Journal of the Microelectronics and Packaging Society (마이크로전자및패키징학회지)

The Korean Microelectronics and Packaging Society (한국마이크로전자및패키징학회)
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Suppressed Sheet Resistance of Ag Nanostructure Films by O2 Plasma Treatment

O2 플라즈마 처리를 통한 Ag 나노구조체 필름의 면저항 저감

  • Kim, Wonkyung (Department of Materials Science and Engineering, Yonsei University) ;
  • Roh, Jong Wook (School of Nano & Materials Science and Engineering, Kyungpook National University)
  • 김원경 (연세대학교 신소재공학과) ;
  • 노종욱 (경북대학교 나노소재공학부)
  • Received : 2019.06.18
  • Accepted : 2019.09.06
  • Published : 2019.09.30
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Abstract

Sheet resistance reduction in the Ag nanowire (NW) coated films is accomplished with slight improvement of optical properties for the application of transparent conducting electrodes by using $O_2$ plasma treatment. The sheet resistance was optimized after 30 seconds $O_2$ plasma treatment, showing the 27 % of maximum decrease of sheet resistance. It is found that the $O_2$ plasma treatment get rid of the residual organic materials at the junction of Ag NWs. However, the Ag NWs may be also snapped by the excessive $O_2$ plasma treatment can showing the collapses of Ag NWs networks. Furthermore, the optical properties such as optical transmittance and haze were monotonically improved with the $O_2$ plasma treatment time until 90 seconds.

Ag나노와이어 도전성 잉크를 플렉서블한 투명 기판 위에 코팅 후 이러한 여분의 유기물을 $O_2$ 플라즈마를 이용하여 제거함으로써 Ag 나노와이어를 이용한 투명전극의 면저항과 광학적 특성을 최적화하였다. Ag 나노와이어 도전성 잉크를 코팅한 후 30초간 $O_2$ 플라즈마 처리를 하였을 때 면저항은 최대 27 % 정도 감소하였으며, 잔류 유기물의 제거를 통하여 그 광학적 특성도 향상됨을 알 수 있었다. 또한 $O_2$ 플라즈마 처리 시간이 30초 이상 증가할 경우 그 면저항이 오히려 감소함을 확인하였는데, 이는 과도한 $O_2$ 플라즈마로 인하여 Ag나노와이어의 degradation이 일어나는데 그 원인이 있음을 확인하였다.

Keywords

References

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