Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
권호 표지

Effects of Fluorine Addition on Thermal Properties and Plasma Resistance of MgO-Al2O3-SiO2 Glass

MgO-Al2O3-SiO2계 유리 열물성 및 내플라즈마 특성에 대한 Fluorine 첨가의 영향

  • Yoon, Ji Sob (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Choi, Jae Ho (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Jung, YoonSung (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Min, Kyung Won (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Kim, Hyeong-Jun (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
  • Received : 2022.03.10
  • Accepted : 2022.03.18
  • Published : 2022.03.31
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Abstract

MAS-based glass, which has been studied to replace the ceramic material used in the plasma etching chamber, has problems such as forming and processing due to its high melting temperature. To solve this problem, in this study, fluoride was added to the existing MAS-based glass to increase the workability in the glass manufacturing and to improve the chemical resistance to CF4/Ar/O2 plasma gas. Through RAMAN analysis, the structural change of the glass according to the addition of fluoride was observed. In addition, it was confirmed that high-temperature viscosity and thermal properties decreased as the fluoride content increased and plasma resistance was maintained, it showed an excellent etching rate of up to 11 times compared to quartz glass.

Keywords

Acknowledgement

이 논문은 중소벤처기업부가 후원하는 한국연구재단(NRF)[NRF-2020M3H4A3106001]으로부터 지원을 받아 연구되었습니다.

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