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Electrical Characteristics of InAlAs/InGaAs/InAlAs Pseudomorphic High Electron Mobility Transistors under Sub-Bandgap Photonic Excitation  

Kim, H.T. (School of Electrical Engineering, Kookmin University)
Kim, D.M. (School of Electrical Engineering, Kookmin University)
Publication Information
JSTS:Journal of Semiconductor Technology and Science / v.3, no.3, 2003 , pp. 145-152 More about this Journal
Abstract
Electrical gate and drain characteristics of double heterostructure InAlAs/InGaAs pseudomorphic HEMTs have been investigated under sub-bandgap photonic excitation ($hv, and optical power($P_{opt}$)-dependent variation of the abnormal gate leakage current and associated physical mechanisms in the PHEMTs have been characterized. Peak gate voltage ($V_{GS,P}$) and the onset voltage for the impact ionization ($V_{GS.II}$) have been extracted and empirical model for their dependence on the $V_{DS}$ and $P_{opt} have been proposed. Anomalous gate and drain current, both under dark and under sub-bandgap photonic excitation, have been modeled as a parallel connection of high performance PHEMT with a poor satellite FET as a parasitic channel. Sub-bandgap photonic characterization, as a function of the optical power with $h\nu=0.799eV$, has been comparatively combined with those under dark condition for characterizing the bell-shaped negative humps in the gate current and subthreshold drain leakage under a large drain bias.
Keywords
HEMT; HFET; gate current; physical mechanism; resonant tunneling; real space transfer; positive hump;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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1 D.-H. Kim, S.-J. Kim, Y.-H. Kim, S.-W. Kim, and K.-S. Seo, '40nm InGaAs HEMT's with 65% strained channel fabricated with damage-free $SiO_2/SiN_x$ side-wall gate process,' J. Semiconductor Tech. and Science, Vol.3, pp.27-32, 2003
2 C.-L. Wu and W.-C. Hsu, 'Enhanced resonant tunneling real-space transfer in ${\delta}-doped$ GaAs/InGaAs gated dualchannel transistors grown by MOCVD,' IEEE Trans. Electron Devices, Vol. 43, pp. 207-212, Feb. 1996   DOI   ScienceOn
3 Y. C. Chou, G. P. Li, Y. C. Chen, C.S. Wu, K.K. Yu, and T. A. Midford, 'Off-state breakdown effects on gate leakage current in power pseudomorphic AlGaAs/InGaAs HEMTs,' IEEE Electron Device Lett., Vol.18, pp. 479-481, Oct. 1996   DOI   ScienceOn
4 M. H. Somerville, J. A. del Alamo, and P. Saunier, 'Offstate breakdown in power pHEMTs: the impact of the source,' IEEE Trans. Electron Devices, Vol. 45, pp. 1883-1889, Sept. 1998   DOI   ScienceOn
5 B. Georgescu, M.A. Py, A. Souifi, and G. Guilot, 'New aspects and mechanism of kink effect in InAlAs/InGaAs/InP inverted HFET's,' IEEE Electron Device Lett., Vol. 19, pp.154-156, May 1998   DOI   ScienceOn
6 N. Labat, N. Saysset, A. Touboul, Y. Danto, P. Cova and F. Fantini, 'Analysis of hot electron degradations in pseudomorphic HEMTs by DCTS and LF noise characterization,' Microelectronics Reliability, Vol.37, pp. 1675-1678, Oct. 1997   DOI   ScienceOn
7 D.-H. Kim, S.-W. Kim, S.-C. Hong, S.-W. Paek, J.-H. Lee, K.-W. Jung, and K.-S. Seo, 'fabrication and characterization of $0.2{\mu}m$ InAlAs/InGaAs M-HEMT's with inverse step-graded InAlAs buffer on GaAs substrate,' J. Semiconductor Tech. and Science, Vol.1, pp.111-115, 2001   과학기술학회마을
8 S. Takatani, H. Matsumoto, J. Shigeta, K. Ohshika, T. Yamashita, and M. Fukui, 'Generation mechanism of gate leakage current due to reverse-voltage stress i-AlGaAs/n-GaAs HIGFET's,' IEEE Trans. Electron Devices, Vol. 45, pp.14-20, Jan. 1998   DOI   ScienceOn
9 S. Takamiya, M. Harayama, T. Sugimura, T. Tsuzuku, T. Taya, K. Iiyama, and S. Hashimoto, 'Reverse currents of Schottky gates of III-V MESFET/HEMTS: field emission and tunnel currents,' Solid-State Electronics, Vol. 42, pp. 447-451, March 1998   DOI   ScienceOn
10 R. Menozzi, 'Hot electron effects and degradation of GaAs and InP HEMTs for microwave and millimetrewave applications,' Semiconductor Science Technology, Vol. 13, pp. 1053-1063, Oct. 1998   DOI   ScienceOn
11 G. Meneghesso, A. Neviani, R. Oesterholt, M. Matloubian, T. Liu, J.J. Brown, C. Canali, and E. Zanoni, 'On-state and off-state breakdown in GaInAs/InP composite-channel HEMT's with variable GaInAs channel thickness,' IEEE Trans. Electron Devices, Vol. 46, pp.2-9, Jan. 1999   DOI   ScienceOn
12 R.T. Webster, S. Wu, and A.F.M. Anwar, 'Impact ionization in InAlAs/InGaAs/InAlAs HEMT's,' IEEE Electron Device Lett., Vol.21, pp.193-195, May 2000   DOI   ScienceOn
13 S. Maruno, Y. Abe, T. Ozeki, T. Nakamoto, and N. Yoshida, 'Isothermal capacitance transient spectroscopy of pseudomorphic high-electron-mobility transistors,' Appl. Phys. Lett., Vol. 82, pp. 3339-3341, May 2003   DOI   ScienceOn
14 S.D. Cho, H.T. Kim, and D.M. Kim, 'Physical mechanisms on the abnormal gate leakage currents in pseudomorphic high electron mobility transistors,' IEEE Trans. Electron Devices, Vol.50, no.4, pp.1148-1152, April 2003   DOI   ScienceOn