RF Impedance Matching Algorithm Using Phase Detector

임피던스 정합장치 내 위상센서를 이용한 RF정합 알고리즘 연구

  • Kim, Hwanggyu (Department of Electronics Engineering, Myongji University) ;
  • Yang, Jinwoo (Department of Electronics Engineering, Myongji University) ;
  • Kang, Sukho (Department of Information and Communication Engineering, Myongji University) ;
  • Choi, Daeho (Department of Electronics Engineering, Myongji University) ;
  • Hong, Sang Jeen (Department of Electronics Engineering, Myongji University)
  • 김황규 (명지대학교 전자공학과) ;
  • 양진우 (명지대학교 전자공학과) ;
  • 강석호 (명지대학교 정보통신공학과) ;
  • 최대호 (명지대학교 전자공학과) ;
  • 홍상진 (명지대학교 전자공학과)
  • Received : 2022.05.23
  • Accepted : 2022.06.22
  • Published : 2022.06.30

Abstract

As semiconductors become finer, equipment must perform precise and accurate processes to achieve the desired wafer fabrication requirement. Radio frequency power delivery system in plasma system plays a critical role to generate the plasma, and the role of impedance matching unit is critical to terminate the reflected radio frequency power by modifying the impedance of the matching network in the plasma equipment. Impedance matching unit contains one fixed inductor and two variable vacuum capacitors whose positions are controlled two step motors. Controlling the amount of vacuum variable capacitor should be made as soon as possible when the mismatched impedance is detected. In this paper, we present the impedance matching algorithm using the phase sensor.

Keywords

Acknowledgement

본 연구는 반도체전공트랙사업의 지원으로 수행된학부생 산학프로젝트 연구결과이며, 산업계 멘토 코멧테크놀로지스코리아(주)의 홍보한 상무님과 사업단 전대식 교수님에게 감사드립니다.

References

  1. H. Y. Jang, "Semiconductor/Display Manufacturing Process Plasma Foundation and Application", The Korean Information Display Society, Vol. 12, No. 5, pp. 2-15, 2011.
  2. K. H. Jang, "A Study on the Implementation of 13.56 MHz Automatic Impedance Matching Circuit", Master's Thesis, Kwangwoon University, 2014.
  3. W. J. Jang, I. S. Yeo, J. W. Lee, T. S. Jang, S. W. Gu, B. I. Lee, D. G. Choi, N. J. Kim, S. D. Choi, I. Y. Lee, S. I, Wee, and D. C. Kim, "13.56MHz RF Generator and Auto Matching System", Interim Report of the First Year of the Ministry of Trade and Industry, pp. 8-11, 1996.
  4. K. H. Jang, S. Y. Park, J. J. Cho, and D.-H. Lee "Error Rate Enhancement Algorithm for 13.56 MHz Impedance Automatic Matching System", J. Kor. Inst. Electromagnetic Eng. Sci., Vol. 29, No. 7, pp. 55-60, 2020.
  5. I. P. Hong, "Microwave Engineering Understood by Principles", Hanbit Academy, 2015.
  6. D. Y. Jeong, C. W. Nam, J. H. Lee, D. G. Choi, and C. Y. Won, "CCP-ICP Composite Impedance Matching Device for Improving Uniformity of Semiconductor Plasma Etching System", The Korean Institute of Power Electronics, Vol. 15, No. 4, pp. 274-277, 2010. https://doi.org/10.6113/TKPE.2010.15.4.274
  7. J. H. Lee, H. K. Park, J. S. Lee, and S. J. Hong, "Understanding of RF Impedance Matching System Using VI-Probe", Journal of the Semiconductor & Display Technology, Vol. 19, No. 3, pp. 43-48, 2020.
  8. W. S. Kang, "A Study on the Double Impedance Matching Technique for Improving the Efficiency of RF Systems with Variable Impedance", Ph.D. Thesis, Konkuk University, 2018.
  9. D. G. Choi and C. Y. Won, "Automatic Matching Circuit for Plasma Generation", The Korean Institute of Power Electronics, Vol. 7, No. 1, pp.16-20, 2002.
  10. D. G. Choi and W. J. Jang, "Plasma Generator & Auto Matching Network", Journal of the Korean Institute of Illuminating and Electrical Installation Engineers 1995 Autumn Conference, pp. 60-63, 1995.
  11. S. D. Choi, "RF Generator", The Transactions of Korean Institute of Power Electronics, Vol 7, No. 1, pp. 12-15, 2002.