Browse > Article
http://dx.doi.org/10.5573/JSTS.2014.14.4.495

Effects of Electrostatic Discharge Stress on Current-Voltage and Reverse Recovery Time of Fast Power Diode  

Bouangeune, Daoheung (School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center (SPRC), Chonbuk National University)
Choi, Sang-Sik (R&D Division, Sigetronics, Inc.)
Cho, Deok-Ho (R&D Division, Sigetronics, Inc.)
Shim, Kyu-Hwan (School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center (SPRC), Chonbuk National University)
Chang, Sung-Yong (Power Integrity Group, Korea Electric Power Research Institute (KEPRI))
Leem, See-Jong (Department of Hydrogen Energy, Dongshin University)
Choi, Chel-Jong (School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center (SPRC), Chonbuk National University)
Publication Information
JSTS:Journal of Semiconductor Technology and Science / v.14, no.4, 2014 , pp. 495-502 More about this Journal
Abstract
Fast recovery diodes (FRDs) were developed using the $p^{{+}{+}}/n^-/n^{{+}{+}}$ epitaxial layers grown by low temperature epitaxy technology. We investigated the effect of electrostatic discharge (ESD) stresses on their electrical and switching properties using current-voltage (I-V) and reverse recovery time analyses. The FRDs presented a high breakdown voltage, >450 V, and a low reverse leakage current, < $10^{-9}$ A. From the temperature dependence of thermal activation energy, the reverse leakage current was dominated by thermal generation-recombination and diffusion, respectively, at low and high temperature regions. By virtue of the abrupt junction and the Pt drive-in for the controlling of carrier lifetime, the soft reverse recovery behavior could be obtained along with a well-controlled reverse recovery time of 21.12 ns. The FRDs exhibited excellent ESD robustness with negligible degradations in the I-V and the reverse recovery characteristics up to ${\pm}5.5$ kV of HBM and ${\pm}3.5$ kV of IEC61000-4-2 shocks. Likewise, transmission line pulse (TLP) analysis reveals that the FRDs can handle the maximum peak pulse current, $I_{pp,max}$, up to 30 A in the forward mode and down to - 24 A in the reverse mode. The robust ESD property can improve the long term reliability of various power applications such as automobile and switching mode power supply.
Keywords
ESD; IEC 61000-4-2; TLP; fast recovery diode; carrier transport mechanism;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
연도 인용수 순위
1 D. E. Houston, M. S. Adler, and E. D. Wolley, "measurement and analysis of charge distribution and their decay in fast switching power rectifiers," International Electron Devices Meeting. Vol.23, pp.308-312, 1977.
2 MSR1560-D, http://www.onsemi.com/pub/Collateral/MSR1560-D.PDF.
3 15eth06, http://www.irf.com/product-
4 info/datasheets/data/15eth06.pdf.
5 Ch. Wang, L. Yin, and Ch. Wang, "A Physics-Based Model for Fast Recovery Diodes with Lifetime Control and Emitter Efficiency Reduction," International Journal of Electronics and Electrical Engineering, Vol.6, pp.7-11 January, 2012.
6 S.M. Sze, and Kwok k. NG, Physic of semiconductor device, 3th Edition, John Wiley & Sons Inc., Canada, pp. 281-304, 2007.
7 A. Jahanzeb et al, " TLP characterization for testing system level ESD performance," EOS/ESD Symposium, pp.1-8, October, 2010.
8 G. Chen et al, "Sn enhanced TLP system for ESD characterization in semiconductor technologies," The 3rd ICCRD, pp.402-406, March, 2011.
9 S.C. Huang et al, "Circuit and silicide impact on the correlation between TLP and ESD (HBM and MM)," IEEE International Integrated Reliability Workshop Final Report, pp.169-172, October, 2004.
10 S H. Voldman et al, "Standardization of the transmission line pulse (TLP) methodology for electrostatic discharge (ESD)," EOS/ESD Symposium, pp.1-10, September, 2003.
11 M. T. Rahimo, and N. Y, A Shammas, "Reverse recovery failure modes in modern fast recovery diodes," International Conference on Microelectronic, Vol.2, pp.659-662, May, 2000.
12 M. Diatta et al, "Understanding the failure mechanisms of protection diodes during system level ESD: toward repetitive stress robustness", IEEE Trans. Electron Devices. Vol.59, pp.108-113, January, 2012   DOI   ScienceOn
13 R. Wu, F. Blaabjerg, H. Wang, and M. Liserre, "Overview of catastrophic failures of freewheeling diodes in power electronic circuits" Microelectron. Reliab., Vol.53, pp.1788-1792, August, 2013.   DOI   ScienceOn
14 M. T. Rahimo, and N. Y. A. Shammas, "Freewheeling diode reverse-recovery failure modes in IGBT applications," IEEE Trans. Ind. Appl., Vol.37, pp.661-670, Mar, 2001.   DOI   ScienceOn
15 A. Amerasekera , Ch. Duvvury, W. Anderson, H. Gieser, and S. Ramaswamy, ESD in Silicon Integrated Circuits, Second Edition, John Wiley & Sons, Ltd., England, 2002.
16 J. Cambieri et al, "ESD induced leakage current increase of diffusion diodes," Proceeding of the 34th EOS/ESD Symposium, pp.1-6, September, 2012.
17 F. Ch. Hou, G. Bosman, E. Simoen, J. Vanhellemont, and C. Claeys , IEEE Trans. Electron Devices. 45 (1998) 2528 - 2536.   DOI   ScienceOn
18 M. Miller, "Differences between Platinum- and gold-doped silicon power devices," IEEE Trans. Electron Devices ED. Vol.23, pp.1279-1283, December, 1976.   DOI   ScienceOn
19 S. S. Choi, D. H. Cho and K. H. Shim, "Development of Transient Voltage Suppressor Device with Abrupt Junctions Embedded by Epitaxial Growth Technology," Electron. Mater. Lett. Vol.5, NO.2, pp. 59-62, June, 2009.   과학기술학회마을   DOI   ScienceOn
20 D. Bouangeune et al, "Effect of electrostatic discharge on electrical properties of bidirectional TVS Zener diode with abrupt junction," Materials Transactions. Vol.54, pp.2125-2130, October, 2013.   DOI   ScienceOn
21 D. Bouangeune, et al, "ESD robustness of lowvoltage/ high-speed TVS devices with epitaxial grown films," Proc. Of The 1st IEEE GCCE, pp.189-192, Oct., 2012.