[KSCI] Korea Science Citation Index Service

http://dx.doi.org/10.4313/TEEM.2004.5.4.148

An Investigation of Locally Trapped Charge Distribution using the Charge Pumping Method in the Two-bit SONOS Cell

An, Ho-Myoung (Department of Semiconductor and New Materials Engineering, Kwangwoon University)
Lee, Myung-Shik (Department of Semiconductor and New Materials Engineering, Kwangwoon University)
Seo, Kwang-Yell (Department of Semiconductor and New Materials Engineering, Kwangwoon University)
Kim, Byung-Cheul (Department of Electronic Engineering, Jinju National University)
Kim, Joo-Yeon (School of Electricity and Electronics, Ulsan College)

Publication Information

Transactions on Electrical and Electronic Materials / v.5, no.4, 2004 , pp. 148-152 More about this Journal

Abstract

The direct lateral profile and retention characteristics of locally trapped-charges in the nitride layer of the two-bit polysilicon-oxide-nitride-oxide-silicon (SONOS) memory are investigated by using the charge pumping method. After charges injection at the drain junction region, the lateral diffusion of trapped charges as a function of retention time is directly shown by the results of the local threshold voltage and the trapped-charges quantities.

Keywords

SONOS; Flash memory; Charge pumping method; Locally trapped-charges; Two-bit storage;

Citations & Related Records

Reference

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