Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
권호 표지

CF4/O2/Ar Plasma Resistance of Al2O3 Free Multi-components Glasses

Al2O3 Free 다성분계 유리의 CF4/O2/Ar 내플라즈마 특성

  • Min, Kyung Won (Korea Institute of Ceramic Engineering and Technology) ;
  • Choi, Jae Ho (Korea Institute of Ceramic Engineering and Technology) ;
  • Jung, YoonSung (Korea Institute of Ceramic Engineering and Technology) ;
  • Im, Won Bin (Division of Materials Science and Engineering, Hanyang University) ;
  • Kim, Hyeong-Jun (Korea Institute of Ceramic Engineering and Technology)
  • Received : 2022.09.01
  • Accepted : 2022.09.19
  • Published : 2022.09.30
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Abstract

The plasma resistance of multi-component glasses containing La, Gd, Ti, Zn, Y, Zr, Nb, and Ta was analyzed in this study. The plasma etching was performed via inductively coupled plasma-reactive ion etching (ICP-RIE) using CF4/O2/Ar mixed gas. After the reaction, the glass with a low fluoride sublimation temperature and high content of P, Si, and Ti elements showed a high etching rate. On the other hand, the glass containing a high fluoride sublimation temperature component such as Ca, La, Gd, Y, and Zr exhibited high plasma resistance because the etch rate was lower than that of sapphire. Glass with low plasma resistance increased surface roughness after etching or nanoholes were formed on the surface, but glass with high plasma resistance showed little change in surface microstructure. Thus, the results of this study demonstrate the potential for the development of plasma-resistant glasses (PRGs) with other compositions besides alumino-silicate glasses, which are conventionally referred to as plasma-resistant glasses.

Keywords

Acknowledgement

이 논문은 한국연구재단(NRF)[NRF-2020M3H4A3106001]으로부터 지원을 받아 연구되었습니다.

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