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http://dx.doi.org/10.6117/kmeps.2022.29.2.065

A Study on the Low Depth Marking Method through Laser Source Characteristic Analysis  

Jeon, Sooho (PKG Development, SK Hynix Inc.)
Kim, Jeho (PKG Development, SK Hynix Inc.)
Lee, Youngbeom (PKG Development, SK Hynix Inc.)
Moon, Kiill (PKG Development, SK Hynix Inc.)
Publication Information
Journal of the Microelectronics and Packaging Society / v.29, no.2, 2022 , pp. 65-71 More about this Journal
Abstract
In the case of Mobile PKG Trend is in a situation where a decrease in Mold Top Margin is inevitable due to its miniaturization and high capacity product requirements. However, conventional laser marking technology has an average depth of deep, and when applied to narrow top margin products, PKG strength is expected to decrease due to overlapping processing, and reliability is reduced due to poor quality such as chip damage due to laser exposure. Therefore, we have secured the technology through research on low-depth laser marking solutions that can accommodate narrow top margin products. As a result of the evaluation of applicable technology application for PKG development products, it was verified that the marking depth decreased by 67% reduced and the PKG strength increased by 12%. Furthermore, the quality verification of Laser Damage that can occur through PKG Mechanical analysis was performed, and no Chip Damage defects were found. This ensured the stability of mass production application quality.
Keywords
PKG; Laser Marking; Low Depth; Chip Damage;
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