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http://dx.doi.org/10.4313/JKEM.2005.18.3.212

Modified Illumination with a Concentric Circular Grating at the Backside of a Photomask  

Oh, Yong-Ho (원광대학교 전기전자 및 정보공학부)
Go, Chun-Soo (원광대학교 자연과학부)
Lim, Sungwoo (원광대학교 자연과학부)
Lee, Jai-Cheol (원광대학교 전기전자 및 정보공학부)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.18, no.3, 2005 , pp. 212-215 More about this Journal
Abstract
Modified illumination techniques have been used to enhance the resolution of the sub-wavelength lithography. But, since they shield the central part of incident light, the light efficiency is seriously degraded, which in turn reduces the throughput of a lithography process. In this research, we introduced an annular illumination structure that enhances the light efficiency with a concentric circular grating at the backside of a photomask. The efficiency of the structure was theoretically analyzed.
Keywords
Modified illumination; Diffraction grating; Annular illumination; Quadrupole illumination; Deep submicron lithography;
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