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Effects of Fluorine Addition on Thermal Properties and Plasma Resistance of MgO-Al2O3-SiO2 Glass  

Yoon, Ji Sob (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Choi, Jae Ho (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Jung, YoonSung (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Min, Kyung Won (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Kim, Hyeong-Jun (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Publication Information
Journal of the Semiconductor & Display Technology / v.21, no.1, 2022 , pp. 119-126 More about this Journal
Abstract
MAS-based glass, which has been studied to replace the ceramic material used in the plasma etching chamber, has problems such as forming and processing due to its high melting temperature. To solve this problem, in this study, fluoride was added to the existing MAS-based glass to increase the workability in the glass manufacturing and to improve the chemical resistance to CF4/Ar/O2 plasma gas. Through RAMAN analysis, the structural change of the glass according to the addition of fluoride was observed. In addition, it was confirmed that high-temperature viscosity and thermal properties decreased as the fluoride content increased and plasma resistance was maintained, it showed an excellent etching rate of up to 11 times compared to quartz glass.
Keywords
Plasma etching; Plasma resistant; Fluoride glass; Alkaline earth glass;
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Times Cited By KSCI : 1  (Citation Analysis)
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