Journal of the Korea Organic Resources Recycling Association (유기물자원화)

Korea Organic Resources Recycling Association (유기성자원학회)
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Synthesis of Sludge Waste-derived Semiconductor Grade Uniform Colloidal Silica Nanoparticles and Their CMP Application

슬러지 폐기물을 활용한 반도체급 균일한 콜로이달 실리카 나노입자의 제조 및 CMP 응용

  • Kim, Dong Hyun (Department of Chemical and Biological Engineering, Hanbat National University) ;
  • Kim, Jiwon (Department of Chemical and Biological Engineering, Hanbat National University) ;
  • Jekal, Suk (Department of Chemical and Biological Engineering, Hanbat National University) ;
  • Kim, Min Jeong (Department of Chemical and Biological Engineering, Hanbat National University) ;
  • Kim, Ha-Yeong (Department of Chemical and Biological Engineering, Hanbat National University) ;
  • Kim, Min Sang (Department of Chemical and Biological Engineering, Hanbat National University) ;
  • Kim, Sang-Chun (Xentech Company) ;
  • Park, Seon-Young (Xentech Company) ;
  • Yoon, Chang-Min (Department of Chemical and Biological Engineering, Hanbat National University)
  • 김동현 (한밭대학교 화학생명공학과) ;
  • 김지원 (한밭대학교 화학생명공학과) ;
  • 제갈석 (한밭대학교 화학생명공학과) ;
  • 김민정 (한밭대학교 화학생명공학과) ;
  • 김하영 (한밭대학교 화학생명공학과) ;
  • 김민상 (한밭대학교 화학생명공학과) ;
  • 김상춘 ((주)젠텍) ;
  • 박선영 ((주)젠텍) ;
  • 윤창민 (한밭대학교 화학생명공학과)
  • Received : 2022.08.01
  • Accepted : 2022.08.18
  • Published : 2022.09.30
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Abstract

This study suggests the effective recycling method of sludge waste from various industrial fields to synthesize uniform colloidal silica nanoparticles. In detail, polymers are removed from the sludge waste to attain sludge-extracted silica (s-SiO2) micron-sized particles, and ammonia assisted sonication is applied to s-SiO2, which has effectively extracted the silanol precursor. The nano-sized silica (n-SiO2) particles are successfully synthesized by a typical sol-gel method using silanol precursor. Also, the yield amounts of n-SiO2 are determined by the function of s-SiO2 etching time. Finally, n-SiO2-based slurry is synthesized for the practical CMP application. As a result, rough-surfaced semiconductor chip is successfully polished by the n-SiO2-based slurry to exhibit the mirror-like clean surface. In this regard, sludge wastes are successfully prepared as valuable semicondutor grade materials.

본 연구에서는 반도체를 포함한 다양한 산업 분야에서 발생하는 슬러지 폐기물을 활용하여 고부가 가치의 균일한 콜로이달 실리카 나노입자를 제조하고자 하였다. 상세히는 슬러지 폐기물에서 고분자를 용해하여 추출한 실리카(s-SiO2)를 분리하였고, 암모니아와 소니케이터를 활용한 에칭을 통해 실라놀 전구체를 추출하였다. 실라놀 전구체를 활용하여 졸-겔법으로 균일한 약 50nm 크기의 실리카 나노입자(n-SiO2)를 성공적으로 합성되었음을 확인할 수 있었다. 또한, s-SiO2의 에칭 시간에 따른 n-SiO2의 수득량을 확인하였으며, 8시간의 에칭 시간에서 가장 많은 n-SiO2가 제조되는 것을 확인할 수 있었다. 최종적으로 n-SiO2를 기반으로 한 CMP용 슬러리를 제조하여, 반도체 칩의 연마에 활용하였다. 그 결과, 반도체 칩의 표면에 존재하던 빗살 무늬의 데미지들이 성공적으로 제거되었으며, 이를 통해 슬러지 폐기물에서 고부가 가치의 반도체 급 n-SiO2 소재가 성공적으로 제조되었음을 확인할 수 있었다.

Keywords

Acknowledgement

본 연구는 2022년도 중소벤처기업부의 기술개발사업 지원에 의한 연구임 (S3247610)

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