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http://dx.doi.org/10.6117/kmeps.2019.26.3.037

Suppressed Sheet Resistance of Ag Nanostructure Films by O2 Plasma Treatment  

Kim, Wonkyung (Department of Materials Science and Engineering, Yonsei University)
Roh, Jong Wook (School of Nano & Materials Science and Engineering, Kyungpook National University)
Publication Information
Journal of the Microelectronics and Packaging Society / v.26, no.3, 2019 , pp. 37-41 More about this Journal
Abstract
Sheet resistance reduction in the Ag nanowire (NW) coated films is accomplished with slight improvement of optical properties for the application of transparent conducting electrodes by using $O_2$ plasma treatment. The sheet resistance was optimized after 30 seconds $O_2$ plasma treatment, showing the 27 % of maximum decrease of sheet resistance. It is found that the $O_2$ plasma treatment get rid of the residual organic materials at the junction of Ag NWs. However, the Ag NWs may be also snapped by the excessive $O_2$ plasma treatment can showing the collapses of Ag NWs networks. Furthermore, the optical properties such as optical transmittance and haze were monotonically improved with the $O_2$ plasma treatment time until 90 seconds.
Keywords
Nanowires; Silver; Transparent electrodes; Plasma;
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