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Effects of Transfer Gate on the Photocurrent Characteristics of Gate/Body-Tied MOSFET-Type Photodetector

  • Jang, Juneyoung (School of Electronic and Electrical Engineering, Kyungpook National Unversity) ;
  • Seo, Sang-Ho (Korea Polytechnic Robot Campus) ;
  • Kong, Jaesung (Korea Polytechnic Robot Campus) ;
  • Shin, Jang-Kyoo (School of Electronic and Electrical Engineering, Kyungpook National Unversity)
  • Received : 2022.01.20
  • Accepted : 2022.01.28
  • Published : 2022.01.31

Abstract

In this study, we studied the effects of transfer gate on the photocurrent characteristics of gate/body-tied (GBT) metal-oxide semiconductor field-effect transistor (MOSFET)-type photodetector. The GBT MOSFET-type photodetector has high sensitivity owing to the amplifying characteristic of the photocurrent generated by light. The transfer gate controls the flow of photocurrent by controlling the barrier to holes, thereby varying the sensitivity of the photodetector. The presented GBT MOSFET-type photodetector using a built-in transfer gate was designed and fabricated via a 0.18-㎛ standard complementary metal-oxide-semiconductor (CMOS) process. Using a laser diode, the photocurrent was measured according to the wavelength of the incident light by adjusting the voltage of the transfer gate. Variable sensitivity of the presented GBT MOSFET-type photodetector was experimentally confirmed by adjusting the transfer gate voltage in the range of 405 nm to 980 nm.

Keywords

Acknowledgement

This research was supported by the Samsung Electronics Company, Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education (2018R1D1A3B0704995213), and the Integrated Circuit Design Education Center (IDEC) in Korea, and we are grateful for these supports.

References

  1. E. R. Fossum and S. Member, "CMOS Image Sensors : Electronic Camera-On-A-Chip", IEEE Trans. Electron. Devices, Vol. 44, No. 10, pp. 1689-1698, 1997. https://doi.org/10.1109/16.628824
  2. S. Mehta, A. Patel, and J. Mehta, "CCD or CMOS Image sensor for photography", 2015 Int. Conf. Commun. Signal Process. ICCSP 2015, pp. 291-294, Melmaruvathur, India, 2015.
  3. B. S. Carlson, "Comparison of Modern CCD and CMOS Image Sensor Technologies and Systems for Low Resolution Imaging", Proc. IEEE Sens., Vol. 1, No. 1, pp. 171-176, 2002. https://doi.org/10.1109/ICSENS.2002.1037011
  4. M. Bigas, E. Cabruja, J. Forest, and J. Salvi, "Review of CMOS image sensors", Microelectron. J., Vol. 37, No. 5, pp. 433-451, 2006. https://doi.org/10.1016/j.mejo.2005.07.002
  5. B. Luo, L. Yan, and F. Yang, "Research of noise suppression for CMOS image sensor", 2010 Int. Conf. Meas. Technol. Mechatron. Autom. ICMTMA 2010, Vol. 2, pp. 1100-1103, Changsha City, China, 2010.
  6. J. Lee, B. S. Choi, D. Seong, J. Lee, S. H. Kim, J. Lee, J.-K. Shin, and P. Choi "CMOS Binary Image Sensor with Gate/Body-Tied PMOSFET-Type Photodetector for Low-Power and Low-Noise Operation," J. Sens. Sci. Technol., Vol. 27, No. 6, pp. 362-367, 2018. https://doi.org/10.5369/JSST.2018.27.6.362
  7. H. Kwen, S. H. Kim, J. Lee, P. Choi, and J.-K. Shin, "Simulation of High-Speed and Low-Power CMOS Binary Image Sensor Based on Gate/Body-Tied PMOSFET-Type Photodetector Using Double-Tail Comparator," J. Sens. Sci. Technol., Vol. 29, No. 2, pp. 82-88, 2020. https://doi.org/10.5369/JSST.2020.29.2.82
  8. H. Alaibakhsh and M. A. Karami, "Analytical Modeling of Pinning Process in Pinned Photodiodes", IEEE Trans. Electron. Devices, Vol. 65, No. 10, pp. 4262-4368, 2018.
  9. J. H. Park, H. Kim, I. S. Wang, and J. K. Shin, "Quantumwired MOSFET photodetector fabricated by conventional photolithography on SOI substrate", 2004 4th IEEE Conf. Nanotechnol., pp. 425-427, Munich, Germany, 2004.
  10. E. R. Fossum and D. B. Hondongwa, "A review of the pinned photodiode for CCD and CMOS image sensors", IEEE J. Electron. Devices Soc., Vol. 2, No. 3, pp. 33-43, 2014. https://doi.org/10.1109/JEDS.2014.2306412
  11. L. A. P. Santos, G. G. Araujo, F. L. Oliveira, E. F. Silva, and M. A. P. Santos, "An alternative method for using bipolar junction transistors as a radiation dosimetry detector in breast cancer treatment", Radiat. Meas., Vol. 71, pp. 407-411, 2014. https://doi.org/10.1016/j.radmeas.2014.08.003
  12. W. Zhang and M. Chan, "A high gain N-Well/Gate tied PMOSFET image sensor fabricated from a standard CMOS process", IEEE Trans. Electron Devices, Vol. 48, No. 6, pp. 1097-1102, 2001. https://doi.org/10.1109/16.925233
  13. S. H. Kim, H. Kwen, J. Jang, Y. M. Kim, and J. K. Shin, "2500 fps High-Speed Binary CMOS Image Sensor Using Gate/Body-Tied Type High-Sensitivity Photodetector," J. Sens. Sci. Technol., Vol. 30, No. 1, pp. 61-65, 2021. https://doi.org/10.46670/JSST.2021.30.1.61
  14. J. Jang, W. Heo, J. Kong, Y. M. Kim, and J. K. Shin, "CMOS binary image sensor with high-sensitivity metal-oxide semiconductor field-effect transistor-type photodetector for high-speed imaging," J. Sens. Sci. Technol., Vol. 30, No. 5, pp. 295-299, 2021. https://doi.org/10.46670/JSST.2021.30.5.295
  15. J. Jang, J. Lee, H. Kwen, S. H. Seo, P. Choi, and J. K. Shin, "Adjusting the Sensitivity of an Active Pixel Sensor Using a Gate/Body-Tied P-Channel Metal-Oxide Semiconductor Field-Effect Transistor-Type Photodetector With a Transfer Gate," J. Sens. Sci. Technol., Vol. 30, No. 2, pp. 114-118, 2021. https://doi.org/10.46670/JSST.2021.30.2.114
  16. S. H. Seo, K. D. Kim, M. W. Seo, J. S. Kong, J. K. Shin, and P. Choi, "Optical characteristics of an N-Well/gate-tied PMOSFET-type photodetector with built-in transfer gate for CMOS image sensor", Sens. Mater., Vol. 19, No. 7, pp. 435-444, 2007.