
  • Ferroelectric $Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$ (BLT)thin films with various compositions(x=0.65, 0.70, 0.75) were prepared on Pt//Ti/SiO$_2$/Si(100) substrate by metal-organic deposition. The electrical and structural characteristics of BLT thin films were investigated to develop ferroelectric thin films for capacitor layers of FRAM. After spin coating, thin films were annealed at $650^{\circ}C$ for 1hour in oxygen atomosphere. Scanning electron micrographs showed uniform surfaces composed of rod-like grains. The $Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$ (x=0.70) thin film capacitors with a Pt top electrode showed better ferroelectric properties than other films. At the applied voltage of 5V, the dielectric constant($\varepsilon$$_{r}$), dissipation factor(tan$\delta$),remanent polarization(2Pr), and coercive field(2Ec) of the $Bi_{4-x}$La$_{x}$Ti$_3$O$_{12}$ (x=0.70)thin films were about 272.54, 0.059, 32.4 $\mu$C/cm$^2$, 2Ec=119.9kV/cm. Also the capacitor did not show any significant fatigue up to 4.8$\times$10$^{10}$ read/write switching cycles.hing cycles.s.

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