참고문헌
- W. J. Choi, E. H. Choi, H. S. Sung, J. G. Kwon, and S. E. Lee, J. Korean Inst. Electr. Electron. Mater. Eng., 32, 320 (2019). [DOI: https://doi.org/10.4313/JKEM.2019.32.4.320]
- I. H. Won, S. K. Kang, J. Y. Sim, and J. K. Lee, IEEE Trans. Plasma Sci., 42, 2788 (2014). [DOI: https://doi.org/10.1109/tps.2014.2320266]
- K. H. Song, Y. S. Ko, and W. C. Lee, J. Korean Inst. Electr. Electron. Mater. Eng., 9, 1427 (2014). [DOI: https://doi.org/10.13067/jkiecs.2014.9.12.1427]
- H. H. Son, Appl. Chem. Eng., 22, 261 (2011).
- W. Y. Lee, D. J. Jin, Y. J. Kim, G. H. Han, H. K. Yu, H. C. Kim, S. W. Jin, J. H. Koo, D. Y. Kim, and G. Cho, J. Korean Vac. Soc., 22, 111 (2013). [DOI: https://doi.org/10.5757/JKVS.2013.22.3.111]
- J. H. Byeon, J. H. Hwang, J. H. Ji, and S. H. Kang, Trans. Korean Soc. Mech. Eng., B27, 524 (2003). [DOI: https://doi.org/10.3795/KSME-B.2003.27.4.524]
- B. K. Koo, Y. C. Kim, M. G. Jang, J. H. Kim, J. Y. Park, and S. B. Han, J. Korean Inst. Illum. Electr. Install. Eng., 25, 116 (2011). [DOI: https://doi.org/10.5207/JIEIE.2011.25.10.116]
- J. M. Tatibouët, S. Valange, and H. Touati, Appl. Catal., A, 569, 126 (2019). [DOI: https://doi.org/10.1016/j.apcata.2018.10.026]
- I. Jang and Y. Shin, The Korean Society of Mechanical Engineers (2013) p. 403.
- S. B. Han, J. Y. Park, and S. H. Park, J. Korean Inst. Illum. Electr. Install. Eng., 22, 142 (2008). [DOI: https://doi.org/10.5207/JIEIE.2008.22.12.142]
- S. B. Han, Trans. Korean Inst. Elect. Eng., 59, 932 (2010). [DOI: https://doi.org/10.5370/KIEE.2010.59.5.932]
- M. Yamaguma and J. W. Choi, J. Korean Soc. Saf., 15, 92 (2000).
- M. Seo, M. Lee, S. Lee, S. Cho, and S. Uhm, Appl. Chem. Eng., 28, 193 (2017). [DOI: https://doi.org/10.14478/ace.2016.1130]