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http://dx.doi.org/10.5573/JSTS.2013.13.2.139

An Accurate Gate-level Stress Estimation for NBTI  

Han, Sangwoo (Department of Computer Science Engineering, Sogang University)
Lee, Junho (Department of Computer Science Engineering, Sogang University)
Kim, Byung-Su (Samsung Electronics Co. Ltd.)
Kim, Juho (Department of Computer Science Engineering, Sogang University)
Publication Information
JSTS:Journal of Semiconductor Technology and Science / v.13, no.2, 2013 , pp. 139-144 More about this Journal
Abstract
Negative bias temperature instability (NBTI) has become a major factor determining circuit reliability. The effect of the NBTI on the circuit performance depends on the duty cycle which represents the stress and recovery conditions of each device in a circuit. In this paper, we propose an analytical model to perform more accurate duty cycle estimation at the gate-level. The proposed model allows accurate (average error rate: 3%) computation of the duty cycle without the need for expensive transistor-level simulations Furthermore, our model estimates the waveforms at each node, allowing various aging effects to be applied for a reliable gate-level circuit aging analysis framework.
Keywords
NBTI; reliability; circuit aging;
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