Improvement of Thermal Stability of Ni-Silicide Using Vacuum Annealing on Boron Cluster Implanted Ultra Shallow Source/Drain for Nano-Scale CMOSFETs
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Shin, Hong-Sik
(Dep. EE., Chungnam National University)
Oh, Se-Kyung (Dep. EE., Chungnam National University) Kang, Min-Ho (Dep. EE., Chungnam National University) Lee, Ga-Won (Dep. EE., Chungnam National University) Lee, Hi-Deok (Dep. EE., Chungnam National University) |
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