A Reproducible High Etch Rate ICP Process for Etching of Via-Hole Grounds in 200μm Thick GaAs MMICs |
Rawal, D.S.
(Solid State Physics Laboratory)
Agarwal, Vanita R. (Solid State Physics Laboratory) Sharma, H.S. (Solid State Physics Laboratory) Sehgal, B.K. (Solid State Physics Laboratory) Muralidharan, R. (Solid State Physics Laboratory) |
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