Fe- and V-doped titanium dioxide nanoparticles consisting of spherical primary nanoparticles were synthesized from a mixed liquid precursor by using the flame spray pyrolysis. The effects of dopant concentration on the powder properties such as morphology, crystal structure, and light adsorption were analyzed by TEM, XRD, and UV-Vis spectrophotometer, respectively. As the V/Ti molar ratio increased, pure anatase particles were synthesized. On the contrary, rutile phase particles were synthesized as the Fe/Ti ratio increased. Photocatalytic property of as-prepared $TiO_2:Fe,V$ nanoparticles was investigated by measuring the removal efficiency for volatile organic compounds (VOCs) under the irradiation of visible light. After 2 hrs under visible light, the removal efficiencies of benzene, p-xylene, ethylbenzene, and toluene were reached to 21.9%, 21.4%, 19.8% and 17.6% respectively.

Pressure drop and particle removal efficiency of two commercial fibrous medium filters were measured with 20~1,000 nm sized aerosolized KCl particles. Pressure drop and particle removal efficiency were also theoretically predicted and the results qualitatively agreed with the experimental data. For this given particle removal efficiency, a filter design method for obtaining minimum pressure drop (and therefore minimum fan power) was suggested in this study by selecting solidity and fiber diameter as parameters. Therefore, by carrying out theoretical and experimental approaches together, this paper introduced a way of finding conditions for low pressure drop and high performance of a fibrous filter, especially if the filter would be used in mechanical ventilation system.

Particle deposition on a semiconductor wafer larger than 100 mm was studied experimentally and numerically. Particularly the electrostatic effect on particle deposition velocity was investigated. The experimental apparatus consisted of a particle generation system, a particle deposition chamber and a wafer surface scanner. Experimental data of particle deposition velocity were obtained for a semiconductor wafer of 200 mm diameter with the applied voltage of 5,000 V and PSL particles of the sizes between 83 and 495 nm. The experimental data of particle deposition velocity were compared with the present numerical results and the existing experimental data for a 100 mm wafer by Ye et al. (1991) and Opiolka et al. (1994). The present numerical method took into consideration the particle transport mechanisms of convection, Brownian diffusion, gravitational settling and electrostatic attraction in an Eulerian frame of reference. Based on the comparison of the present experimental and numerical results with the existing experimental results the present experimental method for a 200 mm semiconductor wafer was found to be able to present reasonable data.