Mechanism and Application of NMOS Leakage with Intra-Well Isolation Breakdown by Voltage Contrast Detection |
Chen, Hunglin
(The State Key Laboratory of ASIC & System, Department of Microelectronics, Fudan University)
Fan, Rongwei (Shanghai Huali Microelectronics Corporation) Lou, Hsiaochi (The State Key Laboratory of ASIC & System, Department of Microelectronics, Fudan University) Kuo, Mingsheng (The State Key Laboratory of ASIC & System, Department of Microelectronics, Fudan University) Huang, Yiping (The State Key Laboratory of ASIC & System, Department of Microelectronics, Fudan University) |
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