Dishing and Erosion Evaluations of Tungsten CMP Slurry in the Orbital Polishing System |
Lee, Sang-Ho
(Division of Materials and Chemical Engineering, Hanyang University)
Kang, Young-Jae (Division of Materials and Chemical Engineering, Hanyang University) Park, Jin-Goo (Division of Materials and Chemical Engineering, Hanyang University) Kwon, Pan-Ki (CMP division, Doosan DND Co., Ltd.) Kim, Chang-Il (CMP division, Doosan DND Co., Ltd.) Oh, Chan-Kwon (CMP division, Doosan DND Co., Ltd.) Kim, Soo-Myoung (CMP division, Doosan DND Co., Ltd.) Jhon, Myung-S. (CMP division, Doosan DND Co., Ltd.) Hur, Se-An (Cabot Microelectronics Korea) Kim, Young-Jung (Cabot Microelectronics Korea) Kim, Bong-Ho (Cabot Microelectronics Korea) |
1 |
A. H. Liu, R. Solis, and J. Givens, 'Development of a robust |
2 | C. Yu, T. Myers, C. Streinz, S. Grumbine, and G. Grover, 'Tungsten polishing on an orbital plaform using cabot semi-sperse W2000 slurry', PACRIM Chemical Mechanical Planarization Symposium, Seoul, Korea, p. 31, 1997 |
3 |
S. H. Li, H. Banvillet, C. Augagneur, B. Miller, M. P. N. Henaff, and K. Wooldridge, 'Evaluation of |
4 | F. Kaufman, D. B. Thompson, R. E. Boradie, M. A. Jaso, W. L. Guthrie, D. J. Peason, and M. B. Small, 'Chemical mechanical polishing for fabrication W metal features as chip interconnects', J. Electrochem. Soc., Vol. 138, No. 11, p. 3460, 1991 DOI |
5 | G. S. Grover, H. Liang, S. Ganeshkumar, and W. Fortino, 'Effect of slurry viscosity modification on oxide and tungsten CMP', Wear, Vol. 214, Iss. 1, p. 10, 1998 DOI ScienceOn |
6 | E. A. Kneer, C. Raghunath, and S. Ragahavan, 'Electrochemistry of chemical vapor deposited tungsten films with relevance to chemical mechanical polishing, J. Electrochem. Soc., Vol. 143, No. 12, p. 4095, 1996 DOI |
7 | D. J. Stein, D. Hetherington, T. Guilinger, and J. L. Cecchi, 'In-situ electrochemical investigation of tungsten electrochemical behavior during chemical mechanical polishing', J. Electrochem. Soc., Vol. 145, No. 9,p. 3190, 1998 DOI |
8 | E. A. Kneer, C. Raghunath, V. Mathew, S. Ragahavan, and J. S. Jeon, 'Electrochemical measurements during the chemical mechanical polishing of tungsten thin films', J. Electrochem. Soc., Vol. 144, No.9, p. 3041, 1997 DOI |
![]() |